Abstract: A radiation transducer has a luminophore layer applied on a substrate, and at least one anti-discoloration substance is applied on the luminophore layer. In a method to produce a radiation transducer a luminophore layer is applied on a substrate, and at least one anti-discoloration substance is applied on the luminophore layer after the application of the luminophore layer on the substrate.

Abstract: A radiation transducer has a luminophore layer applied on a substrate, and at least one anti-discoloration substance is applied on the luminophore layer. In a method to produce a radiation transducer a luminophore layer is applied on a substrate, and at least one anti-discoloration substance is applied on the luminophore layer after the application of the luminophore layer on the substrate.

Abstract: The invention relates to a process for the production of photomasks for structuring semiconductors. A resist that contains a polymer having silicon-containing groups is used. During the structuring in an oxygen-containing plasma, the silicon atoms are converted into silica which protects absorber parts arranged under the silica from removal by the plasma.

Abstract: The invention relates to a polymer obtained by copolymerization of a first comonomer having a group catalytically cleavable by acid, a second comonomer having an anchor group for the subsequent linkage of an amplification agent, and a third comonomer having a carboxyl group being esterified with an alkyl group. It is also possible for one or more carbon atoms in the alkyl group to be replaced by oxygen. The polymer may also include fourth comonomers that include silicon-containing groups. By using the alkyl or alkoxyalkyleneoxy side groups introduced with the third comonomer, the glass transition temperature of the polymer can be reduced so that a photoresist containing the polymer provides a homogeneous polymer film on heating.

Abstract: The invention relates to a polymer obtained by copolymerization of a first comonomer having a group catalytically cleavable by acid, a second comonomer having an anchor group for the subsequent linkage of an amplification agent, and a third comonomer having a carboxyl group being esterified with an alkyl group. It is also possible for one or more carbon atoms in the alkyl group to be replaced by oxygen. The polymer may also include fourth comonomers that include silicon-containing groups. By using the alkyl or alkoxyalkyleneoxy side groups introduced with the third comonomer, the glass transition temperature of the polymer can be reduced so that a photoresist containing the polymer provides a homogeneous polymer film on heating.