Patents by Inventor Norman Mertke

Norman Mertke has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210265144
    Abstract: A system for controlling a temperature of a substrate during treatment in a substrate processing system comprises a substrate support including first and second components, first and second heaters, and first and second heat sinks. The first component includes an upper surface at least partially defining a center zone. The second component is arranged radially outside of and below the first component. The second component includes an upper surface at least partially defining a radially-outer zone. The first and second components are spaced apart and define a gap between them. The first and second heaters are configured to heat the first and second components, respectively. The first heat sink has one end in thermal communication with the first component. The second heat sink has one end in thermal communication with the second component.
    Type: Application
    Filed: May 10, 2021
    Publication date: August 26, 2021
    Inventors: Norman A. MERTKE, Himanshu CHOKSHI
  • Patent number: 11011355
    Abstract: A system for controlling a temperature of a substrate during treatment in a substrate processing system includes a substrate support defining a center zone and a radially-outer zone. The substrate is arranged over both the center zone and the radially-outer zone during treatment. A first heater is configured to heat the center zone. A second heater is configured to heat the radially-outer zone. A first heat sink has one end in thermal communication with the center zone. A second heat sink has one end in thermal communication with the radially-outer zone. A temperature difference between the center zone and the radially-outer zone is greater than 10° C. during the treatment.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: May 18, 2021
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Norman Mertke, Himanshu Chokshi
  • Publication number: 20180330928
    Abstract: A system for controlling a temperature of a substrate during treatment in a substrate processing system includes a substrate support defining a center zone and a radially-outer zone. The substrate is arranged over both the center zone and the radially-outer zone during treatment. A first heater is configured to heat the center zone. A second heater is configured to heat the radially-outer zone. A first heat sink has one end in thermal communication with the center zone. A second heat sink has one end in thermal communication with the radially-outer zone. A temperature difference between the center zone and the radially-outer zone is greater than 10° C. during the treatment.
    Type: Application
    Filed: May 12, 2017
    Publication date: November 15, 2018
    Inventors: Norman Mertke, Himanshu Chokshi
  • Publication number: 20060032160
    Abstract: A blast resistant window blind system includes a blind system comprising a plurality of parallel blind slats, a plurality of spaced pane engaging members, and first and second mounting bodies coupled to the pane engaging members and anchor members disposed at first and second opposite ends of said opening, wherein the pane engaging members are secured to the mounting bodies and coupled thereby to the structure. At least one energy dampening device is coupled to the pane engaging members, allowing the pane engaging members to extend a selected amount toward the inside of the structure upon impact of the window pane, wherein the blind system and pane engaging members cooperate to restrain the window pane from being blown into the inside of the structure and conform to the inside surface of the window pane during impact therewith to distribute the restraining force across the window pane.
    Type: Application
    Filed: August 10, 2005
    Publication date: February 16, 2006
    Inventors: Alan Gazaway, Christopher Eder, Norman Mertke
  • Patent number: 6059889
    Abstract: A method for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove in which the wafer edge is pinched. Treads or grooves extending from the groove channel liquids away from the groove to prevent wafer slippage when rotating and cleaning solutions are applied to the wafer.
    Type: Grant
    Filed: January 7, 1999
    Date of Patent: May 9, 2000
    Assignee: OnTrak Systems, Inc.
    Inventors: Alan J. Jensen, Norman A. Mertke, William Dyson, Jr., Lynn Ryle, Patrick Paino
  • Patent number: 5862560
    Abstract: A method and apparatus for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove in which the wafer edge is pinched. Treads or grooves extending from the groove channel liquids away from the groove to prevent wafer slippage when rotating and cleaning solutions are applied to the wafer.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: January 26, 1999
    Assignee: Ontrak Systems, Inc.
    Inventors: Alan J. Jensen, Norman A. Mertke, William Dyson, Jr., Lynn Ryle, Patrick Paino