Patents by Inventor Olivier Palais

Olivier Palais has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ELECTRICALLY MODULATABLE EXTENDED LIGHT SOURCE AND A MEASUREMENT DEVICE FOR CHARACTERIZING A SEMICONDUCTOR INCLUDING ONE SUCH SOURCE
    Publication number: 20120326742
    Abstract: A light source for injecting excess carriers into a semiconductor wafer, fully illuminating a surface of the wafer. The source includes at least one set of point sources which are spaced apart at regular intervals along the X and Y axes, such that the source emits a monochromatic beam of a size that is at least equal to that of the semiconductor wafer surface to be illuminated. Each of the point sources is sinusoidally modulated by a common electrical modulator, the distance between two point sources and the distance between the source and the semiconductor wafer surface to be illuminated being selected such that the monochromatic light beam uniformly illuminates the surface.
    Type: Application
    Filed: August 31, 2012
    Publication date: December 27, 2012
    Applicant: UNIVERSITE PAUL CEZANNE AIX-MARSEILLE
    Inventors: Olivier Palais, Marcel Pasquinelli
  • Electrically modulatable extended light source and a measurement device for characterizing a semiconductor including one such source
    Patent number: 8278954
    Abstract: A light source for injecting excess carriers into a semiconductor wafer, fully illuminating a surface of the wafer. According to the disclosed embodiments, the source includes at least one set of point sources which are spaced apart at regular intervals along the X and Y axes, such that the source emits a monochromatic beam of a size that is at least equal to that of the semiconductor wafer surface to be illuminated. Each of the point sources is sinusoidally modulated by a common electrical modulator, the distance between two point sources and the distance between the source and the semiconductor wafer surface to be illuminated being selected such that the monochromatic light beam uniformly illuminates the surface.
    Type: Grant
    Filed: January 31, 2007
    Date of Patent: October 2, 2012
    Assignee: Universite Paul Cezanne
    Inventors: Olivier Palais, Marcel Pasquinelli
  • ELECTRICALLY MODULATABLE EXTENDED LIGHT SOURCE AND A MEASUREMENT DEVICE FOR CHARACTERIZING A SEMICONDUCTOR INCLUDING ONE SUCH SOURCE
    Publication number: 20120133384
    Abstract: A light source for injecting excess carriers into a semiconductor wafer, fully illuminating a surface of the wafer. According to the disclosed embodiments, the source includes at least one set of point sources which are spaced apart at regular intervals along the X and Y axes, such that the source emits a monochromatic beam of a size that is at least equal to that of the semiconductor wafer surface to be illuminated. Each of the point sources is sinusoidally modulated by a common electrical modulator, the distance between two point sources and the distance between the source and the semiconductor wafer surface to be illuminated being selected such that the monochromatic light beam uniformly illuminates the surface.
    Type: Application
    Filed: January 31, 2007
    Publication date: May 31, 2012
    Applicant: UNIVERSITE PAUL CEZANNE
    Inventors: Olivier Palais, Marcel Pasquinelli