Patents by Inventor Nyi Oo Myo

Nyi Oo Myo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240044004
    Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. The thermal process chamber includes a substrate support, a first plurality of heating elements disposed over or below the substrate support, and a spot heating module disposed over the substrate support. The spot heating module is utilized to provide local heating of cold regions on a substrate disposed on the substrate support during processing. Localized heating of the substrate improves temperature profile, which in turn improves deposition uniformity.
    Type: Application
    Filed: October 18, 2023
    Publication date: February 8, 2024
    Inventors: Shu-Kwan LAU, Koji NAKANISHI, Toshiyuki NAKAGAWA, Zuoming ZHU, Zhiyuan YE, Joseph M. RANISH, Nyi Oo MYO, Errol Antonio C. SANCHEZ, Schubert S. CHU
  • Publication number: 20240026522
    Abstract: Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.
    Type: Application
    Filed: October 2, 2023
    Publication date: January 25, 2024
    Inventors: Zhepeng CONG, Schubert CHU, Nyi Oo MYO, Kartik Bhupendra SHAH, Zhiyuan YE, Richard O. COLLINS
  • Patent number: 11781212
    Abstract: Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.
    Type: Grant
    Filed: April 7, 2021
    Date of Patent: October 10, 2023
    Assignee: Applied Material, Inc.
    Inventors: Zhepeng Cong, Schubert Chu, Nyi Oo Myo, Kartik Bhupendra Shah, Zhiyuan Ye, Richard O. Collins
  • Publication number: 20230167581
    Abstract: A process kit for use in a processing chamber includes an outer liner, an inner liner configured to be in fluid communication with a gas injection assembly and a gas exhaust assembly of a processing chamber, a first ring reflector disposed between the outer liner and the inner liner, a top plate and a bottom plate attached to an inner surface of the inner liner, the top plate and the bottom plate forming an enclosure together with the inner liner, a cassette disposed within the enclosure, the cassette comprising a plurality of shelves configured to retain a plurality of substrates thereon, and an edge temperature correcting element disposed between the inner liner and the first ring reflector.
    Type: Application
    Filed: July 16, 2021
    Publication date: June 1, 2023
    Inventors: Kartik Bhupendra SHAH, Schubert S. CHU, Adel George TANNOUS, Ala MORADIAN, Nyi Oo MYO, Surajit KUMAR, Zuoming ZHU, Brian Hayes BURROWS, Vishwas Kumar PANDEY, Shu-Kwan LAU, Srinivasa RANGAPPA
  • Publication number: 20230114751
    Abstract: A substrate support assembly and processing chamber having the same are disclosed herein. In one embodiment, a substrate support assembly is provided that includes a body. The body has a center, an outer perimeter connecting a substrate support surface and a backside surface. The body additionally has a pocket disposed on the substrate support surface at the center and a lip disposed between the pocket and the outer perimeter. A layer is formed in the pocket of the substrate support surface. A plurality of discreet islands are disposed in the layer, wherein the discreet islands are disposed about a center line extending perpendicular from the substrate support surface.
    Type: Application
    Filed: October 8, 2021
    Publication date: April 13, 2023
    Inventors: Zhepeng CONG, Nyi Oo MYO, Hui CHEN, Huy D. NGUYEN, Shaofeng CHEN, Xinning LUAN, Kirk Allen FISHER, Aimee S. ERHARDT, Shawn Joseph BONHAM, Philip Michael AMOS, James M. AMOS
  • Publication number: 20220349088
    Abstract: Embodiments of the present disclosure generally relate to apparatus, systems, and methods for in-situ film growth rate monitoring. A thickness of a film on a substrate is monitored during a substrate processing operation that deposits the film on the substrate. The thickness is monitored while the substrate processing operation is conducted. The monitoring includes directing light in a direction toward a crystalline coupon. The direction is perpendicular to a heating direction. In one implementation, a reflectometer system to monitor film growth during substrate processing operations includes a first block that includes a first inner surface. The reflectometer system includes a light emitter disposed in the first block and oriented toward the first inner surface, and a light receiver disposed in the first block and oriented toward the first inner surface. The reflectometer system includes a second block opposing the first block.
    Type: Application
    Filed: April 28, 2021
    Publication date: November 3, 2022
    Inventors: Zhepeng CONG, Nyi Oo MYO, Tao SHENG, Yong ZHENG
  • Publication number: 20220325400
    Abstract: Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.
    Type: Application
    Filed: April 7, 2021
    Publication date: October 13, 2022
    Inventors: Zhepeng CONG, Schubert CHU, Nyi Oo MYO, Karlik Bhupendra SHAH, Zhiyuan YE, Richard O. COLLINS
  • Publication number: 20220262658
    Abstract: Embodiments of the present disclosure generally relate to a susceptor for thermal processing of semiconductor substrates. In one embodiment, the susceptor includes an inner region having a pattern formed in a top surface thereof, the pattern including a plurality of substrate support features separated by a plurality of venting channels. The susceptor includes a rim surrounding and coupled to the inner region, wherein the inner region is recessed relative to the rim to form a recessed pocket configured to receive a substrate. The susceptor includes a plurality of bumps extending radially inward from an inner diameter of the rim, the plurality of bumps configured to contact an outer edge of a substrate supported by the plurality of substrate support features for positioning the substrate within the recessed pocket.
    Type: Application
    Filed: February 17, 2021
    Publication date: August 18, 2022
    Inventors: Zhepeng CONG, Nyi Oo MYO
  • Publication number: 20220199436
    Abstract: A substrate processing system includes a factory interface having a controlled environment and a transfer chamber. The transfer chamber includes four first facets and three second facets, where each of the three second facets has a width that is narrower than that of each of the four first facets. A first processing chamber is attached to one of the four first facets. A first auxiliary chamber is attached to a first of the three second facets, where the first auxiliary chamber is smaller than the first processing chamber. A load lock is attached to a second of the three second facets and to the factory interface. A robot is attached to a bottom of the transfer chamber, the robot adapted to transfer substrates to and from the first processing chamber, the first auxiliary chamber, and the load lock.
    Type: Application
    Filed: May 11, 2021
    Publication date: June 23, 2022
    Inventors: Nir Merry, Schubert S. Chu, Sushant S. Koshti, Michael C. Kuchar, Nyi Oo Myo, Songjae Lee
  • Patent number: 9613835
    Abstract: Embodiments of heating lamps and heating lamp assemblies are disclosed herein. In some embodiments, a heating lamp may include a bulb; a reflector circumscribing the bulb proximate a first end of the bulb; a base coupled to the reflector on a side opposite the bulb; a handle coupled to the base on a side opposite the reflector, wherein the handle comprises a body having a first end coupled to the base and an opposing second end; a first conductor extending from the bulb and through the base and the handle in a direction opposite the bulb; and a second conductor extending from the bulb and through the base and the handle in a direction opposite the bulb.
    Type: Grant
    Filed: March 3, 2014
    Date of Patent: April 4, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Richard O. Collins, Nyi Oo Myo
  • Patent number: 9499905
    Abstract: Methods and apparatus for deposition of materials on substrates are provided herein. In some embodiments, an apparatus may include a process chamber having a substrate support; a heating system to provide heat energy to the substrate support; a gas inlet port disposed to a first side of the substrate support to provide at least one of a first process gas or a second process gas across a processing surface of the substrate; a first gas distribution conduit disposed above the substrate support and having one or more first outlets disposed along the length of the first gas distribution conduit to provide a third process gas to the processing surface of the substrate, wherein the one or more first outlets are substantially linearly arranged; and an exhaust manifold disposed to a second side of the substrate support opposite the gas inlet port to exhaust the process gases from the process chamber.
    Type: Grant
    Filed: July 12, 2012
    Date of Patent: November 22, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Mehmet Tugrul Samir, Nyi Oo Myo
  • Patent number: 9277595
    Abstract: Embodiments of heating lamps and heating lamp arrays are disclosed herein. In some embodiments, a heating lamp may include a heating lamp envelope having a filament disposed within the heating lamp envelope; a base coupled to the heating lamp envelope to support the heating lamp envelope; and one or more recesses formed in the base to provide an improved grip for a user. In some embodiments, a heating lamp array for use in a semiconductor process chamber may include a plurality of heating lamps, each heating lamp comprising a heating lamp envelope having a filament disposed within the envelope and a base coupled to the heating lamp envelope to support the envelope, the base having one or more recesses formed in the base to provide an improved grip for a user, wherein a distance between adjacent heating lamp bases is about 0.02 inches to about 0.08 inches.
    Type: Grant
    Filed: February 19, 2013
    Date of Patent: March 1, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Nyi Oo Myo
  • Publication number: 20140270732
    Abstract: Embodiments of heating lamps and heating lamp assemblies are disclosed herein. In some embodiments, a heating lamp may include a bulb; a reflector circumscribing the bulb proximate a first end of the bulb; a base coupled to the reflector on a side opposite the bulb; a handle coupled to the base on a side opposite the reflector, wherein the handle comprises a body having a first end coupled to the base and an opposing second end; a first conductor extending from the bulb and through the base and the handle in a direction opposite the bulb; and a second conductor extending from the bulb and through the base and the handle in a direction opposite the bulb.
    Type: Application
    Filed: March 3, 2014
    Publication date: September 18, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: RICHARD O. COLLINS, NYI OO MYO
  • Publication number: 20140026816
    Abstract: Substrate processing apparatus and gas distribution apparatus are provided herein. In some embodiments, a gas distribution apparatus includes a first quartz layer having a plurality of openings disposed through the first quartz layer; a second quartz layer coupled to the first quartz layer; a first plenum fluidly coupled to a first set of the plurality of openings and disposed between the first quartz layer and the second quartz layer; a second plenum fluidly coupled to a second set of the plurality of openings and disposed between the first quartz layer and the second quartz layer; and one or more outlets disposed on a side of the gas distribution apparatus opposite the plurality of openings disposed through the first quartz layer to provide a gas to the side of the gas distribution apparatus opposite the first quartz layer.
    Type: Application
    Filed: July 9, 2013
    Publication date: January 30, 2014
    Inventors: NYI OO MYO, MEHMET TUGRUL SAMIR
  • Publication number: 20130019803
    Abstract: Methods and apparatus for deposition of materials on substrates are provided herein. In some embodiments, an apparatus may include a process chamber having a substrate support; a heating system to provide heat energy to the substrate support; a gas inlet port disposed to a first side of the substrate support to provide at least one of a first process gas or a second process gas across a processing surface of the substrate; a first gas distribution conduit disposed above the substrate support and having one or more first outlets disposed along the length of the first gas distribution conduit to provide a third process gas to the processing surface of the substrate, wherein the one or more first outlets are substantially linearly arranged; and an exhaust manifold disposed to a second side of the substrate support opposite the gas inlet port to exhaust the process gases from the process chamber.
    Type: Application
    Filed: July 12, 2012
    Publication date: January 24, 2013
    Applicant: APPLIED MATERIALS, INC.
    Inventors: TUGRUL SAMIR, NYI OO MYO
  • Patent number: 8343279
    Abstract: Embodiments of the invention provide apparatuses and methods for depositing materials on substrates during vapor deposition processes, such as atomic layer deposition (ALD). In one embodiment, a chamber contains a substrate support with a receiving surface and a chamber lid containing an expanding channel formed within a thermally insulating material. The chamber further includes at least one conduit coupled to a gas inlet within the expanding channel and positioned to provide a gas flow through the expanding channel in a circular direction, such as a vortex, a helix, a spiral or derivatives thereof. The expanding channel may be formed directly within the chamber lid or formed within a funnel liner attached thereon. The chamber may contain a retaining ring, an upper process liner, a lower process liner or a slip valve liner. Liners usually have a polished surface finish and contain a thermally insulating material such as fused quartz or ceramic.
    Type: Grant
    Filed: May 12, 2005
    Date of Patent: January 1, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Nyi Oo Myo, Kenric Choi, Shreyas Kher, Pravin Narwankar, Steve Poppe, Craig R. Metzner, Paul Deaten
  • Patent number: 8282992
    Abstract: Embodiments of the invention provide methods for depositing materials on substrates during vapor deposition processes, such as atomic layer deposition (ALD). In one embodiment, a chamber contains a substrate support with a receiving surface and a chamber lid containing an expanding channel formed within a thermally insulating material. The chamber further includes at least one conduit coupled to a gas inlet within the expanding channel and positioned to provide a gas flow through the expanding channel in a circular direction, such as a vortex, a helix, a spiral, or derivatives thereof. The expanding channel may be formed directly within the chamber lid or formed within a funnel liner attached thereon. The chamber may contain a retaining ring, an upper process liner, a lower process liner or a slip valve liner. Liners usually have a polished surface finish and contain a thermally insulating material such as fused quartz or ceramic.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: October 9, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Nyi Oo Myo, Kenric Cho, Shreyas Kher, Pravin Narwankar, Steve Poppe, Craig R. Metzner, Paul Deaten
  • Patent number: 8217574
    Abstract: Embodiments of a lamp having an internal fuse system are provided herein. In some embodiments, a lamp may include a transparent housing; a filament disposed in the housing, the filament having a main body disposed between a first end and a second end of the filament; a first conductor coupled to the filament at the first end of the filament; a first interceptor bar disposed in the housing and beneath the main body of the filament, wherein the first interceptor bar is coupled to the second end of the filament; a second conductor disposed proximate the first end of the filament and conductively coupled to the second end of the filament via the first interceptor bar, wherein the first interceptor bar is positioned such that an electrical short forms between the first and second conductors when the main body of the filament contacts the first interceptor bar.
    Type: Grant
    Filed: April 2, 2010
    Date of Patent: July 10, 2012
    Assignee: Applied Materials, Inc.
    Inventors: Balasubramanian Ramachandran, Nyi Oo Myo, Joseph M. Ranish, Akio Takahashi
  • Publication number: 20100308729
    Abstract: Embodiments of a lamp having an internal fuse system are provided herein. In some embodiments, a lamp may include a transparent housing; a filament disposed in the housing, the filament having a main body disposed between a first end and a second end of the filament; a first conductor coupled to the filament at the first end of the filament; a first interceptor bar disposed in the housing and beneath the main body of the filament, wherein the first interceptor bar is coupled to the second end of the filament; a second conductor disposed proximate the first end of the filament and conductively coupled to the second end of the filament via the first interceptor bar, wherein the first interceptor bar is positioned such that an electrical short forms between the first and second conductors when the main body of the filament contacts the first interceptor bar.
    Type: Application
    Filed: April 2, 2010
    Publication date: December 9, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: BALASUBRAMANIAN RAMACHANDRAN, NYI OO MYO, JOSEPH M. RANISH, AKIO TAKAHASHI
  • Patent number: D613321
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: April 6, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Kevin Bautista, Nyi Oo Myo