Patents by Inventor Nozomu Emura

Nozomu Emura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180348643
    Abstract: An exposure apparatus includes a sensor for detecting light arriving from a projection optical system via a liquid provided on an image plane side of the projection optical system. The sensor includes a light transmissive member provided on a stage and a light receiving element for receiving light arriving from the projection optical system via the light transmissive member. The light transmissive member includes a first surface and a second surface. The first surface is arranged on the stage, comes into contact with the liquid, and is a surface on which the light arriving from the projection optical system is incident via the liquid. At least one of the first and second surfaces diffuses or diffracts the light having arrived from the projection optical system. The light receiving element receives the light that has been diffused or diffracted.
    Type: Application
    Filed: July 13, 2018
    Publication date: December 6, 2018
    Applicant: NIKON CORPORATION
    Inventors: Hisashi NISHINAGA, Ikuo HIKIMA, Mitsunori TOYODA, Masahiro NAKAGAWA, Tsuneyuki HAGIWARA, Yasushi MIZUNO, Naonori KITA, Osamu TANITSU, Nozomu EMURA
  • Patent number: 10025194
    Abstract: An exposure apparatus includes an optical member that can be provided on a stage. The optical member has a first surface contacting a liquid when moved to face a projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and the first surface. The optical member is configured such that at least a large-angle ray of the light, which has an angle with an optical axis of the projection system sufficiently large to undergo total reflection at an end surface of the projection system when the liquid is absent, travels from the projection system to the second surface without passing through gas. The second surface transmits the large-angle ray, which is received by the light-receiving surface.
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: July 17, 2018
    Assignee: NIKON CORPORATION
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
  • Publication number: 20170082925
    Abstract: An exposure apparatus includes an optical member that can be provided on a stage. The optical member has a first surface contacting a liquid when moved to face a projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and the first surface. The optical member is configured such that at least a large-angle ray of the light, which has an angle with an optical axis of the projection system sufficiently large to undergo total reflection at an end surface of the projection system when the liquid is absent, travels from the projection system to the second surface without passing through gas. The second surface transmits the large-angle ray, which is received by the light-receiving surface.
    Type: Application
    Filed: December 5, 2016
    Publication date: March 23, 2017
    Applicant: NIKON CORPORATION
    Inventors: Hisashi NISHINAGA, Ikuo HIKIMA, Mitsunori TOYODA, Masahiro NAKAGAWA, Tsuneyuki HAGIWARA, Yasushi MIZUNO, Naonori KITA, Osamu TANITSU, Nozomu EMURA
  • Patent number: 9513558
    Abstract: An exposure apparatus irradiates a substrate with light via a projection system and liquid, and includes a stage that moves below the projection system, and a light-receiving element having a light-receiving surface. An optical member provided on the stage has a first surface contacting the liquid when moved to face the projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and the first surface. The optical member is configured such that at least a large-angle ray of the light, which has an angle with an optical axis of the projection system sufficiently large to undergo total reflection at an end surface of the projection system when the liquid is absent, travels from the projection system to the second surface without passing through gas. The second surface transmits the large-angle ray, which is received by the light-receiving surface.
    Type: Grant
    Filed: May 2, 2014
    Date of Patent: December 6, 2016
    Assignee: NIKON CORPORATION
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
  • Publication number: 20140240685
    Abstract: An exposure apparatus irradiates a substrate with light via a projection system and liquid, and includes a stage that moves below the projection system, and a light-receiving element having a light-receiving surface. An optical member provided on the stage has a first surface contacting the liquid when moved to face the projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and the first surface. The optical member is configured such that at least a large-angle ray of the light, which has an angle with an optical axis of the projection system sufficiently large to undergo total reflection at an end surface of the projection system when the liquid is absent, travels from the projection system to the second surface without passing through gas. The second surface transmits the large-angle ray, which is received by the light-receiving surface.
    Type: Application
    Filed: May 2, 2014
    Publication date: August 28, 2014
    Applicant: NIKON CORPORATION
    Inventors: Hisashi NISHINAGA, Ikuo HIKIMA, Mitsunori TOYODA, Masahiro NAKAGAWA, Tsuneyuki HAGIWARA, Yasushi MIZUNO, Naonori KITA, Osamu TANITSU, Nozomu EMURA
  • Patent number: 8749759
    Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
    Type: Grant
    Filed: October 2, 2012
    Date of Patent: June 10, 2014
    Assignee: Nikon Corporation
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
  • Patent number: 8139198
    Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
    Type: Grant
    Filed: April 14, 2006
    Date of Patent: March 20, 2012
    Assignee: Nikon Corporation
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
  • Publication number: 20080042068
    Abstract: A sensor is used at a substrate level in a lithographic projection apparatus having a projection system with a numeric aperture that is greater than 1 and is configured to project a patterned radiation beam onto a target portion of a substrate The sensor includes a radiation-detector; a transmissive plate having a front surface and a back surface, the transmissive plate being positioned such that radiation projected by the projection system passes into the front surface of the transmissive plate and out of the back surface thereof to the radiation detector; and a luminescent layer provided on the back surface of the transmissive plate, the luminescent layer absorbing the radiation and emitting luminescent radiation of a different wavelength, wherein the back surface is rough.
    Type: Application
    Filed: August 31, 2007
    Publication date: February 21, 2008
    Applicant: NIKON CORPORATION
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
  • Publication number: 20060181690
    Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
    Type: Application
    Filed: April 14, 2006
    Publication date: August 17, 2006
    Applicant: NIKON CORPORATION
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura
  • Publication number: 20060170891
    Abstract: A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
    Type: Application
    Filed: March 28, 2006
    Publication date: August 3, 2006
    Applicant: NIKON CORPORATION
    Inventors: Hisashi Nishinaga, Ikuo Hikima, Mitsunori Toyoda, Masahiro Nakagawa, Tsuneyuki Hagiwara, Yasushi Mizuno, Naonori Kita, Osamu Tanitsu, Nozomu Emura