Patents by Inventor Noriyuki OIKAWA

Noriyuki OIKAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Prediction model creation apparatus, production facility monitoring system, and production facility monitoring method
    Patent number: 11106197
    Abstract: A prediction model creation apparatus includes a feature amount acquisition unit that acquires values of types of feature amounts that are calculated from operating state data indicating an operating state of a production facility that produces a product, for both a normal time at which the production facility produces the product normally and a defective time at which a defect occurs in the product that is produced, a feature amount selection unit that selects a feature amount effective in predicting the defect from among the acquired types of feature amounts, based on a predetermined algorithm that specifies a degree of association between the defect and the types of feature amounts, from the values of the types of feature amounts acquired at the normal time and the defective time, and a prediction model construction unit that constructs a prediction model for predicting occurrence of the defect, using the selected feature amount.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: August 31, 2021
    Assignee: OMRON Corporation
    Inventors: Reiko Hattori, Kosuke Tsuruta, Kota Miyamoto, Yuya Ota, Hideki Higashikage, Yuki Hirohashi, Noriyuki Oikawa
  • PREDICTION MODEL CREATION APPARATUS, PRODUCTION FACILITY MONITORING SYSTEM, AND PRODUCTION FACILITY MONITORING METHOD
    Publication number: 20180203439
    Abstract: A prediction model creation apparatus includes a feature amount acquisition unit that acquires values of types of feature amounts that are calculated from operating state data indicating an operating state of a production facility that produces a product, for both a normal time at which the production facility produces the product normally and a defective time at which a defect occurs in the product that is produced, a feature amount selection unit that selects a feature amount effective in predicting the defect from among the acquired types of feature amounts, based on a predetermined algorithm that specifies a degree of association between the defect and the types of feature amounts, from the values of the types of feature amounts acquired at the normal time and the defective time, and a prediction model construction unit that constructs a prediction model for predicting occurrence of the defect, using the selected feature amount.
    Type: Application
    Filed: December 18, 2017
    Publication date: July 19, 2018
    Applicant: OMRON Corporation
    Inventors: Reiko HATTORI, Kosuke TSURUTA, Kota MIYAMOTO, Yuya OTA, Hideki HIGASHIKAGE, Yuki HIROHASHI, Noriyuki OIKAWA