Abstract: An automated diffusion furnace load station has a cassette and wafer transporter which selectively transports, using a support assembly, wafer-filled cassettes from a delivery station to a transfer post over which a loaded cassette is lowered to suspend the set of wafers above the cassette. The transporter causes the support assembly to release the cassette and engage the wafers to transfer them as a set to a carrier of a diffusion furnace tube. The process is reversed for unloading processed wafers from a furnace carrier and loading them into a cassette. The process further may be sequentially performed to exchange sets of processed wafers from a furnace carrier with sets of unprocessed wafers located in cassettes at a delivery station. The support assembly is used to selectively support a cassette or a set of wafers removed from a cassette by selectively positioning a pair of jaws relative to a cassette or to a set of wafers for supporting the same.

Abstract: A furnace loading system is provided for loading and unloading wafer boats or other receptacles from a furnace tube of the type used in semiconductor processing. The system includes a carrier for supporting the receptacles in a cantilevered manner out of contact with the furnace tube. Actuators are provided for moving the carrier and receptacles into the furnace tube and for depositing the receptacles on the floor of the furnace tube without any contact between the carrier and the furnace tube. The carrier is then withdrawn, completing the loading cycle. Unloading is accomplished by inserting the carrier into the furnace tube while supported in a cantilevered manner. The carrier is then raised to pick up and support the receptacles on the carrier, after which they are withdrawn from the furnace tube. Only the feet of the receptacles contact the furnace tube, reducing particulate matter generation to a minimum.