Patents by Inventor Olivier Postel
Olivier Postel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11702761Abstract: A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.Type: GrantFiled: January 13, 2021Date of Patent: July 18, 2023Assignee: ALIGNEDBIO ABInventors: Greg Alcott, Martin Magnusson, Olivier Postel, Knut Deppert, Lars Samuelson, Jonas Ohlsson
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Patent number: 11264211Abstract: The present disclosure relates to a cold plasma generating apparatus that can efficiently ignite (initially discharge) cold plasma and easily match common impedance and that is optimized for use in applications related to sterilization because it can uniformly distribute power to multiple plasma sources through a single power supply in a multi-plasma array configuration and increase effective plasma volume, and a multi-cold plasma array apparatus comprising the same.Type: GrantFiled: February 14, 2020Date of Patent: March 1, 2022Assignee: PSM Inc.Inventors: Keun-Ho Lee, Olivier Postel
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Publication number: 20210233746Abstract: The present disclosure relates to a cold plasma generating apparatus that can efficiently ignite (initially discharge) cold plasma and easily match common impedance and that is optimized for use in applications related to sterilization because it can uniformly distribute power to multiple plasma sources through a single power supply in a multi-plasma array configuration and increase effective plasma volume, and a multi-cold plasma array apparatus comprising the same.Type: ApplicationFiled: February 14, 2020Publication date: July 29, 2021Applicant: PSM Inc.Inventors: Keun-Ho Lee, Olivier Postel
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Publication number: 20210130979Abstract: A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.Type: ApplicationFiled: January 13, 2021Publication date: May 6, 2021Inventors: Greg Alcott, Martin Magnusson, Olivier Postel, Knut Deppert, Lars Samuelson, Jonas Ohlsson
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Patent number: 10920340Abstract: A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.Type: GrantFiled: January 17, 2019Date of Patent: February 16, 2021Assignee: AlignedBio ABInventors: Greg Alcott, Martin Magnusson, Olivier Postel, Knut Deppert, Lars Samuelson, Jonas Ohlsson
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Publication number: 20200032416Abstract: A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input.Type: ApplicationFiled: January 17, 2019Publication date: January 30, 2020Inventors: Greg Alcott, Martin Magnusson, Olivier Postel, Knut Deppert, Lars Samuelson, Jonas Ohlsson
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Patent number: 10196755Abstract: A gas phase nanowire growth apparatus including a reaction chamber, a first input and a second input. The first input is located concentrically within the second input and the first and second input are configured such that a second input fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber. An aerosol of catalyst particles may be used to grow the nanowires.Type: GrantFiled: January 19, 2017Date of Patent: February 5, 2019Assignee: SOL VOLTAICS ABInventors: Greg Alcott, Martin Magnusson, Olivier Postel, Knut Deppert, Lars Samuelson, Jonas Ohlsson
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Publication number: 20170198409Abstract: A gas phase nanowire growth apparatus including a reaction chamber (200), a first input and a second input (202 B, 202 A). The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.Type: ApplicationFiled: January 19, 2017Publication date: July 13, 2017Inventors: Greg Alcott, Martin Magnusson, Olivier Postel, Knut Deppert, Lars Samuelson, Jonas Ohlsson
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Patent number: 9574286Abstract: A gas phase nanowire growth apparatus including a reaction chamber (200), a first input and a second input (202 B, 202 A). The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber. An aerosol of catalyst particles may be used to grow the nanowires.Type: GrantFiled: May 24, 2013Date of Patent: February 21, 2017Assignee: SOL VOLTAICS ABInventors: Greg Alcott, Martin Magnusson, Olivier Postel, Knut Deppert, Lars Samuelson, Jonas Ohlsson
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Patent number: 9093482Abstract: In an apparatus and process for treating wafer-shaped articles, a spin chuck holds a wafer-shaped article in a predetermined orientation relative to an upper surface of the spin chuck. A heating assembly comprises a housing containing at least one infrared heating element. The heating assembly is mounted above the upper surface of the spin chuck and adjacent a wafer-shaped article when mounted on the spin chuck. The housing also contains a conduit having an inlet connected to a source of cooling fluid and an outlet returning cooling fluid to the source of cooling fluid.Type: GrantFiled: October 12, 2012Date of Patent: July 28, 2015Assignee: LAM RESEARCH AGInventors: Michael Brugger, Otto Lach, Olivier Postel
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Publication number: 20150152570Abstract: A gas phase nanowire growth apparatus including a reaction chamber (200), a first input and a second input (202 B, 202 A). The first input is located concentrically within the second input and the first and second input are configured such that a second fluid delivered from the second input provides a sheath between a first fluid delivered from the first input and a wall of the reaction chamber.Type: ApplicationFiled: May 24, 2013Publication date: June 4, 2015Inventors: Greg Alcott, Martin Magnusson, Olivier Postel, Knut Deppert, Lars Samuelson, Jonas Ohlsson
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Publication number: 20140102637Abstract: In an apparatus and process for treating wafer-shaped articles, a spin chuck holds a wafer-shaped article in a predetermined orientation relative to an upper surface of the spin chuck. A heating assembly comprises a housing containing at least one infrared heating element. The heating assembly is mounted above the upper surface of the spin chuck and adjacent a wafer-shaped article when mounted on the spin chuck. The housing also contains a conduit having an inlet connected to a source of cooling fluid and an outlet returning cooling fluid to the source of cooling fluid.Type: ApplicationFiled: October 12, 2012Publication date: April 17, 2014Applicant: LAM RESEARCH AGInventors: Michael BRUGGER, Otto LACH, Olivier POSTEL
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Patent number: 8075537Abstract: A diffusing device for treating tissue has multiple cells arranged in a cell layer, the cells filled with or charged with a therapeutic agent, an occlusive layer in direct communication with the cell layer, and a diffusion layer in direct communication with the cell layer. In use the diffusing device is sealed peripherally about an area of tissue and therapeutic agent is released from the cells through the diffusion layer based on the diffusion properties of the diffusion layer.Type: GrantFiled: September 11, 2008Date of Patent: December 13, 2011Assignee: Oxyband Technologies, Inc.Inventors: Amie B Franklin, Olivier Postel
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Publication number: 20060042755Abstract: A dry etcher includes a process chamber configured to process a substrate therein using plasma; a substrate supporter to support the substrate; an inner chamber wall maintained at a high temperature and at least one magnetron provided in close proximity to the substrate to generate a local uniform high density plasma. The outer chamber wall provides vacuum integrity and is kept at low enough temperature to maintain vacuum integrity and to ensure safe operation of the machine. The dry etcher further includes a radio-frequency (RF) power source coupled to the substrate supporter, wherein the plasma is generated by the RF power applied to the substrate supporter and a magnetic field generated by the magnetron.Type: ApplicationFiled: August 29, 2005Publication date: March 2, 2006Applicant: PlasmaMed, LLCInventors: Scott Holmberg, Olivier Postel