Abstract: A method of testing semiconductor wafers includes receiving a wafer bin map for a semiconductor wafer, wherein the wafer bin map includes a plurality of points corresponding to a plurality of defective dies fabricated on the semiconductor wafer, identifying a cluster of points in the wafer bin map from the plurality of points, and generating a filtered bin map using the cluster of points. The method also includes extracting a set of features for the filtered bin map, wherein the set of features comprises a set of global features common to the semiconductor wafer and a set of cluster features specific to the filtered bin map, executing a trained machine learning model using the set of features as inputs to generate a pattern classification, and determining, based on the pattern classification, that the semiconductor wafer includes a pattern of defective dies caused by a defective manufacturing process.