Abstract: System and method for processing semiconductor wafers are provided. One embodiment provides a method for monitoring a batch system. For the purpose of monitoring batch systems, in accordance with a defined rotation principle, during successive passes of the batch system, a predefined number of test wafers is moved to changing positions in a boat, so that after a complete rotation cycle, in which test wafers and/or product wafers are inspected after specific passes, a statement about the condition of the batch system and the quality of the processing process is achieved.