Patents by Inventor Norman W. Parker
Norman W. Parker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5599423Abstract: Apparatus and concomitant method for simulating a chemical mechanical polishing (CMP) system containing a polishing pad, a chuck for supporting a substrate, a positioner for positioning the polishing pad with respect to the substrate, a chuck rotator for rotating the chuck, and a polishing pad rotator for rotating the polishing pad. The CMP system simulation method comprises: defining polishing pad and substrate parameters; defining simulation parameters; determining, in response to said polishing pad, substrate and simulation parameters, a polishing result; and displaying the polishing result. Additionally, the simulation optimizes selected parameters to achieve a specified polishing non-uniformity across a substrate. Also, the simulation and optimization routines are interfaced to CMP system hardware to optimally control a substrate polishing process to achieve predetermined substrate polishing non-uniformity.Type: GrantFiled: June 30, 1995Date of Patent: February 4, 1997Assignee: Applied Materials, Inc.Inventors: Norman W. Parker, Robert D. Tolles, Harry Q. Lee
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Patent number: 5434588Abstract: In a liquid crystal display, a crosstalk correction signal which is the same for all video or pixel input signals is provided either directly from the input signals or from the column signal. The input signals are combined with the correction signal and modulated onto carrier signals, then, e.g., may be coupled to the LCDs through a single-wire row or column connection. The correction signal can be derived from either the pixel input signals or the column signal.Type: GrantFiled: December 21, 1993Date of Patent: July 18, 1995Assignee: Motorola, Inc.Inventor: Norman W. Parker
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Patent number: 5430347Abstract: A FED including an integrally formed electrostatic lens with an aperture having a diameter which is dis-similar from an aperture of the FED gate to effect a reduction in electron beam cross-section. By forming the FED with an electrostatic lens aperture of increased diameter relative to the diameter of the gate aperture a reduced sensitivity with respect to lens thickness and location is realized as is a relaxation of electrostatic lens fabrication constraints. Image display devices employing such integrally formed electrostatic lens systems may be provided wherein pixel cross-sections as small as two microns are realized.Type: GrantFiled: July 16, 1993Date of Patent: July 4, 1995Assignee: Motorola, Inc.Inventors: Robert C. Kane, Norman W. Parker
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Patent number: 5300862Abstract: A display addressing method applied in conjunction with an array of cold cathode field emission micro-emitters employs a row-by-row addressing technique in concert with controlled constant current sources connected simultaneously to each column of the array of emitters to provide a novel addressing scheme which yields an improvement in cathodoluminescent display brightness on the order of a full order of magnitude over that of the prior art.Type: GrantFiled: June 11, 1992Date of Patent: April 5, 1994Assignee: Motorola, Inc.Inventors: Norman W. Parker, James E. Jaskie, Robert C. Kane
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Patent number: 5242566Abstract: A planar magnetron sputtering source having a pair of pole pieces configured to produce a uniform coating, excellent step coverage and excellent step coverage uniformity of a wafer. Between the two pole pieces is a gap within which the magnetic field and electric field produce an electron trap. The shape of the gap produces a depth of sputter profile in the target that results in the uniform coating, excellent step coverage and excellent step coverage uniformity. The outer pole piece is bowl-shaped cross-section with a rim substantially coplanar with a planar inner pole piece.Type: GrantFiled: August 11, 1992Date of Patent: September 7, 1993Assignee: Applied Materials, Inc.Inventor: Norman W. Parker
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Patent number: 5194884Abstract: An image projection system utilizing a cold cathode field emission device to provide the image source is provided. By using a cold cathode field emission device as an image source, an improved image may be achieved as compared to that of a conventional electron-gun CRT image source. First, the resulting image provides improved resolution, due to the fact that smaller pixel cells may be achieved with the cold cathode device. Second, the resulting image is considerably brighter, due to the fact that much higher current densities are achievable with a cold cathode image unit, as compared to the older electron-gun CRT unit.Type: GrantFiled: January 13, 1992Date of Patent: March 16, 1993Inventors: Norman W. Parker, Robert C. Kane
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Patent number: 5191217Abstract: A FED with integrally formed deflection electrode coupled to the electron emitter such that any variation of electron emitter operating voltage is coincidentally impressed on the deflection electrode so as to effectively minimize variations in the emitted electron beam cross-section. In image display devices including FEDs with voltage variations induced at the electron emitter to provide image information, integrally formed deflection electrodes are connected to follow the electron emitter variations so that pixel cross-sections remain substantially invariant under device operation.Type: GrantFiled: November 25, 1991Date of Patent: March 2, 1993Assignee: Motorola, Inc.Inventors: Robert C. Kane, Norman W. Parker
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Patent number: 5165954Abstract: Apparatus and method for repairing semiconductor masks and reticles is disclosed, utilizing a focused ion beam system capable of delivering, from a single ion beam column, several different species of focused ion beams, each of which is individually optimized to meet the differing requirements of the major functions to be performed in mask repair. This method allows the mask to be imaged with high resolution and minimum mask damage. Opaque defects are removed by sputter etching at high rates with minimum damage to the mask substrate, and clear defects are filled in at high rates directly from the beam by deposition of a metallic or other substance compatible with the mask materials. A focused ion beam column able to produce precisely focused ion beams is employed and is operated at high energies for imaging and sputter etching, and at low energies for imaging and deposition. A liquid metal alloy source containing suitable atomic species is employed.Type: GrantFiled: December 18, 1989Date of Patent: November 24, 1992Assignee: Microbeam, Inc.Inventors: Norman W. Parker, William P. Robinson, Robert L. Piccioni
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Patent number: 5157304Abstract: A field emission display constructed from field emission devices, (which are typically fabricated on silicon substrates but which are difficult to seal to pressure levels below 1.times.10.sup.-6 Torr because they are fabricated on silicon), can be enclosed in an evacuated volume, sealed using a glass frit, when an appropriate interface layer is first formed on the substrate for the field emission devices.Type: GrantFiled: December 17, 1990Date of Patent: October 20, 1992Assignee: Motorola, Inc.Inventors: Robert C. Kane, James E. Jaskie, Norman W. Parker
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Patent number: 5157309Abstract: A cold-cathode field emission device controls electron emission by using a current source coupled to the emitter. The open circuit voltage of the current source is less than the voltage at which the FED would emit electrons. Application of an accelerating potential on the gate enables electron emission. Electron emission from the FED is governed by the current source.Type: GrantFiled: September 13, 1990Date of Patent: October 20, 1992Assignee: Motorola Inc.Inventors: Norman W. Parker, Robert C. Kane
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Patent number: 5132585Abstract: A display device exhibiting improved thermal performance at the faceplate by utilizing a layer of thermally highly conductive substantially optically transmissive solid material is provided. According to the invention, an optically transmissive display faceplate is disclosed having a substantially planar optically transmissive base sheet or a substantially optically transmissive region of substantially uniform thickness of a cathode ray tube envelope. On the base sheet is disposed at least one layer of substantially optically transmissive solid material, such as a deposited diamond film, with thermal conductivity greater than that of the faceplate material disposed on at least a part of a major surface of the substantially optically transmissive base sheet or substantially optically transmissive region of substantially uniform thickness of a cathode ray tube envelope.Type: GrantFiled: December 21, 1990Date of Patent: July 21, 1992Assignee: Motorola, Inc.Inventors: Robert C. Kane, Norman W. Parker, James E. Jaskie
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Patent number: 5035787Abstract: Apparatus and method for repairing semiconductor masks and reticles is disclosed, utilizing a focused ion beam system capable of delivering, from a single ion beam column, several different species of focused ion beams, each of which is individually optimized to meet the differing requirements of the major functions to be performed in mask repair. This method allows the mask to be imaged with high resolution and minimum mask damage. Opaque defects are removed by sputter etching at high rates with minimum damage to the mask substrate, and clear defects are filled in at high rates directly from the beam by deposition of a metallic or other substance compatible with the mask materials. A focused ion beam column able to produce precisely focused ion beams is employed and is operated at high energies for imaging and sputter etching, and at low energies for imaging and deposition. A liquid metal alloy source containing suitable atomic species is employed.Type: GrantFiled: December 18, 1989Date of Patent: July 30, 1991Assignee: MicroBeam, Inc.Inventors: Norman W. Parker, William P. Robinson, Robert L. Piccioni
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Patent number: 4929839Abstract: A focused ion beam optical column includes asymmetrical three-element electrostatic upper and lower lenses, a velocity filter, an electrostatic blanker, and an electrostatic octopole deflector for maskless ion implantation, resist exposure, repair of x-ray and photo masks, micromachining, and scanning ion microscopy and microanalysis. A constant and relatively high beam energy is maintained through the mass filter and blanker. The column produces a focused beam over a wide range of final beam voltages, with the particular voltage range determined by the dimensions of three components in the column. A large working distance between the main deflector and target is provided to allow for the insertion of imaging and/or charge neutralization optics.Type: GrantFiled: October 11, 1988Date of Patent: May 29, 1990Assignee: MicroBeam Inc.Inventors: Norman W. Parker, William P. Robinson
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Patent number: 4818872Abstract: An integrated charge neutralization and imaging system is disclosed. An energy analyzer is mounted directed above a target surface consisting of a 90 degree spherical electrostatic capacitor with variable voltage on both the inner and outer electrodes. Circular apertures are mounted at the entrance and exit of the analyzer to limit the fringing electric fields and define the beam size. An electrostatic lenses is used for focusing the beam from the electron gun into the virtual object plane of the energy analyzer. It is also used to collect secondary electrons or secondary ions leaving the energy analyzer and focused them into the imaging optics. A defector is used for steering the electron beam onto the axis of the lens. This deflector is also used to steer the secondary electrons or secondary ions into the electron/ion detector, or to steer the secondary ions into the SIMS mass filter entrance aperture.Type: GrantFiled: May 11, 1987Date of Patent: April 4, 1989Assignee: Microbeam Inc.Inventors: Norman W. Parker, William G. Turnbull, William P. Robinson
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Patent number: 4789787Abstract: A Wien filter for use in charged particle beam systems is disclosed, having two opposed resistive magnetic pole pieces separated from a set of excitation coils by an electrically insulating material. Two opposed electric pole pieces are positioned in orthogonal relationship to and in physical contact with the magnetic pole pieces to form a physical aperture through which the charged particles will pass. The resistivity of the magnetic pole pieces is such that sufficient current will flow through them between the electric pole pieces to establish a uniform electric field over the entire physical aperture.Type: GrantFiled: May 27, 1987Date of Patent: December 6, 1988Assignee: MicroBeam Inc.Inventor: Norman W. Parker
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Patent number: 4680794Abstract: The correction signal of the AM stereo system is filtered through a lowpass filter thus providing compatible signals at all normal modulation levels and frequencies, but allowing the signal to become pure quadrature at high frequency, high modulation levels. The inverse of the process can be utilized in the receivers if desired. The improvement is needed only for narrow channel or restricted sideband broadcasting.Type: GrantFiled: July 29, 1986Date of Patent: July 14, 1987Assignee: Motorola, Inc.Inventor: Norman W. Parker
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Patent number: 4593402Abstract: An AM stereo transmitter with bandwidth limiting utilizes the detection of high frequency energy in the modulating signal to control the difference channel input to the stereo encoder.Type: GrantFiled: September 21, 1984Date of Patent: June 3, 1986Assignee: Motorola, Inc.Inventor: Norman W. Parker
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Patent number: 4581766Abstract: A trigonometric transform function generator provides a signal which is either the sine or cosine function of an inputted information signal. The function generator can be used in an FM system or in a new system of transform modulation, wherein the transform functions are used to derive the original information signal.Type: GrantFiled: September 30, 1982Date of Patent: April 8, 1986Assignee: Motorola, Inc.Inventor: Norman W. Parker
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Patent number: 4556794Abstract: A secondary ion collection and transport system, for use with an ion microprobe, which is very compact and occupies only a small working distance, thereby enabling the primary ion beam to have a short focal length and high resolution. Ions sputtered from the target surface by the primary beam's impact are collected between two arcuate members having radii of curvature and applied voltages that cause only ions within a specified energy band to be collected. The collected ions are accelerated and focused in a transport section consisting of a plurality of spaced conductive members which are coaxial with and distributed along the desired ion path. Relatively high voltages are applied to alternate transport sections to produce accelerating electric fields sufficient to transport the ions through the section to an ion mass analyzer, while lower voltages are applied to the other transport sections to focus the ions and bring their velocity to a level compatible with the analyzing apparatus.Type: GrantFiled: January 30, 1985Date of Patent: December 3, 1985Assignee: Hughes Aircraft CompanyInventors: James W. Ward, Herbert Schlanger, Hugh McNulty, Jr., Norman W. Parker
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Patent number: 4525862Abstract: A single carrier is amplitude-modulated by a signal which is a transform (as the sine function) of the audio signal, and one set of sidebands is removed. In a receiver, the signal can be recovered by first deriving the Hilbert transform of the sine transform, and multiplying it by the signum of the derivative of the original audio signal to obtain the cosine transform. The sine and cosine transforms are then decoded to obtain the original audio signal.Type: GrantFiled: July 2, 1980Date of Patent: June 25, 1985Assignee: Motorola, Inc.Inventor: Norman W. Parker