Patents by Inventor Olga SYSHCHYK

Olga SYSHCHYK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210111021
    Abstract: The present invent provides a method comprising forming a first wafer comprising a first substrate of a group IV semiconductor, and a group III-V semiconductor device structure formed by selective area epitaxial growth on a surface portion of a front side of the first substrate. The method further comprises forming a second wafer comprising a second substrate of a group IV semiconductor, and a group IV semiconductor device structure formed on a front side of the second substrate, and bonding the first wafer to the second wafer with the front side of the first substrate facing the front side of the second wafer.
    Type: Application
    Filed: October 12, 2020
    Publication date: April 15, 2021
    Inventors: Philippe SOUSSAN, Vasyl MOTSNYI, Luc HASPESLAGH, Stefano GUERRIERI, Olga SYSHCHYK, Bernardette KUNERT, Robert LANGER