Patents by Inventor Okeg V. Konochuk

Okeg V. Konochuk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of producing a high resistivity SIMOX silicon substrate
    Patent number: 7112509
    Abstract: The present invention provides a method for generating silicon-on-insulator (SOI) wafers that exhibit a high electrical resistivity. In one embodiment of a method according to the teachings of the invention, a SIMOX process is sandwiched between two Full Oxygen Precipitation (FOP) cycles that sequester interstitial oxygen present in the substrate in the form of oxide precipitates, thereby enhancing the electrical resistivity of the susbtrate.
    Type: Grant
    Filed: May 9, 2003
    Date of Patent: September 26, 2006
    Assignees: Ibis Technology Corporation, SEH America, Inc.
    Inventors: Yuri Erokhin, Okeg V. Konochuk