Abstract: Embodiments provide a lens moving apparatus including a bobbin including a first coil disposed on an outer circumferential surface thereof, a housing provided with first and second magnets for moving the bobbin by interaction with the first coil, upper and lower elastic members each coupled to both the bobbin and the housing, and a first position sensor for detecting a sum of intensities of magnetic fields of the first and second magnets, wherein the first position sensor is disposed in a space between the first magnet and the second magnet when the bobbin is disposed at an initial position.

Abstract: Provided is a method for manufacturing syngas including (S1) heat-treating organic wastes under hydrogen and a catalyst in a first reactor; (S2) separating the catalyst and the hydrogen from a product of (S1) and recovering a first mixed gas from which the catalyst and the hydrogen have been removed; (S3) reforming the first mixed gas recovered in (S2) with water vapor to form a product; (S4) separating carbon dioxide from a product of (S3) and recovering a second mixed gas from which the carbon dioxide has been removed; (S5) converting the carbon dioxide separated in (S4) into carbon monoxide through a reverse Boudouard reaction in the second reactor; and (S6) mixing the hydrogen separated in (S2), the mixed gas recovered in (S4), and the carbon monoxide converted in (S5) to produce syngas.

Abstract: A lens moving apparatus includes a bobbin including a first coil disposed therearound, a first magnet disposed to face the first coil, a housing for supporting the first magnet, upper and lower elastic members each coupled to both the bobbin and the housing, a base disposed to be spaced apart from the housing by a predetermined distance, a second coil disposed to face the first magnet, a printed circuit board on which the second coil is mounted, a plurality of support members, which support the housing such that the housing is movable in second and/or third directions and which connect at least one of the upper and lower elastic members to the printed circuit board, and a conductive member for conductively connecting the upper and lower elastic members.

Abstract: Provided is a method of manufacturing syngas including (S1) heat-treating organic wastes under a catalyst in a first reactor to produce a first mixed gas; (S2) separating the catalyst and carbon dioxide (CO2) from the first mixed gas, and recovering a mixed gas from which the catalyst and the carbon dioxide (CO2) have been removed; (S3) converting the carbon dioxide (CO2) separated in (S2) into carbon monoxide (CO) by a reverse Boudouard reaction in a second reactor; and (S4) mixing the mixed gas recovered in (S2) and the carbon monoxide (CO) converted in (S3) to produce syngas.

Abstract: Disclosed is a lens driving apparatus. The lens driving apparatus includes a base formed at a center thereof with a first opening; a housing coupled with the base and having a second opening corresponding to the first opening; a yoke installed on the base and including a horizontal plate having a third opening corresponding to the first opening and a vertical plate protruding upward from the horizontal plate; a bobbin movably installed in the yoke and coupled with a lens module; a coil fixedly disposed around the bobbin; a plurality of magnets provided at the vertical plate of the yoke to face the coil; and a spring installed on at least one of upper and lower portions of the yoke to return the bobbin, which has moved up due to interaction between the magnet and the coil, to its initial position.

Abstract: The present invention relates to an anti-VAMP2 antibody that inhibits SNARE complex and uses thereof, and more specifically, the present invention relates to an anti-VAMP2 antibody or antigen-binding fragments thereof comprising heavy and light chain CDRs of a specific sequence. The anti-VAMP2 antibody is expected to be useful for improving or treating skin wrinkles by inhibiting SNARE complex formation.

Abstract: An embodiment includes: a housing including an upper surface, a lower surface, an inner surface, and an outer surface located at the side opposite to the inner surface; a bobbin accommodated in the housing; a first coil disposed at an outer surface of the bobbin; a first magnet disposed at the outer surface of the housing; a second magnet disposed in the housing so as to be spaced apart from the first magnet; and a first position sensor disposed at the outer surface of the bobbin, wherein a first part of the housing is positioned between the second magnet and the inner surface of the housing.

Abstract: A color conversion substrate and a display device are provided. The color conversion substrate includes a base substrate, a first color filter and a second color filter disposed on a surface of the base substrate, a first partition layer disposed between the first color filter and the second color filter, a second partition layer disposed on the first partition layer, a first wavelength conversion pattern disposed on the first color filter and a second wavelength conversion pattern disposed on the second color filter, wherein the first partition layer includes a first lower surface disposed on the first color filter and a second lower surface disposed on the second color filter.

Abstract: A lens driving device is provided, the lens driving device includes: a housing; a bobbin disposed inside of the housing; a support member coupled to the bobbin and the housing; and a sensor sensing a position of at least one of the bobbin and the housing, wherein the support member may include a first support unit, and a second support unit disposed not parallel to the first support unit, wherein the sensor may be disposed more adjacent to the first support unit than to the second support unit, and wherein an elastic modulus of the first support unit may be lower than an elastic modulus of the second support unit.

Abstract: An embodiment comprises: a housing comprising side parts, a first corner part, a second corner part, a third corner part, and a fourth corner part, in which each of the first corner part, the second corner part, the third corner part and the fourth corner is disposed between two adjacent side parts; a bobbin disposed in the housing; a first coil disposed on an outer surface of the bobbin; first magnets disposed on the side parts of the housing; a first circuit board disposed on the first corner part and comprising a first pad, a second pad, a third pad, a fourth pad, a fifth pad and a sixth pad; a first location sensor disposed on the first circuit board and electrically connected to the first pad, the second pad, the third pad, the fourth pad, the fifth pad and the sixth pad; first, second, third and fourth upper springs disposed apart from each other on the housing; and first and second lower springs coupled to a lower portion of the housing, electrically connected with the first coil, and coupled to the fi

Abstract: A method for fabricating an electronic device including a semiconductor memory may include: forming a material layer over a substrate; forming a material pattern by etching the material layer, the etching providing an etch residue on sidewalls of the material pattern; and removing the etch residue, wherein removing of the etch residue includes performing a cleaning process using a cleaning composition including water and a fluorine-containing compound or an amine, and having a pH in a range of 7 to 14.

Abstract: Provided is an electrostatic chuck including: a base material; an adsorption unit for adsorbing a wafer by using electrostatic force; an adhesive layer for adhering the adsorption unit to the base material; and an adhesive layer anti-corrosion coating layer provided to cover an exposed surface of the adhesive layer, wherein the adhesive layer anti-corrosion coating layer has no pores or cracks since the adhesive layer anti-corrosion coating layer is made by a method of spraying and coating, at conditions of 0-50° C.

Abstract: A method for fabricating an electronic device including a semiconductor memory may include: forming a material layer over a substrate; forming a material pattern by etching the material layer, the etching providing an etch residue on sidewalls of the material pattern; and removing the etch residue, wherein removing of the etch residue includes performing a cleaning process using a cleaning composition including water and a fluorine-containing compound or an amine, and having a pH in a range of 7 to 14.

Abstract: The present invention relates to a metal oxide layer structure formed on the surface of a substrate, in which the atomic numbers of the element metal and the element oxygen in the metal oxide layer are in a non-stoichiometric ratio, so that the metal oxide layer has a high density corresponding to 90-100% of the metal oxide before coating and is free of cracks and pores. The metal oxide layer structure is formed of a metal oxide represented by XaYb (X: a metal element, Y: the element oxygen, a: the atomic number of the metal element, and b: the atomic number of the element oxygen), and the atomic percent of the metal element is greater than {a/(a+b)}×100(%). The layer structure is formed of nano-crystalline particles and nano-amorphous particles, and the particles forming the layer structure do not undergo heat-induced growth and heat-induced conversion to crystalline particles.

Abstract: Provided is an apparatus and a method of spray-coating solid powder on a substrate disposed in a coating chamber which is in a vacuum state, and more particularly, to an apparatus and a method for coating solid powder, which are configured such that a gas sucked from an atmospheric pressure gas, together with a gas supplied from a gas supply unit, can be used as a carrier gas for transporting the solid powder.

Abstract: Provided is a processing component of equipment for manufacturing a semiconductor or a display. A ceramic coated film is formed on a surface of a body of the processing component, in a state in which some or the entirety of valleys and peaks are removed, such that a surface roughness Rz, which is expressed as an absolute value (P1+P2+P3+P4+P5)/5?(V1+V2+V3+V4+V5)/5 corresponding to a difference between an average of distances between the deepest five valleys V1, V2, V3, V4 and V5 in a section in which the surface roughness is measured and an arbitrary datum line that is parallel to a center line at which an area of peaks and an area of valleys are equal to each other in the section in which the surface roughness is measured and an average of distances between the highest five peaks P1, P2, P3, P4 and P5 in the section in which the surface roughness is measured and the arbitrary datum line, is lower than 5.0 ?m.

Abstract: Provided is a chemical vapor deposition (CVD) process chamber component located in a CVD process chamber, wherein the component is a three-dimensional object including a material containing an aluminum element, an aluminum fluoride (AlF3) barrier film with no crack is formed along a three-dimensional surface of the component, and the aluminum fluoride barrier film is formed by spraying and coating ceramic powder including yttrium (Y) or including any one of SiC, ZrO2, ZrC, TiO2, TiN, TiC, TiCN, TiCl2, and HfO2 on a surface of the component without being separated from a corner and a surface of the component.

Abstract: Provided is an electrostatic chuck including: a base material; an adsorption unit for adsorbing a wafer by using electrostatic force; an adhesive layer for adhering the adsorption unit to the base material; and an adhesive layer anti-corrosion coating layer provided to cover an exposed surface of the adhesive layer, wherein the adhesive layer anti-corrosion coating layer has no pores or cracks since the adhesive layer anti-corrosion coating layer is made by a method of spraying and coating, at conditions of 0-50° C.

Abstract: The present invention relates to a metal oxide layer structure formed on the surface of a substrate, in which the atomic numbers of the element metal and the element oxygen in the metal oxide layer are in a non-stoichiometric ratio, so that the metal oxide layer has a high density corresponding to 90-100% of the metal oxide before coating and is free of cracks and pores. The metal oxide layer structure is formed of a metal oxide represented by XaYb (X: a metal element, Y: the element oxygen, a: the atomic number of the metal element, and b: the atomic number of the element oxygen), and the atomic percent of the metal element is greater than {a/(a+b)}×100(%). The layer structure is formed of nano-crystalline particles and nano-amorphous particles, and the particles forming the layer structure do not undergo heat-induced growth and heat-induced conversion to crystalline particles.

Abstract: Provided is an apparatus and a method of spray-coating solid powder on a substrate disposed in a coating chamber which is in a vacuum state, and more particularly, to an apparatus and a method for coating solid powder, which are configured such that a gas sucked from an atmospheric pressure gas, together with a gas supplied from a gas supply unit, can be used as a carrier gas for transporting the solid powder.