Patents by Inventor Ofir Greenberg

Ofir Greenberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Determining locations of suspected defects
    Patent number: 11301987
    Abstract: A method, a non-transitory computer readable medium and a detection system for determining locations of suspected defects of a substrate.
    Type: Grant
    Filed: March 3, 2020
    Date of Patent: April 12, 2022
    Assignee: Applied Materials Israel Ltd.
    Inventors: Ofir Greenberg, Dan Segal, Dae Hwan Youn, Tal Ben-Shlomo
  • DETERMINING LOCATIONS OF SUSPECTED DEFECTS
    Publication number: 20210279848
    Abstract: A method, a non-transitory computer readable medium and a detection system for determining locations of suspected defects of a substrate.
    Type: Application
    Filed: March 3, 2020
    Publication date: September 9, 2021
    Inventors: Ofir Greenberg, Dan Segal, Dae Hwan Youn, Tal Ben-Shlomo
  • Review of suspected defects using one or more reference dies
    Patent number: 9673022
    Abstract: A system for reviewing a wafer, the system may include a memory unit that is configured to store information about locations of a set of suspected defects that are located at multiple dice of the wafer; electron optics that is configured to obtain images of reference elements, wherein the reference elements are located within a first reference die of the wafer; and a processor that is configured to: compare the first sub-set of suspected defects to a first sub-set of reference elements to provide a first evaluation result; and select, in response to the first evaluation result, a source of a second sub-set of reference elements. The electron optics is further configured to obtain images of a second sub-set of reference elements that are located within a second reference die of the wafer when it is determined that the second reference die is the source of the second sub-set of reference elements.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: June 6, 2017
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Ofir Greenberg, Yuval Gronau
  • REVIEW OF SUSPECTED DEFECTS USING ONE OR MORE REFERENCE DIES
    Publication number: 20170018398
    Abstract: A system for reviewing a wafer, the system may include a memory unit that is configured to store information about locations of a set of suspected defects that are located at multiple dice of the wafer; electron optics that is configured to obtain images of reference elements, wherein the reference elements are located within a first reference die of the wafer; and a processor that is configured to: compare the first sub-set of suspected defects to a first sub-set of reference elements to provide a first evaluation result; and select, in response to the first evaluation result, a source of a second sub-set of reference elements. The electron optics is further configured to obtain images of a second sub-set of reference elements that are located within a second reference die of the wafer when it is determined that the second reference die is the source of the second sub-set of reference elements.
    Type: Application
    Filed: July 13, 2015
    Publication date: January 19, 2017
    Inventors: Ofir Greenberg, Yuval Gronau
  • System and method for scanning an object
    Patent number: 9490101
    Abstract: A system for scanning an object, the system may include (a) charged particles optics that is configured to: scan, with a charged particle beam and at a first scan rate, a first region of interest (ROI) of an area of the object; detect first particles that were generated as a result of the scanning of the first ROI; scan, with the charged particle beam and at a second scan rate, a second ROI of the area of the object; wherein the second scan rate is lower than the first scan rate; wherein first ROI differs from the second ROI by at least one parameter; detect second particles that were generated as a result of the scanning of the second ROA; and (b) a processor that is configured to generate at least one image of the area in response to the first and second particles.
    Type: Grant
    Filed: March 16, 2015
    Date of Patent: November 8, 2016
    Assignee: Applied Materials Israel Ltd.
    Inventors: Yuval Gronau, Ishai Schwarzband, Benzion Sender, Dror Shemesh, Ran Schleyen, Ofir Greenberg
  • SYSTEM AND METHOD FOR SCANNING AN OBJECT
    Publication number: 20160276127
    Abstract: A system for scanning an object, the system may include (a) charged particles optics that is configured to: scan, with a charged particle beam and at a first scan rate, a first region of interest (ROI) of an area of the object; detect first particles that were generated as a result of the scanning of the first ROI; scan, with the charged particle beam and at a second scan rate, a second ROI of the area of the object; wherein the second scan rate is lower than the first scan rate; wherein first ROI differs from the second ROI by at least one parameter; detect second particles that were generated as a result of the scanning of the second ROA; and (b) a processor that is configured to generate at least one image of the area in response to the first and second particles.
    Type: Application
    Filed: March 16, 2015
    Publication date: September 22, 2016
    Inventors: Yuval Gronau, Ishai Schwarzband, Benzion Sender, Dror Shemesh, Ran Schleyen, Ofir Greenberg