Abstract: The apparatus for polishing control with signal peak analysis consists of two major units: a polishing machine and a polishing process control and monitoring system which has sensors for sensing changes on the surface and/or inside the object during polishing. In response to the above changes the sensors generate operating data signals. The control and monitoring system, which also contains a signal conditioning unit and a control unit, amplifies the operating data signals and sends them to a signal analyzer, which determines average values and peaks of the conditioned signals. The analyzer also determines a ratio of the peak signal values to an average signal values and compares the obtained ratio with a preliminarily determined reference value optimized with regard to the specific CMP process carried out on the polishing machine.

Abstract: A recording medium comprising a phosphorus-containing fluorocarbon compound is provided. The phosphorus-containing fluorocarbon compound can be used as lubricant or as an additive to a lubricant. The phosphorus-containing fluorocarbon compound can be an esterified aryl phosphorus compound, a salt thereof, or combinations thereof.