Abstract: An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching.

Abstract: An exhaust gas purification device includes an exhaust pipe defining an exhaust passage, a first SOX adsorption portion having a first SOX adsorption material provided in the exhaust passage, a second SOX adsorption portion having a second SOX adsorption material provided in the exhaust passage, and a NOX catalyst provided downstream of the first SOX adsorption portion and the second SOX adsorption portion in the exhaust passage. The first SOX adsorption material is configured to adsorb SOX in the combustion gas at a temperature lower than a first set temperature. The second SOX adsorption material is configured to store SOX in the combustion gas at a temperature equal to or higher than a second set temperature, and the stored SOX can be kept at a temperature lower than the second set temperature. Therefore, the exhaust gas purification device can adsorb SOX in the exhaust gas with high efficiency.

Abstract: A storage medium having recorded therein a location determination program for causing a computer to execute the following steps: storing detection information including information on a detected object and the date and time on which the object was detected, and location information for that owner; determining a last detection date and time which represents the date and time on which the specified object was last detected based on the detection information; identifying an object that is owned by someone other than the owner of the object from among objects that were detected on the same date and time as the last detection date and time based on the last detection date and time as well as the detection information; and determining the location of the object based on the owner of the object.

Abstract: A plasma etching method that can increase the selection ratio of a stop layer to an interlayer insulation film. The plasma etching method is carried out on a substrate that has the interlayer insulation film formed of CwFx (x and w are predetermined natural numbers) and a stop layer that stops etching and is exposed at the bottom of a hole or a trench formed in the interlayer insulation film. The interlayer insulation film and the stop layer are exposed at the same time to plasma generated from CyFz (y and z are predetermined natural numbers) gas and hydrogen-containing gas.

Abstract: A plasma etching method that can prevent residues from becoming attached to bottoms and sides of via holes and trenches. An interlayer insulation film formed of CwFx (x and w are predetermined natural numbers) and a metallic layer or a metal-containing layer formed on a substrate are exposed at the same time to plasma generated from a process gas. The process gas is a mixed gas including CyFz (y and z are predetermined natural numbers) gas and N2 gas, and the flow rate of the N2 gas in the process gas is higher than the flow rate of the CyFz gas.

Abstract: A fuel supply pump with a large fuel discharge amount and a tappet structure body, which are suitably used for an accumulated pressure-type fuel injection device that mechanically amplifies pressure, is provided. A fuel supply pump has a tappet structural body and a spring sheet, wherein a penetration portion for allowing passage of a lubricant or a fuel for lubrication therethrough by coordinating the tappet structure and the spring sheet is provided between a spring-holding chamber for holding a spring to be used for pulling up a plunger and a cam chamber for housing a cam to be used for moving the plunger up and down.

Abstract: A method of manufacturing a membrane electrode assembly for a fuel cell includes: producing a gas diffusion layer powder that is used to form a gas diffusion layer; forming a catalyst layer on an electrolyte membrane; and forming the gas diffusion layer on the catalyst layer by depositing the gas diffusion layer powder on the catalyst layer.

Abstract: A systematic problem search unit searches information about a systematic problem that is a common problem to a plurality of projects, using a conditional expression for searching the information about the systematic problem based on one of or a plurality of a count by which the information about the systematic problem is stored in the retrospect storage unit, a count by which a trial improvement plan linked to the systematic problem is stored in the retrospect storage unit, and information indicating whether the stored improvement plan is stored in the retrospect storage unit, as a conditional expression indicating a condition for extracting the information about the systematic problem. a systematic problem output unit outputs a search result in the systematic problem search procedure to each of or one of a predetermined storage unit and a predetermined output unit.

Abstract: An image processing apparatus capable of outputting image data by a plurality of output methods includes storing image data, managing output restriction information corresponding to a predetermined region of the stored image data, executing output restriction processing of the image data corresponding to the predetermined region based on the output restriction information of one of the plurality of output methods, selecting one of the plurality of output methods when the image data is output, and outputting the image data on which the output restriction processing is executed by the selected output method.

Abstract: A circuit optimization information management apparatus provides information to be used when a circuit parameter optimization program is executed to design an integrated circuit. The apparatus includes an accumulator for registering information relating to a candidate of a circuit type used in a design target circuit, a simulation test bench circuit corresponding to the circuit type, a simulation test input waveform and a circuit performance evaluation function for evaluating simulation results, and a feeder for selecting, in response to selection of the circuit type used in the design target circuit, information relating to the test bench circuit, the test input waveform and the performance evaluation function, corresponding to the selected circuit type registered in the accumulator and feeding the selected information to the circuit parameter optimization program.

Abstract: The present invention provides a sheet material stacking apparatus that includes a sheet material stacking base on which sheet materials induced by a sheet material conveying unit are stacked, a first guide member disposed along the conveyance direction of the sheet materials to the sheet material stacking base and sorts the end surfaces at one end with respect to the width direction thereof, a second guide member which is disposed in parallel and opposite to the first guide member having the sheet material stacking base therebetween, a pusher that constitutes at least a portion of the first guide member and is displaced between a reference position in which the distance to the second guide member is equal to the width of the sheet material and a separating position in which the distance to the second guide member is larger than the width of the sheet material, and a driving unit that displaces the pusher and places side by side both ends of the sheet materials in the axis direction.

Abstract: A storage device protection system has a disk for storing data, the disk including a disk medium and a buffer for writing data to the disk medium. The device includes: a detecting unit for detecting an operation to cut off a main power supply of the device; an access suspending unit for suspending access to the hard disk when the detecting unit detects the operation; a writing unit for writing data in the buffer to the disk medium when the detecting unit detects the operation; and a power cutoff unit for cutting off the main power supply after the writing operation of the medium writing unit.

Abstract: When the distributed load system of grid computing is applied to printers, multi-functional peripheral equipments, and the like connected to a computer network, if a device which inputs a job received from the client is executing processing, the distributed processing requires much time, and the user of the client cannot obtain the print result soon. Hence, when a print job is input, the processing time upon executing distributed processing of data processes in the print job by computer devices connected to the computer network is estimated. Based on the estimation result, the print job or jobs divided from the print job are transmitted to the computer devices connected to the computer network.

Abstract: An upper electrode and a lower electrode are disposed opposite to each other in a process container configured to be vacuum-exhausted. The upper electrode is connected to a first RF power supply configured to apply a first RF power for plasma generation. The lower electrode is connected to a second RF power supply configured to apply a second RF power for ion attraction. The second RF power supply is provided with a controller preset to control the second RF power supply to operate in a power modulation mode that executes power modulation in predetermined cycles between a first power set to deposit polymers on a predetermined film on a wafer and a second power set to promote etching of the predetermined film on the wafer.

Abstract: In a display area of a display, a KPT screen in which a theme area, a keep area (Keep), a problem area (Problem), and a try area (Try) are disposed is displayed. When a click of the area is detected, a new generation menu of an article corresponding to the area is displayed so as to enable an editing operation of new generation of an article by menu selection. When a click of an article display which is displayed in a tag image in the problem area is detected, new generation menus of articles of the other areas are displayed in addition to a correction menu and a deletion menu of the specified article, so as to enable new generation of an article of another area, for example, the try area in association with the clicked article display.

Abstract: A policy management program, a policy management apparatus and a policy management method can evaluate policies. A policy management program causes a computer to manage the policies in a project by causing the computer to execute a policy registration step that registers policy information including the contents of policies, a first evaluation step that acquires case information satisfying the predetermined first requirement from the case information including the contents of the utilized policies registered in advance and computationally determines an evaluation value for each of the policies registered in the policy registration step according to the case information and a display step that displays the policy information of the one or more than one policies showing an evaluation value satisfying the predetermined second requirement as computed in the first evaluation step.

Abstract: A printing system includes an information processing apparatus to receive mail information transmittable to a mail receiving apparatus, and a printer communicating with the information processing apparatus. The information processing apparatus includes a unit to store transfer target printer information obtained from the mail receiving apparatus, a unit to determine whether the mail receiving apparatus can process the mail information, and a unit to transmit the mail information to the mail receiving apparatus if the determining unit determines that the mail receiving apparatus can process the received mail information, and to transfer the mail information to a printer corresponding to the transfer target printer information if the determining unit determines that the mail receiving apparatus cannot process the received mail information.

Abstract: An image processing apparatus which is capable of recovering a normal operation thereof at high speed. A CPU 2001 that controls a printer 108 determines whether or not the printer 108 should be switched from a normal operation mode to a power saving mode. Responsive to input of a signal for causing the apparatus to recover the normal operation mode, the CPU 2001 reads out a power saving mode flag from a flip-flop circuit 11005, and when the flag indicates the apparatus has been switched to the power saving mode, reads out a main program from a SDRAM, whereas when the flag does not, reads out the main from a HDD 2004, for control of the printer 108.

Abstract: This invention is to automatically carry out the retracement of the knowledge. Therefore, this method is executed by a computer having a retracement data storage storing a target type of a past project, data concerning a scale of the past project, a specific phase of the past project, data concerning a problem in the specific phase of the past project, and data concerning an action against a problem in the specific phase of the past project.

Abstract: Silicon oxide film having, as a sublayer, a silicon nitride film layer serving as a protective film layer for 5 gate formed on silicon substrate is etched by introducing a processing gas including a gaseous mixture containing at least C4F6, Ar, O2 and N2 into an airtight processing chamber and carrying out a plasma treatment in a self-alignment contact process, thereby forming contact hole. For the 10 processing gas, e.g., the ratio of N2 gas flow rate to C4F6 gas flow rate ranges from 25/8 to 85/8, the ratio of O2 and N2 gas flow rate to C4F6 gas flow rate ranges from 15/4 to 45/4 and the ratio of N2 gas flow rate to O2 gas flow rate ranges from 5 to 17. Accordingly, stable contact holes of 15 high aspect ratio exhibiting desirable control characteristics is formed while minimizing etching the silicon nitride film, a protective film layer for gate.