Patents by Inventor Okitsugu Nakata

Okitsugu Nakata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4882225
    Abstract: A modified powder or particulate material having a silicone polymer film coated on substantially the entire surface thereof, this powder or particulate material being produced by bringing at least one silicone compound, in the form of a vapor, having the general formula (I):(R.sup.1 HSiO).sub.a (R.sup.2 R.sup.3 SiO).sub.b (R.sup.4 R.sup.5 R.sup.6 SiO.sub.1/2).sub.c (I)Wherein R.sup.1, R.sup.2, and R.sup.3 represent, independently, hydrogen or a hydrocarbon residue having 1 to 10 carbon atoms, which may be substituted with at least one halogen atom, provided that R.sup.1, R.sup.2, and R.sup.3 are not hydrogen at the same time, R.sup.4, R.sup.5, and R.sup.
    Type: Grant
    Filed: April 26, 1988
    Date of Patent: November 21, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tommita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu
  • Patent number: 4818614
    Abstract: A modified powder or particulate material coated on substantially the entire surface thereof with a film of a silicone polymer carrying a pendant group thereon, this powder or particulate material being produced by a process comprising the steps of(a) coating the powder or particulate material with a film of a silicone polymer having at least one Si-H moiety, and(b) carrying out an addition reaction of a compound capable of reacting with an Si--H moiety to the Si--H moiety in the silicone polymer of step (a), whereby the pendant group derived from said compound is bonded to the silicone polymer.
    Type: Grant
    Filed: July 25, 1986
    Date of Patent: April 4, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tomita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu
  • Patent number: 4801445
    Abstract: A modified powder or particulate material having a silicone polymer film coated on substantially the entire surface thereof, this powder or particulate material being produced by bringing at least one silicone compound, in the form of a vapor, having the general formula (I):(R.sup.1 HSiO).sub.a (R.sup.2 R.sup.3 SiO).sub.b (R.sup.4 R.sup.5 R.sup.6 SiO.sub.1/2).sub.c (I)wherein R.sup.1, R.sup.2, and R.sup.3 represent, independently, hydrogen or a hydrocarbon residue having 1 to 10 carbon atoms, which may be substituted with at least one halogen atom, provided that R.sup.1, R.sup.2, and R.sup.3 are not hydrogen at the same time, R.sup.4, R.sup.5, and R.sup.
    Type: Grant
    Filed: June 17, 1986
    Date of Patent: January 31, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tomita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu
  • Patent number: 4743377
    Abstract: A packing material for liquid chromatography, comprising particles having a silicone polymer film coated on substantially the entire surface thereof, the packing material being produced by a process comprising the steps of:(a) bringing at least one silicone compound having the general formula (I):(R.sup.1 HSiO).sub.a (R.sup.2 R.sup.3 SiO).sub.b (R.sup.4 R.sup.5 R.sup.6 SiO.sub.1/2).sub.c (I)wherein R.sup.1, R.sup.2, and R.sup.3 represent, independently, a hydrocarbon residue having 1 to 10 carbon atoms, which may be substituted with at least one halogen atom, R.sup.4, R.sup.5, and R.sup.
    Type: Grant
    Filed: June 30, 1986
    Date of Patent: May 10, 1988
    Assignee: Shiseido Company Ltd.
    Inventors: Yutaka Ohtsu, Hiroshi Fukui, Motokiyo Nakano, Okitsugu Nakata, Taketoshi Kanda, Isao Tanaka, Osamu Shirota, Junichi Koyama