Patents by Inventor Oliver Genz
Oliver Genz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8470173Abstract: Column packing apparatus are disclosed. Methods of making and using column packing apparatus are also disclosed.Type: GrantFiled: February 19, 2009Date of Patent: June 25, 2013Assignee: Alltech Associates, Inc.Inventors: Juergen Maier-Rosenkranz, Jochen Saar, Oliver Genz
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Publication number: 20120085462Abstract: Column packing apparatus are disclosed. Methods of making and using column packing apparatus are also disclosed.Type: ApplicationFiled: February 19, 2009Publication date: April 12, 2012Inventors: Juergen Maier-Rosenkranz, Jochen Saar, Oliver Genz
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Patent number: 7141507Abstract: A method for producing a semiconductor structure including preparing a semiconductor substrate, and generating a lower first, a middle second and an upper third masking layer on a surface of the semiconductor substrate. The method further includes forming at least one first window in the upper third masking layer, structuring the middle second masking layer using the first window for transferring the first window, structuring the lower first masking layer using the first window for transferring the first window, and enlarging the first window to form a second window. The method for further includes restructuring the middle second masking layer using the second window for transferring the second window, structuring the semiconductor substrate, using the structured lower third masking layer, restructuring the lower first masking layer using the second window, and restructuring the semiconductor substrate using the restructured lower third masking layer.Type: GrantFiled: February 25, 2005Date of Patent: November 28, 2006Assignee: Infineon Technologies AGInventors: Oliver Genz, Markus Kirchhoff, Stephan Machill, Alexander Reb, Barbara Schmidt, Momtchil Stavrev, Maik Stegemann, Stephan Wege
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Patent number: 7049228Abstract: A process for introducing structures that have different dimensions, particularly with regard to depth, in which just one lithography level is required, is disclosed. This is achieved by use of a layer stack deposited on a substrate, where one layer in particular is used to store information related to the dimensioning of the different structures. The layer is partially opened up to expose the substrate at locations corresponding to where deep structures are to be formed. Deep structures are subsequently etched into the substrate, after which the layer is opened up at locations corresponding to where shallow structures are to be formed. The latter locations are subsequently etched to the desired depth of the shallower structures. The process can be used instead of conventional the dual damascene technology for the structuring of contact holes and interconnects.Type: GrantFiled: January 14, 2004Date of Patent: May 23, 2006Assignee: Infineon Technologies AGInventors: Ulrich Baier, Oliver Genz
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Patent number: 7046363Abstract: An apparatus and method for measuring feature sizes having form birefringence.Type: GrantFiled: September 6, 2002Date of Patent: May 16, 2006Assignee: Infineon Technologies AGInventors: Alexander Michaelis, Oliver Genz, Ulrich Mantz
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Patent number: 7018781Abstract: Disclosed is a method for fabricating a contract hole plane in a memory module with an arrangement of memory cells each having a selection transistor. The methods can be utilized during the production of dynamic random access memory (DRAM) modules.Type: GrantFiled: March 29, 2004Date of Patent: March 28, 2006Assignee: Infineon Technologies, AGInventors: Hans-Georg Fröhlich, Oliver Genz, Werner Graf, Stefan Gruss, Matthias Handke, Percy Heger, Lars Heineck, Antje Laessig, Alexander Reb, Kristin Schupke, Momtchil Stavrev, Mirko Vogt
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Publication number: 20050196952Abstract: A method for producing a semiconductor structure including preparing a semiconductor substrate, and generating a lower first, a middle second and an upper third masking layer on a surface of the semiconductor substrate. The method further includes forming at least one first window in the upper third masking layer, structuring the middle second masking layer using the first window for transferring the first window, structuring the lower first masking layer using the first window for transferring the first window, and enlarging the first window to form a second window. The method for further includes restructuring the middle second masking layer using the second window for transferring the second window, structuring the semiconductor substrate, using the structured lower third masking layer, restructuring the lower first masking layer using the second window, and restructuring the semiconductor substrate using the restructured lower third masking layer.Type: ApplicationFiled: February 25, 2005Publication date: September 8, 2005Applicant: Infineon Technologies AGInventors: Oliver Genz, Markus Kirchhoff, Stefan Machill, Alexander Reb, Barbara Schmidt, Momtchil Stavrev, Maik Stegeman, Stephan Wege
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Publication number: 20050003308Abstract: In order to fabricate a contact hole plane in a memory module with an arrangement of memory cells each having a selection transistor, on a semiconductor substrate with an arrangement of mutually adjacent gate electrode tracks on the semiconductor surface, an insulator layer is formed on the semiconductor surface and a sacrificial layer is subsequently formed on the insulator layer, then material plugs are produced on the sacrificial layer for the purpose of defining contact openings between the mutually adjacent gate electrode tracks, the sacrificial layer is etched to form material plugs with the underlying sacrificial layer blocks, after the production of the vitreous layer with uncovering of the sacrificial layer blocks above the contact openings between the mutually adjacent gate electrode tracks, an essentially planar surface being formed, then the sacrificial layer material is etched out from the vitreous layer and the uncovered insulator material is removed above the contact openings on the semiconductType: ApplicationFiled: March 29, 2004Publication date: January 6, 2005Applicant: Infineon Technologies AGInventors: Hans-Georg Frohlich, Oliver Genz, Werner Graf, Stefan Gruss, Matthias Handke, Percy Heger, Lars Heineck, Antje Laessig, Alexander Reb, Kristin Schupke, Momtchil Stavrev, Mirko Vogt
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Patent number: 6809800Abstract: An apparatus (100) for patterning the surface of a semiconductor wafer (130). A stage (148) is coupled to a motor (150) that is adapted to move the stage (148) and a semiconductor wafer (130) in a horizontal direction at a first speed A. A mask (140) is disposed above the semiconductor wafer (130), the mask (140) being coupled to a motor (142) that is adapted to move the mask (140) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens (120) is used. The mask (140) and the wafer (130) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask (140) pattern onto the wafer (130) surface.Type: GrantFiled: April 25, 2003Date of Patent: October 26, 2004Assignee: Infineon Technologies AGInventors: Oliver Genz, Jurgen Preuninger, Gerhard Kunkel
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Publication number: 20040192031Abstract: A process for introducing structures that have different dimensions, particularly with regard to depth, in which just one lithography level is required, is disclosed. This is achieved by use of a layer stack deposited on a substrate, where one layer in particular is used to store information related to the dimensioning of the different structures. The layer is partially opened up to expose the substrate at locations corresponding to where deep structures are to be formed. Deep structures are subsequently etched into the substrate, after which the layer is opened up at locations corresponding to where shallow structures are to be formed. The latter locations are subsequently etched to the desired depth of the shallower structures. The process can be used instead of conventional the dual damascene technology for the structuring of contact holes and interconnects.Type: ApplicationFiled: January 14, 2004Publication date: September 30, 2004Inventors: Ulrich Baier, Oliver Genz
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Patent number: 6740594Abstract: A method for removing a carbon-containing polysilane from a semiconductor substrate without stripping the polysilane during manufacture of a semiconductor device, the method entailing the steps in the following order of coating a carbon-containing polysilane on a semiconductor substrate and coating a resist on the polysilane; patterning the resist with exposure and development; transferring the pattern from the resist to the polysilane using an etch process selective to the resist; stripping the resist; transferring the pattern from the polysilane to a hardmask using an etch selective to the hardmask; subjecting the polysilane to thermal or plasma/thermal oxidation to convert the polysilane to silicon oxide; and etching the substrate and stripping off the hardmask.Type: GrantFiled: May 31, 2001Date of Patent: May 25, 2004Assignee: Infineon Technologies AGInventors: Zhijian Lu, Oliver Genz
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Publication number: 20040046958Abstract: An a&pgr;&pgr;aratus and method for measuring feature sizes having form birefringence.Type: ApplicationFiled: September 6, 2002Publication date: March 11, 2004Applicant: Infineon Technologies AGInventors: Alexander Michaelis, Oliver Genz, Ulrich Mantz
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Patent number: 6670235Abstract: In a method of forming a DRAM cell in a semiconductor substrate, the improvement of maintaining a substantially full trench opening during trench processing comprising: a) forming a pad nitride on the surface of the substrate and reactive ion etching (RIE) a trench vertically to a first depth; b) depositing a nitride layer in the trench; c) filling the trench with a poly silicon fill; d) recess etching the fill to the collar depth; e) oxidizing to transform the exposed nitride layer into a nitrided oxide collar or depositing an oxide on the layer of nitride; f) reactive ion etching to open the bottom oxide; g) stripping the poly fill trench, and performing a nitride etch selective to oxide; h) expanding the trench horizontally by etching lower trench sidewalls and bottom while masking the upper sidewalls; i) forming a buried plate at the bottom of the trench sidewalls; j) forming the node dielectric in the deep trench to grow a collar oxide that consists of a nitrided oxide and a layer of node nitride; k) filType: GrantFiled: August 28, 2001Date of Patent: December 30, 2003Assignee: Infineon Technologies AGInventors: Helmut Horst Tews, Stephan Kudelka, Oliver Genz
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Publication number: 20030218727Abstract: An apparatus (100) for patterning the surface of a semiconductor wafer (130). A stage (148) is coupled to a motor (150) that is adapted to move the stage (148) and a semiconductor wafer (130) in a horizontal direction at a first speed A. A mask (140) is disposed above the semiconductor wafer (130), the mask (140) being coupled to a motor (142) that is adapted to move the mask (140) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens (120) is used. The mask (140) and the wafer (130) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask (140) pattern onto the wafer (130) surface.Type: ApplicationFiled: April 25, 2003Publication date: November 27, 2003Inventors: Oliver Genz, Jurgen Preuninger, Gerhard Kunkel
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Patent number: 6558883Abstract: A method and apparatus (100) for patterning the surface of a semiconductor wafer (130). A stage (148) is coupled to a motor (150) that is adapted to move the stage (148) and a semiconductor wafer (130) in a horizontal direction at a first speed A. A mask (140) is disposed above the semiconductor wafer (130), the mask (140) being coupled to a motor (142) that is adapted to move the mask (140) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens (120) is used. The mask (140) and the wafer (130) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask (140) pattern onto the wafer (130) surface.Type: GrantFiled: March 8, 2001Date of Patent: May 6, 2003Assignee: Infineon Technologies AGInventors: Oliver Genz, Jurgen Preuninger, Gerhard Kunkel
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Publication number: 20020182871Abstract: A method for removing polysilane from a semiconductor substrate without stripping during manufacture of a semiconductor device, comprising:Type: ApplicationFiled: May 31, 2001Publication date: December 5, 2002Inventors: Zhijian Lu, Oliver Genz
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Publication number: 20020127501Abstract: A method and apparatus (100) for patterning the surface of a semiconductor wafer (130). A stage (148) is coupled to a motor (150) that is adapted to move the stage (148) and a semiconductor wafer (130) in a horizontal direction at a first speed A. A mask (140) is disposed above the semiconductor wafer (130), the mask (140) being coupled to a motor (142) that is adapted to move the mask (140) in a horizontal direction at a second speed B. The ratio of the first and second speeds is different than the magnification factor, which may be other than 1:1 if a lens (120) is used. The mask (140) and the wafer (130) may be moved in the same horizontal direction simultaneously during the exposure process at different speeds B and A, respectively, to provide a magnification or demagnification of the mask (140) pattern onto the wafer (130) surface.Type: ApplicationFiled: March 8, 2001Publication date: September 12, 2002Inventors: Oliver Genz, Jurgen Preuninger, Gerhard Kunkel
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Patent number: 6387771Abstract: A method for forming a valve metal oxide for semiconductor fabrication in accordance with the present invention is disclosed and claimed. The method includes the steps of providing a semiconductor wafer, depositing a valve metal on the wafer, placing the wafer in an electrochemical cell such that a solution including electrolytes interacts with the valve metal to form a metal oxide when a potential difference is provided between the valve metal and the solution and processing the wafer using the metal oxide layer.Type: GrantFiled: June 8, 1999Date of Patent: May 14, 2002Assignee: Infineon Technologies AGInventors: Oliver Genz, Alexander Michaelis
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Patent number: 6352893Abstract: A method for fabricating a semiconductor device, in accordance with the present invention, includes the steps of providing a semiconductor wafer having exposed p-doped silicon regions and placing the wafer in an electrochemical cell such that a solution including electrolytes interacts with the exposed p-doped silicon regions to form an oxide on the exposed p-doped silicon regions when a potential difference is provided between the wafer and the solution.Type: GrantFiled: June 3, 1999Date of Patent: March 5, 2002Assignee: Infineon Technologies AGInventors: Alexander Michaelis, Stephan Kudelka, Jochen Beintner, Oliver Genz
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Patent number: 6031614Abstract: A system for measuring surface features having form birefringence in accordance with the present invention includes a radiation source for providing radiation incident on a surface having surface features. A radiation detecting device is provided for measuring characteristics of the incident radiation after being reflected from the surface features. A rotating stage rotates the surface such that incident light is directed at different angles due to the rotation of the rotating stage. A processor is included for processing the measured characteristics of the reflected light and correlating the characteristics to measure the surface features.Type: GrantFiled: December 2, 1998Date of Patent: February 29, 2000Assignee: Siemens AktiengesellschaftInventors: Alexander Michaelis, Oliver Genz, Ulrich Mantz