Patents by Inventor Oleg Viacheslavovich Voznyi
Oleg Viacheslavovich Voznyi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11860554Abstract: The invention provides an object positioner comprising:—an object support having an object support surface which is configured to engage at least a part of an object, said object support surface having a support surface temperature,—a thermal device, which thermal device is configured to provide at least a part of the object with a first object temperature, which first object temperature differs from the support surface temperature by a first predetermined temperature difference.Type: GrantFiled: March 27, 2020Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Mark Johannes Hermanus Frencken, Theodorus Marcus Nagtegaal, Oleg Viacheslavovich Voznyi
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Publication number: 20230251583Abstract: The present invention relates to a stage system (130), which comprises a pre-exposure element (134), and to a method employing the pre-exposure element for conditioning an optical system (100). The pre-exposure element comprises a radiation receiving area at a surface of the stage system, wherein the radiation receiving area comprises at least one pre-exposure plate configured to receive radiation. The stage system comprises further a controller (140), wherein the controller is capable to control an optical parameter of the pre-exposure element, herewith controlling a portion of received radiation reflected by the pre-exposure element.Type: ApplicationFiled: May 31, 2021Publication date: August 10, 2023Applicant: ASML Netherlands B.V.Inventors: Oleg Viacheslavovich VOZNYI, Bearrach MOEST
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Publication number: 20220214626Abstract: The invention provides an object positioner comprising:—an object support having an object support surface which is configured to engage at least a part of an object, said object support surface having a support surface temperature,—a thermal device, which thermal device is configured to provide at least a part of the object with a first object temperature, which first object temperature differs from the support surface temperature by a first predetermined temperature difference.Type: ApplicationFiled: March 27, 2020Publication date: July 7, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Mark Johannes Hermanus FRENCKEN, Theodorus Marcus NAGTEGAAL, Oleg Viacheslavovich VOZNYI
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Patent number: 8797504Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: GrantFiled: February 29, 2012Date of Patent: August 5, 2014Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Patent number: 8730448Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: GrantFiled: March 1, 2012Date of Patent: May 20, 2014Assignee: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Patent number: 8576374Abstract: According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.Type: GrantFiled: February 26, 2009Date of Patent: November 5, 2013Assignee: ASML Netherlands B.V.Inventors: Keith Frank Best, Henricus Wilhelmus Maria Van Buel, Cheng-Qun Gui, Johannes Onvlee, Rudy Jan Maria Pellens, Remi Daniel Marie Edart, Oleg Viacheslavovich Voznyi, Pascale Anne Maury
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Publication number: 20120229782Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: ApplicationFiled: February 29, 2012Publication date: September 13, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Anges Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Olesksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Publication number: 20120229783Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: ApplicationFiled: March 1, 2012Publication date: September 13, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Publication number: 20100060869Abstract: An alignment method for a substrate or a patterning device is disclosed along with a corresponding apparatus. The method includes using a part of an alignment arrangement of a lithographic apparatus to undertake a part of an alignment procedure on a part of a substrate or on a part of a patterning device, until the substrate or a part of or in the lithographic apparatus, has become thermally stabilized within a limit.Type: ApplicationFiled: September 3, 2009Publication date: March 11, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Oleg Viacheslavovich Voznyi, Johannes Onvlee, Peter Ten Berge
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Publication number: 20090237635Abstract: According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.Type: ApplicationFiled: February 26, 2009Publication date: September 24, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Keith Frank Best, Henricus Wilhelmus Maria Van Buel, Cheng-Qun Gui, Johannes Onvlee, Rudy Jan Maria Pellens, Remi Daniel Marie Edart, Oleg Viacheslavovich Voznyi, Pascale Anne Maury