Patents by Inventor Noriyoshi Mashimo

Noriyoshi Mashimo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Arrangement for cleaning semiconductor wafers using mixer
    Patent number: 5415191
    Abstract: For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.
    Type: Grant
    Filed: June 17, 1994
    Date of Patent: May 16, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Noriyoshi Mashimo, Katsuya Okumura
  • Ultraviolet reactor with mixing baffle plates
    Patent number: 5352359
    Abstract: An ultraviolet reactor for purifying a liquid, comprising a housing of circular or rectangular cross-sections, a multiplicity of ultraviolet lamps accommodated in the housing, an inlet and outlet for the liquid, which are provided at both ends, respectively, of the housing, and a plurality of mixing baffle plates provided inside the housing at a proper pitch along a longitudinal axis of the housing so that the liquid flows at right angles to the ultraviolet lamps.
    Type: Grant
    Filed: February 1, 1993
    Date of Patent: October 4, 1994
    Assignees: Ebara Corporation, Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Nagai, Ken Nakajima, Yukio Ikeda, Noriyoshi Mashimo
  • Heat treating apparatus
    Patent number: 5318633
    Abstract: A heat treating apparatus comprises a reaction tube for receiving a plurality of articles to be treated and a heating unit surrounding at least part of the reaction tube. The reaction tube comprises a first structural section, at least part of which is surrounded by the heating unit and a second structural section, at least part of which extends from the heating unit. The first structural section is made of material having thermal resistivity and thermal conductivity higher than the second structural section.
    Type: Grant
    Filed: March 6, 1992
    Date of Patent: June 7, 1994
    Assignees: Tokyo Electron Sagami Limited, Kabushiki Kaisha Toshiba
    Inventors: Akihito Yamamoto, Naohiko Yasuhisa, Noriyoshi Mashimo, Masaharu Abe, Shingo Watanabe
  • Method of cleaning semiconductor wafers using mixer containing a bundle of gas permeable hollow yarns
    Patent number: 5261966
    Abstract: For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.
    Type: Grant
    Filed: January 24, 1992
    Date of Patent: November 16, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Noriyoshi Mashimo, Katsuya Okumura