Abstract: Systems and methods for copper etch monitoring and control are described. Certain embodiments include utilizing thin-film cells to measure the absorbance of a copper etch solution to determine the etch rate of the solution. In another embodiment, a method of controlling etch rate of a copper etch solution includes detecting characteristics of the copper etch solution utilizing a sensor device, e.g., flow cell and/or attenuated total reflection probe, calculating, based on the detected characteristics of the copper etch solution, the etch rate of the copper etch solution, and adjusting the etch rate of the copper etch solution in response to the calculated etch rate deviating from a specified value.

Abstract: The present disclosure provides an extended spectroscopic wafer characterization metrology that provides highly sensitive chemical bonding transformation information in the extended mid-IR region (e.g., 1 ?m-25 ?m). The extended spectroscopic metrology described herein utilizes both total internal reflection and transmission infrared spectroscopy with angle dependent spectroscopic acquisition to optimize high detection sensitivity for the measurement of fundamental chemical bonding vibrations and associated rotational-vibrational structure for fabricated film stacks and nanostructures on a wafer substrate that has been polished on the both sides.

Abstract: A versatile, thermally stable and economically effective corrosion inhibition treatment for copper (Cu) metal and selected metals surface through a single step chemical vapor deposition (CVD) of selected inhibitor compounds at temperatures as low as 100-200° C. is described in this invention. The resulting CVD deposited inhibition coating is thermally stable to 300° C. and protects Cu and selected metals from active corrosion in various technologically important operational environments. The selective coating for copper metal is achieved by controlling the chemistry of bonding between the Copper metal surface and inhibitor material used. The technique can be accomplished by using one or more inhibitors separately or in combination in order to create an all-terrain stable & robust corrosion prevention coating for copper metal.

Abstract: Systems and methods for copper etch monitoring and control are described. Certain embodiments include utilizing thin-film cells to measure the absorbance of a copper etch solution to determine the etch rate of the solution. In another embodiment, a method of controlling etch rate of a copper etch solution includes detecting characteristics of the copper etch solution utilizing a sensor device, e.g., flow cell and/or attenuated total reflection probe, calculating, based on the detected characteristics of the copper etch solution, the etch rate of the copper etch solution, and adjusting the etch rate of the copper etch solution in response to the calculated etch rate deviating from a specified value.

Abstract: The invention relates to a process for free-radically initiated heterophase polymerization, in which the polymerization of ethylenically monomers proceeds in a phase dispersed in the continuous phase, characterized in that one or more additives which are soluble in the continuous phase and insoluble in the disperse phase and stop the polymerization of the ethylenically unsaturated monomers in the continuous phase is/are added before or during the polymerization.

Abstract: Storage stable compounds having at least two organopolysiloxane groups and at least one methylol group are useful as coatings on textile, paper, and other substrates, and are post-crosslinkable.

Abstract: Nanoparticulate silicone organo copolymers exhibit controlled hydrophobicity in composite thermal insulation systems.

Abstract: Nanoparticulate silicone organo copolymers exhibit controlled hydrophobicity in composite thermal insulation systems.

Abstract: Addition polymers prepared in the presence of condensation-crosslinkable silyl-functional RAFT reagents are preparable in solid or liquid form with low polydispersion.

Abstract: The invention relates to a process for free-radically initiated heterophase polymerization, in which the polymerization of ethylenically monomers proceeds in a phase dispersed in the continuous phase, characterized in that one or more additives which are soluble in the continuous phase and insoluble in the disperse phase and stop the polymerization of the ethylenically unsaturated monomers in the continuous phase is/are added before or during the polymerization.

Abstract: Ultrahydrophobic coatings are prepared by coating a substrate with a coating system containing an addition polymer containing moieties derived from a mono- or polyethylenically unsaturated organopolysiloxane, and hydrophillic particles.

Abstract: The invention provides copolymers of ethylenically unsaturated monomers and of ethylenically functionalized nanoparticles in the form of their aqueous polymer dispersions or water-redispersible polymer powders, obtainable by means of free-radically initiated polymerization in an aqueous medium and, if desired, subsequent drying of the resultant polymer dispersion, of A) one or more monomers from the group consisting of vinyl esters, (meth)acrylic esters, vinylaromatics, olef ins, 1,3-dienes, vinyl ethers and vinyl halides and, if desired, further monomers copolymerizable therewith, in the presence of B) at least one particle P having an average diameter of ?1000 nm, which is functionalized with ethylenically unsaturated, free-radically polymerizable groups, characterized in that B2) particles P used are one or more from the group of metal oxides and semimetal oxides, and/or B2) particles P used are silicone resins composed of repeating units of the general formula [R4(p+Z)SiO(4?p?Z)/2] (II), where for at leas

Abstract: Oligomers are prepared by polymerizing unsaturated silanes, optionally along with a copolymerizable ethylenically unsaturated monomer. The oligomers are particularly useful for preparing core-shell particles.

Abstract: Organosilicon polymers prepared by copolymerizing an unsaturated methylol compound, an unsaturated monomer, and an organopolysiloxane bearing at least one unsaturated group exhibit good binding and crosslinking properties when applied to fibers, and the ability to tailor substrate hydrophobicity.

Abstract: Storage stable compounds having at least two organopolysiloxane groups and at least one methylol group are useful as coatings on textile, paper, and other substrates, and are post-crosslinkable.

Abstract: Copolymers of ethylenically unsaturated monomers and ethylenically functionalized nanoparticles in the form of aqueous polymer dispersions or water-redispersible polymer powders, are obtained by aqueous free-radically polymerizing and optionally drying a copolymerizate of, A) one or more ethylenically unsaturated monomers in the presence of B) particles having an average diameter of ?1000 nm, functionalized with ethylenically unsaturated, free-radically polymerizable groups, wherein B1) particles are metal oxides or semimetal oxides, and/or B2) particles are silicone resins and where B1) and B2) are functionalized with one or more ?-organosilanes of the formula (R1O)3?n(R2)nSi—(CR32)—X (I), where X is a radical having 2 to 20 hydrocarbon atoms containing an ethylenically unsaturated group.

Abstract: Crosslinkable silane-modified copolymers are prepared by copolymerizing free radically polymerizable monomers with an ethylenically unsaturated ?-silane. The copolymers exhibit high storage stability coupled with rapid cure.