Patents by Inventor Oleh V. Khodykin
Oleh V. Khodykin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8686370Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.Type: GrantFiled: November 13, 2012Date of Patent: April 1, 2014Assignee: Cymer, LLCInventors: Norbert R. Bowering, Oleh V. Khodykin
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Patent number: 8461560Abstract: An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.Type: GrantFiled: April 14, 2011Date of Patent: June 11, 2013Assignee: Cymer, Inc.Inventors: Alexander I. Ershov, Alexander N. Bykanov, Oleh V. Khodykin, Igor V. Fomenkov
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Patent number: 8314398Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.Type: GrantFiled: April 21, 2011Date of Patent: November 20, 2012Assignee: Cymer, Inc.Inventors: Norbert R. Bowering, Igor V. Fomenkov, Oleh V. Khodykin, Alexander N. Bykanov
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Publication number: 20110192985Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.Type: ApplicationFiled: April 21, 2011Publication date: August 11, 2011Inventors: Norbert R. Bowering, Oleh V. Khodykin
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Patent number: 7960701Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.Type: GrantFiled: December 20, 2007Date of Patent: June 14, 2011Assignee: Cymer, Inc.Inventors: Norbert R. Bowering, Oleh V. Khodykin
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Patent number: 7928417Abstract: An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 ?m at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.Type: GrantFiled: October 24, 2008Date of Patent: April 19, 2011Assignee: Cymer, Inc.Inventors: Alexander I. Ershov, Alexander N. Bykanov, Oleh V. Khodykin, Igor V. Fomenkov
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Patent number: 7872245Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.Type: GrantFiled: June 19, 2008Date of Patent: January 18, 2011Assignee: Cymer, Inc.Inventors: Georgiy O. Vaschenko, Alexander N. Bykanov, Norbert R. Bowering, David C. Brandt, Alexander I. Ershov, Rodney D. Simmons, Oleh V. Khodykin, Igor V. Fomenkov
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Publication number: 20090230326Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.Type: ApplicationFiled: June 19, 2008Publication date: September 17, 2009Applicant: CYMER, INC.Inventors: Georgiy O. Vaschenko, Alexander N. Bykanov, Norbert R. Bowering, David C. Brandt, Alexander I. Ershov, Rodney D. Simmons, Oleh V. Khodykin, Igor V. Fomenkov
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Patent number: 7589337Abstract: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.Type: GrantFiled: March 12, 2008Date of Patent: September 15, 2009Assignee: Cymer, Inc.Inventors: Alexander N. Bykanov, J. Martin Algots, Oleh V. Khodykin, Oscar Hemberg, Norbert R. Bowering
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Publication number: 20090159808Abstract: A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.Type: ApplicationFiled: December 20, 2007Publication date: June 25, 2009Applicant: Cymer, Inc.Inventors: Norbert R. Bowering, Igor V. Fomenkov, Oleh V. Khodykin, Alexander N. Bykanov
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Patent number: 7465946Abstract: An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.Type: GrantFiled: April 17, 2006Date of Patent: December 16, 2008Assignee: Cymer, Inc.Inventors: Norbert R. Bowering, Oleh V. Khodykin, Alexander N. Bykanov, Igor V. Fomenkov