Patents by Inventor Olivier J. A. Schueller

Olivier J. A. Schueller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110277930
    Abstract: A system is provided for positioning separate portions of a sample in elongate, parallel channels of a sample chamber and for irradiating a sample in the chamber to create a diffraction pattern where the sample and chamber differ in refractive index. The system also can measure absorption of electromagnetic radiation by a sample in the chamber, and can measure the absorption simultaneously with measurement of diffraction by the sample.
    Type: Application
    Filed: February 18, 2011
    Publication date: November 17, 2011
    Applicant: President and Fellows of Harvard College
    Inventors: Olivier J.A. Schueller, David C. Duffy, John A. Rogers, Scott T. Brittain, George M. Whitesides
  • Patent number: 7919172
    Abstract: A system is provided for positioning separate portions of a sample in elongate, parallel channels of a sample chamber and for irradiating a sample in the chamber to create a diffraction pattern where the sample and chamber differ in refractive index. The system also can measure absorption of electromagnetic radiation by a sample in the chamber, and can measure the absorption simultaneously with measurement of diffraction by the sample.
    Type: Grant
    Filed: April 14, 2004
    Date of Patent: April 5, 2011
    Assignee: President and Fellows of Harvard College
    Inventors: Olivier J. A. Schueller, David C. Duffy, John A. Rogers, Scott T. Brittain, George M. Whitesides
  • Patent number: 7338613
    Abstract: An automated process for microcontact printing is provided, comprising the steps of providing a substrate and a stamp; automatically aligning the substrate and stamp so that the stamp is aligned relative to the substrate to impart a pattern to the substrate at a desired location and with a desired orientation on the substrate; applying an ink to the stamp, the ink including a molecular species adapted to form a self-assembling monolayer (SAM) on the substrate; contacting the stamp and the substrate; and separating the stamp from the substrate.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: March 4, 2008
    Assignee: Surface Logix, Inc.
    Inventors: Olivier J. A. Schueller, Amar Kendale
  • Patent number: 6753131
    Abstract: A contact-mode photolithography phase mask includes a diffracting surface having a plurality of indentations and protrusions. The protrusions are brought into contact with a surface of positive photoresist, and the surface exposed to electromagnetic radiation through the phase mask. The phase shift due to radiation passing through the indentations as opposed to the protrusions is essentially complete. Minima in intensity of electromagnetic radiation are thereby produced at boundaries between the indentations and protrusions. The elastomeric mask conforms well to the surface of photoresist and, following development, features smaller than 100 nm can be obtained. Patterns including curved portions are obtained, as well as curved and/or linear patterns on non-planar surfaces. An elastomeric transparent diffraction grating serves also as a spatial light modulator photothermal detector, strain gauge, and display device. A technique for simplified photolithography is also described.
    Type: Grant
    Filed: October 21, 1999
    Date of Patent: June 22, 2004
    Assignee: President and Fellows of Harvard College
    Inventors: John A. Rogers, Rebecca J. Jackman, Kateri E. Paul, Olivier J. A. Schueller, Tricia Lynn Breen, George M. Whitesides
  • Patent number: 6747285
    Abstract: A system is provided for positioning separate portions of a sample in elongate, parallel channels of a sample chamber and for irradiating a sample in the chamber to create a diffraction pattern where the sample and chamber differ in refractive index. The system also can measure absorption of electromagnetic radiation by a sample in the chamber, and can measure the absorption simultaneously with measurement of diffraction by the sample.
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: June 8, 2004
    Assignee: President and Fellows of Harvard College
    Inventors: Olivier J. A. Schueller, David C. Duffy, John A. Rogers, Scott T. Brittain, George M. Whitesides
  • Patent number: 6719868
    Abstract: A system is provided for positioning separate portions of a sample in elongate, parallel channels of a sample chamber and to irradiate a sample in the chamber to create a diffraction pattern where the sample and chamber differ in refractive index. The system also can measure absorption of electromagnetic radiation by a sample in the chamber, and can measure the absorption simultaneously with measurement of diffraction by the sample.
    Type: Grant
    Filed: October 22, 1999
    Date of Patent: April 13, 2004
    Assignee: President and Fellows of Harvard College
    Inventors: Olivier J. A. Schueller, David C. Duffy, John A. Rogers, Scott T. Brittain, George M. Whitesides
  • Publication number: 20030047535
    Abstract: An automated process for microcontact printing is provided, comprising the steps of providing a substrate and a stamp; automatically aligning the substrate and stamp so that the stamp is aligned relative to the substrate to impart a pattern to the substrate at a desired location and with a desired orientation on the substrate; applying an ink to the stamp, the ink including a molecular species adapted to form a self-assembling monolayer (SAM) on the substrate; contacting the stamp and the substrate; and separating the stamp from the substrate.
    Type: Application
    Filed: September 10, 2001
    Publication date: March 13, 2003
    Inventors: Olivier J.A. Schueller, Amar Kendale
  • Publication number: 20030020915
    Abstract: A system is provided for positioning separate portions of a sample in elongate, parallel channels of a sample chamber and for irradiating a sample in the chamber to create a diffraction pattern where the sample and chamber differ in refractive index. The system also can measure absorption of electromagnetic radiation by a sample in the chamber, and can measure the absorption simultaneously with measurement of diffraction by the sample.
    Type: Application
    Filed: November 1, 2001
    Publication date: January 30, 2003
    Inventors: Olivier J. A. Schueller, David C. Duffy, John A. Rogers, Scott T. Brittain, George M. Whitesides
  • Patent number: 6143412
    Abstract: A technique for forming high-carbon structural articles, such as glassy carbon articles, is provided that involves molding fluid precursors of the article into a predetermined shape, followed by carbonization of the articles. An elastomeric mold can be used to mold the precursors, and the resultant, free-standing articles have features on the micron or nanometer scale. A variety of useful articles including sensors, actuators, microelectromechanical systems, transmission electron microscopy grids, and the like are provided.
    Type: Grant
    Filed: February 10, 1997
    Date of Patent: November 7, 2000
    Assignee: President and Fellows of Harvard College
    Inventors: Olivier J. A. Schueller, Scott Brittain, George M. Whitesides