Abstract: The invention relates to a method for coating a substrate 40, a coating system for carrying out the method, and a coated body. In a first method step 62, the substrate 40 is pretreated in a ion etching process. In a second method step 64, a first coating layer 56a with a thickness of 0.1 ?m to 6 ?m is deposited on the substrate 40 by means of a PVD process. In order to achieve a particularly high-quality and durable coating 50, the surface of the first coating layer 56a is treated by means of an ion etching process in a third method step 66, and an additional coating layer 56b with a thickness of 0.1 ?m to 6 ?m is deposited on the first coating layer 56a by means of a PVD process in a fourth method step 68. The coated body comprises at least two coating layers 56a, 56b, 56c, 56d with a thickness of 0.1 ?m to 6 ?m on a substrate 40, wherein an interface region formed by ion etching is arranged between the coating layers 56a, 56b, 56c, 56d.

Abstract: The invention relates to a sputtering target, a coating system, and a coating method for same. The sputtering target comprises a base plate with a target plate which is secured thereon and which is made of a first sputtering material with a surface and a plurality of recesses formed therein. A plurality of inserts are arranged in the recesses. At least some of the inserts are made of a second sputtering material, wherein the second sputtering material has a higher sputter yield than the first sputtering material. The aim of the invention is to achieve especially uniform coatings. This is achieved in that the inserts made of the second sputtering material are shaped such that the extent D1, D2 of the inserts, measured in a measuring direction parallel to the surface, increases from the surface to the base plate in a depth direction T.

Abstract: The invention relates to a sputtering target, a coating system, and a coating method for same. The sputtering target comprises a base plate with a target plate which is secured thereon and which is made of a first sputtering material with a surface and a plurality of recesses formed therein. A plurality of inserts are arranged in the recesses. At least some of the inserts are made of a second sputtering material, wherein the second sputtering material has a higher sputter yield than the first sputtering material. The aim of the invention is to achieve especially uniform coatings. This is achieved in that the inserts made of the second sputtering material are shaped such that the extent D1, D2 of the inserts, measured in a measuring direction parallel to the surface, increases from the surface to the base plate in a depth direction T.

Abstract: The invention relates to a sputtering target, a coating system, and a coating method for same. The sputtering target comprises a base plate with a target plate which is secured thereon and which is made of a first sputtering material with a surface and a plurality of recesses formed therein. A plurality of inserts are arranged in the recesses. At least some of the inserts are made of a second sputtering material, wherein the second sputtering material has a higher sputter yield than the first sputtering material. The aim of the invention is to achieve especially uniform coatings. This is achieved in that the inserts made of the second sputtering material are shaped such that the extent D1, D2 of the inserts, measured in a measuring direction parallel to the surface, increases from the surface to the base plate in a depth direction T.

Abstract: The invention relates to a method for coating a substrate 40, a coating system for carrying out the method, and a coated body. In a first method step 62, the substrate 40 is to pretreated in a ion etching process. In a second method step 64, a first coating layer 56a with a thickness of 0.1 ?m to 6 ?m is deposited on the substrate 40 by means of a PVD process. In order to achieve a particularly high-quality and durable coating 50, the surface of the first coating layer 56a is treated by means of an ion etching process in a third method step 66, and an additional coating layer 56b with a thickness of 0.1 ?m to 6 ?m is deposited on the first coating layer 56a by means of a PVD process in a fourth method step 68. The coated body comprises at least two coating layers 56a, 56b, 56c, 56d with a thickness of 0.1 ?m to 6 ?m on a substrate 40, wherein an interface region formed by ion etching is arranged between the coating layers 56a, 56b, 56c, 56d.

Abstract: The invention relates to a coated body and to a method for coating a body. The coated body comprises at least a substrate (22), a diamond layer (24) having a thickness of 1-40 ?m, and a hard material layer (26), which is arranged farther outside on the body (10) than the diamond layer (24). The hard material layer (26) comprises at least one metal element and at least one non-metal element. An adhesive layer (32) having a thickness of 2-80 nm is provided between the diamond layer (24) and the hard material layer (26). The adhesive layer (32) contains carbon and at least one metal element. The diamond layer (24) can be applied by means of a CVD method. The hard material layer can be applied by means of a PVD method.

Abstract: The invention relates to a coated body and to a method for coating a body. The coated body comprises at least a substrate (22), a diamond layer (24) having a thickness of 1-40 ?m, and a hard material layer (26), which is arranged farther outside on the body (10) than the diamond layer (24). The hard material layer (26) comprises at least one metal element and at least one non-metal element. An adhesive layer (32) having a thickness of 2-80 nm is provided between the diamond layer (24) and the hard material layer (26). The adhesive layer (32) contains carbon and at least one metal element. The diamond layer (24) can be applied by means of a CVD method. The hard material layer can be applied by means of a PVD method.

Abstract: A tool for machining fiber-reinforced materials, said tool having a tool body having a particular cutting edge that has at least a main function surface and has a diamond coating applied at least to said main function surface. In order to provide a tool and a method which are especially suitable for machining fiber-reinforced materials, the surface of the diamond coating has a reduced peak height Spk of less than 0.25 ?m.

Abstract: A process and a device for coating a substrate (22) are described. In a vacuum chamber (10), a first magnetron cathode (24) is provided with a sputtering target (28) of a first metal composition comprising predominantly aluminium. A second magnetron cathode (26) is provided with a sputtering target (30) of a second metal composition comprising at least 50 at-% of a second metal selected from groups IVA-VIA of the periodic table. In order to obtain coatings with improved properties, electrical power is supplied to the cathodes (24, 26) such that the targets (28, 30) are sputtered, where electrical power is supplied to the first cathode (24) as pulsed electrical power according to high power impulse magnetron sputtering with a first peak current density, and to the second cathode (26) with a second peak current density lower than the first peak current density. The substrate (22) is arranged within the vacuum chamber such that particles from the plasma deposit onto the substrate forming a coating.

Abstract: A tool for machining fiber-reinforced materials, said tool having a tool body having a particular cutting edge that has at least a main function surface and has a diamond coating applied at least to said main function surface. In order to provide a tool and a method which are especially suitable for machining fiber-reinforced materials, the surface of the diamond coating has a reduced peak height Spk of less than 0.25 ?m.

Abstract: The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a neat conductor array composed of a plurality of elongated heat conductors (2) is provided in a housing (9), said heat conductors extending between a first (1) and a second electrode (6), wherein the heat conductors are held individually tensioned by a weight (4) attached to one end thereof. To increase the life of the neat conductors (2), the invention proposes that the weight (4) or the heat conductor (2) be guided at the second electrode (6), forming an electrical loop contact, in such a way that a vector of the weight force (G) produced by the weight (4) makes an angle (?) of no more than 45° with a direction of the longitudinal extension of the heat conductor (2).

Abstract: The invention relates to a body with a substrate (1), an intermediate layer (2) applied on top thereof and a CVD diamond layer (3) applied to the intermediate layer. In order to propose a body coated with CVD diamond and a production process, in which the body has an increased load-bearing capacity under various mechanical loads, provision is made for the intermediate layer to be predominantly metallic, wherein the metal fraction of the intermediate layer consists predominantly of tungsten and/or chromium, and for the intermediate layer to have a roughness defined by an Rz value of 0.5 ?m-3.0 ?m.

Abstract: The invention relates to a device for coating a substrate (14) using CVD, in particular for coating with diamond or silicon, wherein a heat conductor array comprising a plurality of elongated heat conductors (2) is provided in a housing (10), said heat conductors extending between a first (1) and a second electrode (8), wherein the heat conductors (2) are held individually tensioned by a tensioning device attached to one end thereof. For the purposes of improving the life of the heat conductors (2), the invention proposes that the tensioning device comprises a tilt arm (5) having a tensioning weight (G), the heat conductor (2) being attached to the first end (E1) of said tilt arm, and the second end thereof substantially being mounted pivotably about a horizontal axis (H).

Abstract: A process and a device for coating a substrate (22) are described. In a vacuum chamber (10), a first magnetron cathode (24) is provided with a sputtering target (28) of a first metal composition comprising predominantly aluminium. A second magnetron cathode (26) is provided with a sputtering target (30) of a second metal composition comprising at least 50 at-% of a second metal selected from groups IVA-VIA of the periodic table. In order to obtain coatings with improved properties, electrical power is supplied to the cathodes (24, 26) such that the targets (28, 30) are sputtered, where electrical power is supplied to the first cathode (24) as pulsed electrical power according to high power impulse magnetron sputtering with a first peak current density, and to the second cathode (26) with a second peak current density lower than the first peak current density. The substrate (22) is arranged within the vacuum chamber such that particles from the plasma deposit onto the substrate forming a coating.

Abstract: The invention relates to a body with a substrate (1), an intermediate layer (2) applied on top thereof and a CVD diamond layer (3) applied to the intermediate layer. In order to propose a body coated with CVD diamond and a production process, in which the body has an increased load-bearing capacity under various mechanical loads, provision is made for the intermediate layer to be predominantly metallic, wherein the metal fraction of the intermediate layer consists predominantly of tungsten and/or chromium, and for the intermediate layer to have a roughness defined by an Rz value of 0.5 ?m-3.0 ?m.

Abstract: The invention relates to a device for coating a substrate using CVD, in particular for coating with diamond or silicon, wherein a neat conductor array composed of a plurality of elongated heat conductors (2) is provided in a housing (9), said heat conductors extending between a first (1) and a second electrode (6), wherein the heat conductors are held individually tensioned by a weight (4) attached to one end thereof. To increase the life of the neat conductors (2), the invention proposes that the weight (4) or the heat conductor (2) be guided at the second electrode (6), forming an electrical loop contact, in such a way that a vector of the weight force (G) produced by the weight (4) makes an angle (?) of no more than 45° with a direction of the longitudinal extension of the heat conductor (2).

Abstract: The invention relates to a device for coating a substrate (14) using CVD, in particular for coating with diamond or silicon, wherein a heat conductor array comprising a plurality of elongated heat conductors (2) is provided in a housing (10), said heat conductors extending between a first (1) and a second electrode (8), wherein the heat conductors (2) are held individually tensioned by a tensioning device attached to one end thereof. For the purposes of improving the life of the heat conductors (2), the invention proposes that the tensioning device comprises a tilt arm (5) having a tensioning weight (G), the heat conductor (2) being attached to the first end (E1) of said tilt arm, and the second end thereof substantially being mounted pivotably about a horizontal axis (H).

Abstract: The invention refers to a method and apparatus for CVD coating and to a coated body. To improve the mechanical properties of the structure and surface of the body and to make the method and apparatus as simple and cost-effective as possible, it is suggested in the method, in which a layer is deposited on a substrate in a carbon-containing gas atmosphere: that the process parameters be varied during the coating period in such a way that during the coating period a first operating mode and a second operating mode are repeatedly alternated, wherein in the first operating mode a higher carbon over-saturation of the gas atmosphere occurs near the substrate, and in the second operating mode a lower carbon over-saturation of the gas atmosphere occurs near the substrate. In this way, a body can be produced with a substrate and at least one layer deposited on the surface of the substrate, wherein the layer consists of nano-crystalline diamond.

Abstract: The invention refers to a method and apparatus for CVD coating and to a coated body. To improve the mechanical properties of the structure and surface of the body and to make the method and apparatus as simple and cost-effective as possible, it is suggested in the method, in which a layer is deposited on a substrate in a carbon-containing gas atmosphere: that the process parameters be varied during the coating period in such a way that during the coating period a first operating mode and a second operating mode are repeatedly alternated, wherein in the first operating mode a higher carbon over-saturation of the gas atmosphere occurs near the substrate, and in the second operating mode a lower carbon over-saturation of the gas atmosphere occurs near the substrate. In this way, a body can be produced with a substrate and at least one layer deposited on the surface of the substrate, wherein the layer consists of nano-crystalline diamond.

Abstract: Disclosed are an element comprising a hard metal substrate (10) and a diamond layer (30), and a method for coating a hard metal substrate (10). Said hard metal substrate is provided with hard material particles (20) and surrounding binder material (22). The hard material particles (20) are surrounded by binding material (22) in a first area (24) comprising intact hard metal. The transition region of the first area (24) encompasses a deep profile having recesses (18) and elevations (16). The diamond layer (30) is braced with the substrate material (10) with the aid of said deep profile, portions of the diamond layer (30) being disposed deeper within the substrate (10) than elevations (16) of the first area (24). Said structure is obtained by means of a pretreatment process in which a hard metal substrate (10) is first subjected to selective etching in order to remove the binding material (22). A porous zone having a deep profile is formed.