Patents by Inventor Nozad Osman Karim

Nozad Osman Karim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and structure for creating embedded metal features
    Patent number: 7911037
    Abstract: A method and structure for creating embedded metal features includes embedded trace substrates wherein bias and signal traces are embedded in a first surface of the embedded trace substrate and extend into the body of the embedded trace substrate. The bias trace and signal trace trenches are formed into the substrate body using LASER ablation, or other ablation, techniques. Using ablation techniques to form the bias and signal trace trenches allows for extremely accurate control of the depth, width, shape, and horizontal displacement of the bias and signal trace trenches. As a result, the distance between the bias traces and the signal traces eventually formed in the trenches, and therefore the electrical properties, such as impedance and noise shielding, provided by the bias traces, can be very accurately controlled.
    Type: Grant
    Filed: August 5, 2009
    Date of Patent: March 22, 2011
    Assignee: Amkor Technology, Inc.
    Inventors: Ronald Patrick Huemoeller, Sukianto Rusli, David Jon Hiner, Nozad Osman Karim
  • Embedded metal features structure
    Patent number: 7589398
    Abstract: A method and structure for creating embedded metal features includes embedded trace substrates wherein bias and signal traces are embedded in a first surface of the embedded trace substrate and extend into the body of the embedded trace substrate. The bias trace and signal trace trenches are formed into the substrate body using LASER ablation, or other ablation, techniques. Using ablation techniques to form the bias and signal trace trenches allows for extremely accurate control of the depth, width, shape, and horizontal displacement of the bias and signal trace trenches. As a result, the distance between the bias traces and the signal traces eventually formed in the trenches, and therefore the electrical properties, such as impedance and noise shielding, provided by the bias traces, can be very accurately controlled.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: September 15, 2009
    Assignee: Amkor Technology, Inc.
    Inventors: Ronald Patrick Huemoeller, Sukianto Rusli, David Jon Hiner, Nozad Osman Karim