Patents by Inventor Norman C. Mills

Norman C. Mills has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods of making molybdenum titanium sputtering plates and targets
    Patent number: 8911528
    Abstract: Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the ?(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase ?(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.
    Type: Grant
    Filed: November 2, 2010
    Date of Patent: December 16, 2014
    Assignee: H.C. Starck Inc.
    Inventors: Mark E. Gaydos, Prabhat Kumar, Steve Miller, Norman C. Mills, Gary Rozak, Rong-Chein Richard Wu
  • METHODS OF MAKING MOLYBDENUM TITANIUM SPUTTERING PLATES AND TARGETS
    Publication number: 20110097236
    Abstract: Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the ?(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase ?(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.
    Type: Application
    Filed: November 2, 2010
    Publication date: April 28, 2011
    Applicant: H. C. Starck Inc.
    Inventors: Mark E. Gaydos, Prabhat Kumar, Steve Miller, Norman C. Mills, Gary Rozak, Rong-Chein Richard Wu
  • Methods of making molybdenum titanium sputtering plates and targets
    Patent number: 7837929
    Abstract: Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the ?(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase ?(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.
    Type: Grant
    Filed: October 20, 2005
    Date of Patent: November 23, 2010
    Assignee: H.C. Starck Inc.
    Inventors: Mark Gaydos, Prabhat Kumar, Steven A. Miller, Norman C. Mills, Gary Rozak, Rong-Chein Richard Wu