Abstract: A transparent electroconductive film with a protective film includes: a transparent electroconductive film including a film substrate, an optical adjustment layer formed on one main surface of the film substrate, and a transparent conductive layer formed on the optical adjustment layer; and a protective film bonded to a main surface of the film substrate on a side opposite to the transparent conductive layer, wherein the transparent electroconductive film and the protective film are thermally shrinkable in at least one direction in a main surface, and the absolute value of the maximum thermal shrinkage ratio (%) of the transparent electroconductive film in a main surface is smaller than the absolute value of the maximum thermal shrinkage ratio (%) of the protective film in a main surface, and the difference between the absolute values is 0.05% to 0.6%.

Abstract: Disclosed is a polarizing plate with a pressure sensitive adhesive including an infrared reflecting layer and a pressure sensitive adhesive layer in this over on one surface of a polarizer. The pressure sensitive adhesive layer is an outermost surface layer of the polarizing plate with a pressure sensitive adhesive. The polarizing plate with a pressure sensitive adhesive may further include a quarter wave plate.

Abstract: A transparent conductive film includes a transparent substrate film, a hard coat layer, an optical adjustment layer, and a transparent conductor layer, in which the hard coat layer, the optical adjustment layer, and the transparent conductor layer are laminated on the transparent substrate film in this order. The hard coat layer has a thickness of 250 nm to 2,000 nm, and the thickness of the optical adjustment layer is 2% to 10% of the thickness of the hard coat layer. Crystallization of the transparent conductor layer is completed by heating at, for example, 140° C. for 30 minutes.

Abstract: A transparent conductive film includes: a transparent substrate film; an antistripping layer with a thickness of 1.5 nm to 8 nm formed on one main surface of the substrate film; an optical adjustment layer with a thickness of 10 nm to 25 nm formed on the antistripping layer; and a transparent conductor layer with a pattern formed on the optical adjustment layer. The transmission Y value measured from a side of the transparent conductor layer is 88.0 or more and the reflection color difference ?E between a pattern portion and a non-pattern portion is 7.0 or less.

Abstract: There is provided a transparent conductive film which has a transparent conductive layer having low specific resistance and has excellent scratch resistance. A transparent conductive film of the present invention includes: a transparent film substrate; at least three undercoat layers; and a transparent conductive layer in this order. The at least three undercoat layers include: a first undercoat layer formed by a wet coating method; a second undercoat layer that is a metal oxide layer having an oxygen deficient; and a third undercoat layer that is an SiO2 film from a side of the film substrate. The third undercoat layer has a density of 2.0 g/cm3 or more and 2.8 g/cm3 or less. The transparent conductive layer has specific resistance of 1.1×10?4 ?·cm or more and 3.8×10?4 ?·cm or less.

Abstract: A light modulation film (1) includes a light modulation layer (30) whose state is reversibly changed between a transparent state by hydrogenation and a reflective state by dehydrogenation, and a catalyst layer (40) that promotes hydrogenation and dehydrogenation in the light modulation layer, in this order on a polymer film substrate (10). In a thickness-direction distribution of an element concentration as measured by X-ray electron spectroscopy, the light modulation layer (30) includes a light modulation region (32) with an oxygen content of 50 atom % or more and having a thickness of 10 nm or more on a catalyst layer (40)-side, and an oxidized region (31) with an oxygen content of less than 50 atom % on a polymer film substrate (10)-side.

Abstract: The light modulation film (1) is a hydrogen-activation-type light modulation film that includes an inorganic oxide layer (20), a light modulation layer (30) and a catalyst layer (40), in this order on a polymer film substrate (10). The light modulation layer (30) is a layer for reversibly changing states between a transparent state due to hydrogenation and a reflective state due to dehydrogenation. The catalyst layer (40) promotes hydrogenation and dehydrogenation in the light modulation layer. The inorganic oxide layer (20) contains an oxide of an element different from a metal element that constitutes the light modulation layer (30).

Abstract: The light transmitting film includes a transparent substrate and a light transmitting inorganic layer in this order. The transparent substrate is composed of a polymer film. The light transmitting inorganic layer includes, in this order, a first inorganic oxide layer, a metal layer, and a second inorganic oxide layer. The light transmitting inorganic layer has conductivity, the first inorganic oxide layer and the second inorganic oxide layer contain hydrogen atoms. The ratio (H2/H1) of hydrogen atom content H2 of the second inorganic oxide layer relative to the hydrogen atom content H1 of the first inorganic oxide layer is 0.10 or more and 10.00 or less.

Abstract: A transparent conductive film includes: a transparent film substrate; an optical adjustment layer; and a transparent conductive layer, in which the optical adjustment layer and the transparent conductive layer are laminated on a main surface of the transparent film substrate in this order; The optical adjustment layer includes a dry-type optical adjustment layer including an inorganic oxide. The transparent conductive layer includes a metal oxide including indium. The transparent conductive layer is crystalline and has an X-ray diffraction peak respectively at least on a (400) plane and a (440) plane. When the (400) plane has an X-ray diffraction peak intensity of I400 and the (440) plane has an X-ray diffraction peak intensity of I440, a ratio I440/I400 of the X-ray diffraction peak intensity is in a range from 1.0 to 2.2.

Abstract: In a conductive laminate, a transparent conductive thin film laminate 2 including at least two transparent conductive thin films and a metal layer 3 are formed in this order on at least one surface of a transparent base. In the transparent conductive thin film laminate 2, a first transparent conductive thin film 21 that is closest to the metal layer 3 is a metal oxide layer, or a composite metal oxide layer containing a principal metal and at least one impurity metal. Transparent conductive thin film 22 other than the first transparent conductive thin film is a composite metal oxide layer containing a principal metal and at least one impurity metal. The content ratio of impurity metal in the first transparent conductive thin film is not the highest of content ratios of impurity metal in the transparent conductive thin films which form the transparent conductive thin film laminate 2.

Abstract: A transparent electroconductive film with a protective film includes: a transparent electroconductive film including a film substrate, an optical adjustment layer formed on one main surface of the film substrate, and a transparent conductive layer formed on the optical adjustment layer; and a protective film bonded to a main surface of the film substrate on a side opposite to the transparent conductive layer, wherein the transparent electroconductive film and the protective film are thermally shrinkable in at least one direction in a main surface, and the absolute value of the maximum thermal shrinkage ratio (%) of the transparent electroconductive film in a main surface is smaller than the absolute value of the maximum thermal shrinkage ratio (%) of the protective film in a main surface, and the difference between the absolute values is 0.05% to 0.6%.

Abstract: There is provided a transparent conductive film achieving low resistance characteristics of a transparent conductive layer. The present invention provides a transparent conductive film including: a polymer film substrate; and a transparent conductive layer formed on at least one surface of the polymer film substrate, wherein the transparent conductive film includes an inorganic undercoat layer formed by means of a vacuum film-forming method between the polymer film substrate and the transparent conductive layer, and an existing atomic amount of carbon atoms in the transparent conductive layer is 3×1020 atoms/cm3 or less.

Abstract: There is provided a transparent conductive film which has a transparent conductive layer having low specific resistance and has excellent scratch resistance. A transparent conductive film of the present invention includes: a transparent film substrate; at least three undercoat layers; and a transparent conductive layer in this order. The at least three undercoat layers include: a first undercoat layer formed by a wet coating method; a second undercoat layer that is a metal oxide layer having an oxygen deficient; and a third undercoat layer that is an SiO2 film from a side of the film substrate. The third undercoat layer has a density of 2.0 g/cm3 or more and 2.8 g/cm3 or less. The transparent conductive layer has specific resistance of 1.1×10?4 ?·cm or more and 3.8×10?4 ?·cm or less.

Abstract: Provided is a transparent conductive film having excellent moist-heat resistance and capable of maintaining a low specific resistance value. The present invention relates to a transparent conductive film including: a transparent film substrate; at least three undercoat layers; and a crystalline transparent conductive layer in this order, wherein: the at least three undercoat layers include: a first undercoat layer formed by a wet coating method; a second undercoat layer that is a metal oxide layer having an oxygen deficient; and a third undercoat layer that is a metal oxide layer having a stoichiometric composition from a side of the film substrate; the transparent conductive layer has a surface roughness Ra of 0.1 nm or more and 1.6 nm or less; and the transparent conductive film has specific resistance of 1.1×10?4 ?·cm or more and 3.8×10?4 ?·cm or less.

Abstract: A transparent conductive film 1 includes, in this order, a transparent substrate 2, a first optical adjustment layer 4, an inorganic layer 5, and a transparent conductive layer 6. The first optical adjustment layer 4 has refraction nC lower than refraction nA of the transparent substrate 2, and thickness TC of 10 nm or more and 35 nm or less. The inorganic layer 5 has refraction nD that is lower than the absolute value |nC×1.13| of a value obtained by multiplying the refraction nC of the first optical adjustment layer 4 by 1.13.

Abstract: There is provided a transparent conductive film achieving low resistance characteristics of a transparent conductive layer. The present invention provides a transparent conductive film including: a polymer film substrate; and a transparent conductive layer formed on at least one surface of the polymer film substrate by means of a sputtering method using a sputtering gas including argon, wherein an existing atomic amount of argon atoms in the transparent conductive layer is 0.24 atomic % or less; an existing atomic amount of hydrogen atoms in the transparent conductive layer is 13×1020 atoms/cm3 or less; and the transparent conductive layer has a specific resistance of 1.1×10?4 ?·cm or more and 2.8×10—4 ?·cm or less.

Abstract: Disclosed is a polarizing plate with a pressure sensitive adhesive including an infrared reflecting layer and a pressure sensitive adhesive layer in this over on one surface of a polarizer. The pressure sensitive adhesive layer is an outermost surface layer of the polarizing plate with a pressure sensitive adhesive. The polarizing plate with a pressure sensitive adhesive may further include a quarter wave plate.

Abstract: This polarizing film is characterized by comprising an inorganic layer on one or both surfaces of a polarizing element. The polarizing film has barrier properties against steam, and, even when used in the mode of a polarizing film with an adhesive layer, has good adhesion with the adhesive layer.

Abstract: A transparent conductive film includes a polymeric film substrate and a transparent conductive layer on at least one of main surfaces of the polymeric film substrate. The transparent conductive layer is a crystalline transparent conductive layer comprising an indium tin composite oxide. The transparent conductive layer has a residual stress of less than or equal to 600 MPa. The transparent conductive layer has a specific resistance of 1.1×10?4 ?·cm to 3.0×10?4 ?·cm. The transparent conductive layer has a thickness of 15 nm to 40 nm.

Abstract: A conductive film includes an elongated film base, a first conductive layer, a second conductive layer and a third conductive layer in this order. The elongated film base has a longitudinal direction and a width direction orthogonal to the longitudinal direction. The width direction dimension of the elongated film base is greater than or equal to 1 m. The first conductive layer is an indium-based oxide layer. The second conductive layer is a metal layer. The third conductive layer is an oxidized metal layer having a thickness of 1 nm to 15 nm formed by sputter deposition.