Patents by Inventor Noriyasu Sinohara

Noriyasu Sinohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film
    Patent number: 6884862
    Abstract: a composition for film formation which can be cured in a short time period and give a film having a low dielectric constant and excellent in heat resistance, adhesion and cracking resistance, a polymer for use in the composition and a process for producing the polymer. The composition prepared by dissolving the polymer having specific repeating units in a solvent has excellent film-forming properties. The polymer has repeating units represented by the following general formula (1): wherein Z and Y are as defined hereinabove.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: April 26, 2005
    Assignee: JSR Corporation
    Inventors: Takashi Okada, Noriyasu Sinohara, Kaori Shirato, Masahiko Ebisawa, Michinori Nishikawa, Kinji Yamada
  • Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film
    Publication number: 20020161173
    Abstract: a composition for film formation which can be cured in a short time period and give a film having a low dielectric constant and excellent in heat resistance, adhesion and cracking resistance, a polymer for use in the composition and a process for producing the polymer. The composition prepared by dissolving the polymer having specific repeating units in a solvent has excellent film-forming properties.
    Type: Application
    Filed: April 24, 2002
    Publication date: October 31, 2002
    Applicant: JSR CORPORATION
    Inventors: Takashi Okada, Noriyasu Sinohara, Kaori Shirato, Masahiko Ebisawa, Michinori Nishikawa, Kinji Yamada