Abstract: A device for detecting the positional relationship between first and second objects in a predetermined direction includes a light source for emitting light in a direction to the first or second object, and a first detecting portion for detecting the position of incidence of a first light deflected by the first and second objects, wherein the position of incidence of the first light upon the first detecting portion is changeable with a change in the positional relationship between the first and second objects in the predetermined direction. A second detecting portion detects the position of incidence of a second light deflected by at least one of the first and second objects, wherein the state of the position of incidence of the second light resulting from a change in the positional relationship between the first and second objects, in the predetermined direction differs from that of the first light.

Abstract: A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.

Abstract: A method and apparatus for measuring the deviation between elements on an object includes the steps of and devices for performing the steps of forming at least a first physicooptical element on the object: forming at least a second physicooptical element on the object, the first and second physicooptical elements having lens functions; projecting light beams onto the first and second physicooptical elements on the object and detecting the incident positions of light beams travelling from the first and second physicooptical elements, having been subjected to the lens functions of the first and second physicooptical elements, on a predetermined surface; and detecting the deviation between the first and second physicooptical elements on the object from the relationship between the detected incident positions of the light beams.

Abstract: A device for detecting a relative positional relationship between first and second objects with respect to a predetermined direction includes an illumination system for irradiating the first object with light, wherein the first and second objects are provided with first and second physical optic elements, respectively, each having a light converging or diverging function in at least one direction and wherein the illumination system illuminates the first physical optic element. A photodetecting system detects light passing through the first object and emanating from the second object, and is operable to detect light convergently or divergently influenced by both of the first and physical optic elements, such that the relative positional relationship between the first and second objects can be detected on the basis of the detection by the photodetecting system.

Abstract: A mask structure according to an aspect of the invention includes a base having a first zone for an alignment pattern and a second zone for a circuit pattern; an alignment pattern forming material with which the alignment pattern is formed in the first zone; and a circuit pattern forming material with which the circuit pattern is formed in the second zone; wherein the alignment pattern forming material and the circuit pattern forming material are different from each other.

Abstract: A method of detecting a position of a substrate having an alignment mark includes the steps of projecting a radiation beam from an optical head to the alignment mark such that the alignment mark produces a signal beam on the basis of which the position of the substrate is detected, forming a reference mark on the substrate at a position different from that of the alignment mark, projecting a radiation beam from the optical head to the reference mark, such that the reference mark produces a reference beam, detecting the relative positional deviation of the optical head relative to the reference mark on the basis of the produced reference beam, and adjusting the relative position of the optical head and the alignment mark on the basis of the detected relative positional deviation and, after the adjustment, detecting the position of the substrate on the basis of the produced signal beam.

Abstract: An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

Abstract: A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.

Abstract: An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

Abstract: A device for detecting a positional relationship between opposed first and second objects.

Abstract: A method and apparatus for detecting a positional relationship between first and second objects is disclosed, which includes a light source for projecting light to the first and second objects, a photodetecting system for detecting light from one of the first and second objects irradiated with the light from the light source, the detecting system being operable to detect first light whose position of incidence upon a predetermined plane is dependent upon the positional relationship of the first and second objects in a direction along the interval therebetween and in a direction perpendicular to the interval, second light whose position of incidence upon the predetermined plane is dependent upon the positional relationship of the first and second objects in the direction of the interval therebetween, and third light whose position of incidence upon the predetermined plane is independent of the positional relationship of the first and second objects in both the direction of the interval and the direction perpen

Abstract: An alignment method for use in an exposure apparatus for printing a pattern of an original onto different surface areas of a substrate, the alignment method comprising the steps of: providing alignment marks around the pattern of the original and placing the original on an original supporting stage; providing a reference mark on an X-Y stage for supporting the substrate and being movable in X and Y directions, and moving the X-Y stage so as to place the reference mark at those positions, in sequence, which correspond to the alignment marks of the original, respectively, and which are preset in respect to a stage coordinate system; detecting, in sequence, positional errors of the alignment marks of the original with respect to the corresponding set positions, respectively, by using the reference mark and through the movement of the X-Y stage, wherein the positional errors are detected by use of positional error detectors which are provided to be associated with the alignment marks of the original, respectively

Abstract: A device for measuring a relatively moving distance of two relatively moving objects is disclosed. The device includes a plurality of inclined surfaces formed on one of the objects and arrayed with a predetermined pitch along the relatively moving direction, with each of the inclined surfaces being inclined with respect to the relatively moving direction. A measuring portion is provided on the other object for measuring the distance to at least one of the inclined surfaces in a direction having an angle with respect to the relatively moving direction, and a detecting portion detects the relatively moving distance of the two objects on the basis of the measurement by the measuring portion.

Abstract: A composition for an intraocular lens comprising, an organopolysiloxane (A) having a viscosity of 10,000 cp or below and comprising at least one unsaturated aliphatic group, an organopolysiloxane (B) comprising at least three hydrogenated silyl units and a platinum compound; wherein the platinum compound based on its platinum content constitutes 10-200 ppm by weight of the composition. The composition provides a homogeneous intraocular lens even when it is injected into a crystalline capsule through a slender tube such as an injection needle.

Abstract: A three-dimensional shape measuring apparatus having a high performance and a reduced drive energy is disclosed. At least a portion of an in-focus state detection optical system having an internal light source is movable while maintaining a light path near an object lens of the optical system. A distance of movement of the movable portion which is moved with auto-focusing operation for an object is measured and the three-dimensional shape is measured precisely with a high stroke. An inclination angle measuring optical system which shares the light path near the object lens with the in-focus state detection optical system and has an internal light source is provided in a common casing. Thus, the distance of movement of the movable part of the in-focus state detection optical system and an inclination angle are simultaneously measured so that the three-dimensional shape can be more precisely measured.

Abstract: An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.

Abstract: A device for measuring a moving distance of two relatively moving objects includes a first diffraction grating provided on one of the two objects and disposed along the relatively moving direction of the two objects, and a measuring portion provided on the other object. The measuring portion includes a second diffraction grating, a light source and a photodetecting system, wherein the light source provides lights which are projected upon two points on the second diffraction grating so that they emanate from the two points in the form of diffraction lights having different diffraction orders. The diffraction lights are directed to the same point on the first diffraction grating and are diffracted again by the first diffraction grating so that they are emitted in the same direction, and the photodetecting system is operable to detect a change in the light intensity caused due to the interference of the two lights emanating from the first diffraction grating.

Abstract: A process for producing an optical element wherein an optical molding is formed by using a mold and thereafter released from the mold by supplying a gas to the boundary between the mold surface and the optical molding. In the process, no localized external force is applied to the optical molding during the release thereof, and therefore undesirable deformation or flaws of the optical molding are not caused.

Abstract: Disclosed is a distance measuring system suitably usable in a semiconductor microcircuit manufacturing lithographic apparatus such as an aligner or a stepper, for measuring the position or the distance of movement of a movable object such as a mask stage or a wafer stage. The system includes a magnetic field producing portion such as a magnet for producing a predetermined magnetic field, a superconducting quantum interference device coupled to the mask stage or the wafer stage. Further, there are provided a magnetic flux detecting portion for outputting signals corresponding to changes in the magnetic flux, in the magnetic field, passing through the superconducting quantum interference device and a signal processing unit for processing the output signals of the magnetic flux detecting portion to detect the position or the distance of movement of the mask stage or the wafer stage.

Abstract: An eye examining apparatus has an eye examining lens of an elastic material opposed to an eye to be examined, and control means for causing the marginal portion of the eye examining lens to protrude or sink to thereby change the lens surface of the eye examining lens.