Patents by Inventor Ohk-Min Jeon

Ohk-Min Jeon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10274824
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Grant
    Filed: May 12, 2016
    Date of Patent: April 30, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Min-Kyung Jang, Eui Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon
  • Publication number: 20160334703
    Abstract: New photobase generators suitable for use in photoresists are provided that correspond to Formula (I): X1—R1—O—C(?O)N(R2)R3??(I) wherein X1 is an optionally substituted aromatic group; R1 is a linker; and R2 and R3 are the same or different optionally substituted linear, branched or cyclic aliphatic group or an optionally substituted aromatic group, wherein at least one of R2 and R3 is an optionally substituted branched alkyl group having 4 or more carbon atoms.
    Type: Application
    Filed: May 12, 2016
    Publication date: November 17, 2016
    Inventors: Min-Kyung Jang, Eui-Hyun Ryu, Chang-Young Hong, Myung Yeol Kim, Jung-June Lee, Dong-Je Hong, Dong-Yong Kim, Hae-Jin Lim, Jae Yun Ahn, Ohk-Min Jeon