Patents by Inventor Olivier Guaitella

Olivier Guaitella has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Surface Plasma Gas Processing
    Publication number: 20120315194
    Abstract: The invention relates to a gas processing unit adapted for generating a surface plasma in the vicinity of a photocatalyst, that has a planar configuration. The photocatalyst is deposited in the form of a thin layer on a dielectric substrate and at least one plasma supply electrode is formed above the photocatalyst thin layer. Such a configuration increases the interaction between the plasma and the photocatalyst. The unit can be used for a gas processing of the pollution-control, odour reduction or bactericidal treatment type with a high efficiency.
    Type: Application
    Filed: January 6, 2010
    Publication date: December 13, 2012
    Applicants: Centre National De La Recherche Scientifique-CRNS-, Ecole Polytechnique
    Inventors: Antoine Rousseau, Katia Allegraud, Olivier Guaitella
  • Surface Plasma Gas Processing
    Publication number: 20100239466
    Abstract: The invention relates to a gas processing unit adapted for generating a surface plasma in the vicinity of a photocatalyst, that has a planar configuration. The photocatalyst is deposited in the form of a thin layer on a dielectric substrate and at least one plasma supply electrode is formed above the photocatalyst thin layer. Such a configuration increases the interaction between the plasma and the photocatalyst. The unit can be used for a gas processing of the pollution-control, odour reduction or bactericidal treatment type with a high efficiency.
    Type: Application
    Filed: January 6, 2010
    Publication date: September 23, 2010
    Applicants: Ecole Polytechnique, Centre National De La Recherche Scientifique -CRNS-
    Inventors: Antoine Rousseau, Katia Allegraud, Olivier Guaitella
  • COMBINED TREATMENT OF GASEOUS EFFLUENTS BY COLD PLASMA AND PHOTOCATALYSTS
    Publication number: 20090223806
    Abstract: The invention relates to a process for treating gaseous effluents according to which said effluents are subjected to simultaneous treatment by cold plasma and to the action of a photocatalyst under additional ultraviolet (UV) radiation, as well as a device for the implementation of such a process.
    Type: Application
    Filed: November 7, 2006
    Publication date: September 10, 2009
    Inventors: Frederic Thevenet, Eric Puzenat, Chantal Guillard, Joseph Dussaud, Roland Clavel, Emmanuel Rutman, Jean-Marie Herrmann, Antoine Rousseau, Olivier Guaitella