Patents by Inventor Oleg Yakushev

Oleg Yakushev has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus
    Patent number: 9307624
    Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.
    Type: Grant
    Filed: June 15, 2009
    Date of Patent: April 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Denis Alexandrovich Glushkov, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevich Koshelev, Givi Georgievich Zukakishvili, Vladimir Mihailovitch Krivtsun, Yurii Victorovitch Sidelnikov, Kurt Gielissen, Oleg Yakushev
  • Apparatus with plasma radiation source and method of forming a beam of radiation
    Patent number: 8294128
    Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: October 23, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Mihailovitch Krivtsun, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Evgeny Dmitrievich Korop, Konstantin Nikolaevich Koshelev, Yurii Victorovitch Sidelnikov, Oleg Yakushev
  • APPARATUS WITH PLASMA RADIATION SOURCE AND METHOD OF FORMING A BEAM OF RADIATION AND LITHOGRAPHIC APPARATUS
    Publication number: 20110013167
    Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.
    Type: Application
    Filed: September 24, 2010
    Publication date: January 20, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Vladimir Mihailovitch KRIVTSUN, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Evgeny Dmitrievich Korop, Konstantin Nikolaevich Koshelev, Yurii Victorovitch Sidelnikov, Oleg Yakushev
  • Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
    Patent number: 7825390
    Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.
    Type: Grant
    Filed: February 14, 2007
    Date of Patent: November 2, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Mihallovitch Krivtsun, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Evgeny Dmitrievich Korop, Konstantin Nikolaevich Koshelev, Yurii Victorovitch Sidelnikov, Oleg Yakushev
  • LITHOGRAPHIC APPARATUS
    Publication number: 20100002211
    Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.
    Type: Application
    Filed: June 15, 2009
    Publication date: January 7, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Denis GLUSHKOV, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Konstantin Nikolaevich KOSHELEV, Givi Georgievich ZUKAKISHVILI, Vladimir Mihailovitch KRIVTSUN, Yurii Victorovitch SIDELNIKOV, Kurt GIELISSEN, Oleg YAKUSHEV
  • Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
    Publication number: 20080192218
    Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.
    Type: Application
    Filed: February 14, 2007
    Publication date: August 14, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Vladimir Mihailovitch Krivtsun, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Evgeny Dmitrievich Korop, Konstantin Nikolaevich Koshelev, Yurii Victorovitch Sidelnikov, Oleg Yakushev