Patents by Inventor Oleg P. Kishkovich
Oleg P. Kishkovich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8776841Abstract: The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be “recharged” during the substantially continual purging of the reticle, a reduced desirable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system.Type: GrantFiled: June 19, 2007Date of Patent: July 15, 2014Assignee: Entegris, Inc.Inventors: Oleg P. Kishkovich, Xavier Gabarre, William M. Goodwin, James Lo, Troy Scoggins
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Patent number: 8398753Abstract: The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.Type: GrantFiled: June 7, 2005Date of Patent: March 19, 2013Assignee: Entegris, Inc.Inventors: John E. Sergi, John Gaudreau, Oleg P. Kishkovich, William Goodwin, Devon A. Kinkead
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Publication number: 20110114129Abstract: Components, systems, and methods for maintaining an extremely dry environment within substrate containers formed of polymers provides supplemental exterior gas washing of the substrate container to minimize permeation of moisture and oxygen through the polymer walls of the container and to control desorption of water entrapped in the polymer walls of the container.Type: ApplicationFiled: December 18, 2008Publication date: May 19, 2011Applicant: ENTEGRIS, INC.Inventors: Oleg P. Kishkovich, David L. Halbmaier, Anatoly Grayfer
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Patent number: 7922791Abstract: The present invention provides a filtering system for a semiconductor processing tool. In one embodiment, the filtering system is associated with the semiconductor processing tool. A system of the invention comprises a first and second filter layer in fluid communication with a gas flow path. The flow path is a gas stream comprising volatile silica containing compounds such as hexamethyldisiloxane and trimethylsilanol. The gas flow path passes through the first and second filter layer to fluidly communicate with the semiconductor processing tool. Preferably, the first filter layer of the filtering system is upstream along the gas flow path from the second filter layer. The medias of the first and second filter layers are selected and arranged based on given contaminant concentrations.Type: GrantFiled: July 13, 2007Date of Patent: April 12, 2011Assignee: Entegris, Inc.Inventors: Anatoly Grayfer, Oleg P. Kishkovich
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Publication number: 20100294397Abstract: The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be “recharged” during the substantially continual purging of the reticle, a reduced desirable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system.Type: ApplicationFiled: June 19, 2007Publication date: November 25, 2010Applicant: ENTEGRIS, INC.Inventors: Oleg P. Kishkovich, Xavier Gabarre, William M. Goodwin, James Lo, Troy Scoggins
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Publication number: 20090320681Abstract: The present invention provides a filtering system for a semiconductor processing tool. In one embodiment, the filtering system is associated with the semiconductor processing tool. A system of the invention comprises a first and second filter layer in fluid communication with a gas flow path. The flow path is a gas stream comprising volatile silica containing compounds such as hexamethyldisiloxane and trimethylsilanol. The gas flow path passes through the first and second filter layer to fluidly communicate with the semiconductor processing tool. Preferably, the first filter layer of the filtering system is upstream along the gas flow path from the second filter layer. The medias of the first and second filter layers are selected and arranged based on given contaminant concentrations.Type: ApplicationFiled: July 13, 2007Publication date: December 31, 2009Applicant: Entegris, Inc.Inventors: Anatoly Grayfer, Oleg P. Kishkovich
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Patent number: 7540901Abstract: A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalchols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.Type: GrantFiled: February 28, 2006Date of Patent: June 2, 2009Assignee: Entegris, Inc.Inventors: Oleg P. Kishkovich, Devon Kinkead, Anatoly Grayfer, William M. Goodwin, David Ruede
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Publication number: 20080257159Abstract: The present invention relates to systems and methods for controlling humidity and temperature in gases or air streams used in semiconductor processing systems. These systems and methods can be used in combination with systems and methods for contaminant detection and removal.Type: ApplicationFiled: February 11, 2008Publication date: October 23, 2008Applicant: Entegris, Inc.Inventors: William M. Goodwin, Oleg P. Kishkovich, Anatoly Grayfer
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Patent number: 7400383Abstract: The present invention provides a standardized mechanical interface (SMIF) reticle pod that is configured to provide a controlled environment for supporting a reticle wherein the controlled environment is maintained substantially free of crystal growth causing contaminants. Accordingly, there is provided a layered filter with filter elements capable of filtering particulates and adsorbing gaseous contaminants. The filter has an inwardly facing face generally planar shaped with a surface area that is substantially half or more of the area of the reticle face. The inwardly facing face is placed in close proximity to the reticle patterned surface and has an area that is a significant fraction of the reticle patterned surface area. The SMIF pod is also provided with a purge system configured to inject a very dry gas within the controlled environment to flush the controlled environment of contaminants as well as to regenerate the filter.Type: GrantFiled: April 3, 2006Date of Patent: July 15, 2008Assignee: Entegris, Inc.Inventors: David L. Halbmaier, Anthony Simpson, William M. Goodwin, Oleg P. Kishkovich, Thomas B. Kielbaso, Frank Manganiello
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Publication number: 20080078289Abstract: The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.Type: ApplicationFiled: June 7, 2005Publication date: April 3, 2008Inventors: John E. Sergi, John Gaudreau, Oleg P. Kishkovich, William Goodwin, Devon A. Kinkead
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Patent number: 7329308Abstract: The present invention relates to systems and methods for controlling humidity and temperature in gases or air streams used in semiconductor processing systems. These systems and methods can be used in combination with systems and methods for contaminant detection and removal.Type: GrantFiled: July 9, 2004Date of Patent: February 12, 2008Assignee: Entegris, Inc.Inventors: William M. Goodwin, Oleg P. Kishkovich, Anatoly Grayfer
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Patent number: 7092077Abstract: The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.Type: GrantFiled: September 15, 2003Date of Patent: August 15, 2006Assignee: Entegris, Inc.Inventors: Oleg P. Kishkovich, Anatoly Grayfer, William M. Goodwin, Devon Kinkead
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Patent number: 7014693Abstract: A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalchols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.Type: GrantFiled: May 21, 2004Date of Patent: March 21, 2006Assignee: Mykrolis CorporationInventors: Oleg P. Kishkovich, Devon Kinkead, Anatoly Grayfer, William M. Goodwin, David Ruede
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Patent number: 6855557Abstract: A detection system for detecting contaminant gases includes a converter, a detector, a primary channel for delivering a target gas sample through the converter to the detector, and at least two scrubbing channels for delivering a reference gas sample through the converter to the detector. Each of the scrubbing channels includes a scrubber for removing basic nitrogen compounds from the reference gas sample, while the primary channel preferably transmits the target gas sample without scrubbing. The converter converts gaseous nitrogen compounds in the target gas sample to an indicator gas, such as nitric oxide (NO), and a control system directs the flow of a gas sample among the primary channel and the scrubbing channels. In accordance with one aspect of the invention, the basic-nitrogen-compound concentration can be measured by comparing the concentration of the indicator gas detected in the reference sample with the detected indicator-gas concentration in the target sample.Type: GrantFiled: February 14, 2001Date of Patent: February 15, 2005Assignee: Extraction Systems, Inc.Inventors: Oleg P. Kishkovich, William M. Goodwin
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Publication number: 20040166679Abstract: The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.Type: ApplicationFiled: September 15, 2003Publication date: August 26, 2004Applicant: Extraction Systems, Inc.Inventors: Oleg P. Kishkovich, Anatoly Grayfer, William M. Goodwin, Devon Kinkead
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Patent number: 6761753Abstract: A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.Type: GrantFiled: July 26, 2002Date of Patent: July 13, 2004Assignee: Extraction Systems, Inc.Inventors: Oleg P. Kishkovich, Devon Kinkead, Anatoly Grayfer, William M. Goodwin, David Ruede
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Patent number: 6759254Abstract: A preferred embodiment includes a method for monitoring the performance of a filter positioned in an airstream in a semiconductor processing system. The method includes sampling the airstream at a location upstream of the filter to detect the molecular contaminants present in the airstream; identifying a target species of the contaminants upstream; selecting a non-polluting species of a contaminant having a concentration greater than a concentration of the target species; measuring the non-polluting species in the airstream at a plurality of locations; and determining the performance of the filter with respect to the target species from measurements of the non-polluting species. The plurality of locations includes a location downstream of the filter and at a location within the filter. Further, the method for monitoring includes generating a numerical representation of a chromatogram of the airstream sampled at a location upstream of the filter.Type: GrantFiled: September 24, 2002Date of Patent: July 6, 2004Assignee: Extraction Systems, Inc.Inventors: Oleg P. Kishkovich, Devon Kinkead, Mark C. Phelps, William M. Goodwin
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Patent number: 6740147Abstract: A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalcohols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.Type: GrantFiled: May 4, 2001Date of Patent: May 25, 2004Assignee: Extraction Systems, Inc.Inventors: Oleg P. Kishkovich, Devon Kinkead, Anatoly Grayfer, William M. Goodwin, David Ruede
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Publication number: 20040023419Abstract: The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.Type: ApplicationFiled: March 24, 2003Publication date: February 5, 2004Applicant: Extraction Systems, IncInventors: Oleg P. Kishkovich, Devon Kinkead, Mark C. Phelps, William M. Goodwin, David J. Ruede, Anatoly Grayfer, Robert Petersen
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Patent number: RE44536Abstract: A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalchols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.Type: GrantFiled: June 1, 2011Date of Patent: October 15, 2013Assignee: Entegris, Inc.Inventors: Oleg P. Kishkovich, Devon Kinkead, Anatoly Grayfer, William M. Goodwin, David Ruede