Abstract: A rotatable target base device for sputtering installations is provided, wherein the target base device is adapted for receiving thereon a solid target cylinder, the rotatable target base device comprising a target base cylinder having a lateral surface, a middle part, a first end region and a second end region opposite to the first end region, wherein at least one of the first and the second end regions has a maximum outer diameter substantially equal to or less than the outer diameter of the middle part.

Abstract: The present invention refers to a coating device for coating of substrates comprising at least two process chambers (1, 2, 3, 4) being disposed adjacent to each other, a separating plate (9) between the two adjacent process chambers, and pumping means (12, 13) for evacuating the process chambers, wherein the separating plate (9) comprises a conduit having at least two ends, one end of which is connected with the pumping means and the other end has at least one suction opening for at least one of the process chambers.

Abstract: The invention relates to a flooding chamber for coating installations, with which shorter flooding times, and therewith shorter clock cycles, can be attained. Two flooding means are therein utilized, between which a substrate is disposed symmetrically. The flooding means direct a gas jet directly onto the substrate. Hereby the substrate is fixed between the flooding means.

Abstract: The present invention concerns a device for transporting substrates through vacuum chambers, especially coating machines with a substrate carrier on or at which the substrates can be arranged, wherein the substrate carrier has at least one guide raid which extends along at least one side of the substrate carrier, and wherein the guide rail is kept spaced apart from the substrate carrier by one or just a few spaced bearings.

Abstract: The invention relates to a substrate carrier comprising two vertical plates and two horizontal plates. In order for the substrate during its transport through a sputter unit to be coated uniformly in its margin regions, a lever arrangement is provided between the two vertical plates. The lever arrangement comprises at least one horizontal web which under the effect of heat expands to a lesser degree than the horizontal plates.

Abstract: The invention relates to a carrier for a substrate, wherein at least parts of the carrier are comprised of a material with a coefficient of thermal expansion which is higher than the coefficient of thermal expansion of the substrate. In order to avoid, or at least decrease, the nonuniform coating of the substrates at the margins, in particular during sputtering processes, a web is centrally connected with the carrier. This web has a lower coefficient of thermal expansion than the region of the carrier on which it is fastened.

Abstract: A coating machine for coating a substrate by means of sputtering, comprises a process chamber and, in the process chamber, targets 3, 3? from which target material is sputterable in the direction of the substrate for coating the substrate. The coating machine features means of aligning the sputter direction S in a direction pointing away from direction S for pre-sputtering the target, and for aligning the sputter direction S in a direction pointing towards the substrate for coating the substrate by sputtering material from the targets 3, 3?. The change in alignment may, for example, be effected by rotating the cathodes 2, 2? through an angle of 90° or 180° about a longitudinal axis of a flat cathode 2.