Abstract: An extreme ultraviolet (EUV) light source includes a providing device for providing a target material, a pulsed laser source for emitting a pulsed laser beam, and a beam guidance device for supplying the pulsed laser beam from the pulsed laser source into a radiation generation chamber and for focused irradiation of the target material with the pulsed laser beam. The target material is configured to emit EUV radiation on account of the irradiation. The beam guidance device includes a beam positioning device comprising four mirrors as two mirror pairs for positioning the pulsed laser beam. Each of the four mirrors is rotatable about exactly one axis of rotation. The axes of rotation of the two mirrors of a first mirror pair are aligned along a first spatial direction. The axes of rotation of the two mirrors of a second mirror pair are aligned along a second spatial direction.

Abstract: An extreme ultraviolet (EUV) light source includes a providing device for providing a target material, a pulsed laser source for emitting a pulsed laser beam, and a beam guidance device for supplying the pulsed laser beam from the pulsed laser source into a radiation generation chamber and for focused irradiation of the target material with the pulsed laser beam. The target material is configured to emit EUV radiation on account of the irradiation. The beam guidance device includes a beam positioning device comprising four mirrors as two mirror pairs for positioning the pulsed laser beam. Each of the four mirrors is rotatable about exactly one axis of rotation. The axes of rotation of the two mirrors of a first mirror pair are aligned along a first spatial direction. The axes of rotation of the two mirrors of a second mirror pair are aligned along a second spatial direction.

Abstract: A EUV light source includes a prepulse laser source for emitting a prepulse laser beam at a prepulse wavelength, a main pulse laser source for emitting a main pulse laser beam at a main pulse wavelength, a prepulse beam guiding device for feeding the prepulse laser beam into a radiation generating chamber for irradiation of a target material with a prepulse, and a main pulse beam guiding device for feeding the main pulse laser beam into the radiation generating chamber for irradiation of the target material with a main pulse. The target material is configured to emit EUV radiation on account of the irradiation with the prepulse and the main pulse. The prepulse beam guiding device has a separation device configured to reflect disturbing radiation in a wavelength range that does not include the prepulse wavelength back into the radiation generating chamber or into at least one beam trap.

Abstract: A EUV light source includes a prepulse laser source for emitting a prepulse laser beam at a prepulse wavelength, a main pulse laser source for emitting a main pulse laser beam at a main pulse wavelength, a prepulse beam guiding device for feeding the prepulse laser beam into a radiation generating chamber for irradiation of a target material with a prepulse, and a main pulse beam guiding device for feeding the main pulse laser beam into the radiation generating chamber for irradiation of the target material with a main pulse. The target material is configured to emit EUV radiation on account of the irradiation with the prepulse and the main pulse. The prepulse beam guiding device has a separation device configured to reflect disturbing radiation in a wavelength range that does not include the prepulse wavelength back into the radiation generating chamber or into at least one beam trap.