Patents by Inventor Oliver Whear

Oliver Whear has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Image contrast in X-ray topography imaging for defect inspection
    Patent number: 10816487
    Abstract: A system for X-ray topography, the system includes a source assembly, a detector assembly, a filter and a processor. The source assembly is configured to direct at least an X-ray beam to impinge, at an angle, on a first surface of a sample, the X-ray beam is divergent when impinging on the first surface. The detector assembly is configured to detect the X-ray beam that had entered the sample at the first surface, diffracted while passing through the sample and exited the sample at a second surface that is opposite to the first surface, and to produce an electrical signal in response to the detected X-ray beam. The filter is mounted between the source assembly and the first surface, and is configured to attenuate an intensity of a selected spectral portion of the X-ray beam. The processor is configured to detect one or more defects in the sample based on the electrical signal.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: October 27, 2020
    Assignee: BRUKER TECHNOLOGIES LTD.
    Inventors: Kevin Monroe Matney, Oliver Whear, Richard Thake Bytheway, John Leonard Wall, Matthew Wormington
  • Image contrast in X-Ray topography imaging for defect inspection
    Publication number: 20190317028
    Abstract: A system for X-ray topography, the system includes a source assembly, a detector assembly, a filter and a processor. The source assembly is configured to direct at least an X-ray beam to impinge, at an angle, on a first surface of a sample, the X-ray beam is divergent when impinging on the first surface. The detector assembly is configured to detect the X-ray beam that had entered the sample at the first surface, diffracted while passing through the sample and exited the sample at a second surface that is opposite to the first surface, and to produce an electrical signal in response to the detected X-ray beam. The filter is mounted between the source assembly and the first surface, and is configured to attenuate an intensity of a selected spectral portion of the X-ray beam. The processor is configured to detect one or more defects in the sample based on the electrical signal.
    Type: Application
    Filed: February 4, 2019
    Publication date: October 17, 2019
    Inventors: Kevin Monroe Matney, Oliver Whear, Richard Thake Bytheway, John Leonard Wall, Matthew Wormington