Abstract: Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride (HF) and contains varying amounts of HF as impurity. The present disclosure relates to a method for chamber cleaning using F2 containing more than 0.1% by weight and equal to or less than 10% by weight of HF. Surprisingly, such an F2 is very well suited for the purpose of chamber cleaning.

Abstract: Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride and contains varying amounts of HF as impurity. The present invention provides a method for chamber cleaning using F2 which contains more than 0.1% by weight and equal to or less than 10% by weight of HF. Surprisingly, such an F2 is very well suited for the purpose of chamber cleaning. In a preferred embodiment, the F2 which contains more than 0.1% by weight and less than 2.5% by weight of HF is electrolytically produced, cleaned, delivered and used on site, without any pressurizing treatment. Omitting cleaning steps and process and using process conditions leaving a relatively high HF content in the F2 allows at the same time to omit pressurizing steps. The advantage is that less cleaning steps.

Abstract: A hydrogen fluoride supply unit which comprises a plurality of transportable hydrogen fluoride storage containers connected to a hydrogen fluoride supply line and a chemical plant comprising the hydrogen fluoride supply unit. Such chemical plant may be for the manufacture of fluorine, wherein the hydrogen fluoride supply line is connected to an electrolysis cell for producing fluorine by HF electrolysis of a molten salt electrolyte. A process for the manufacture of a chemical comprising using such chemical plant. Also a method for supply of hydrogen fluoride to a chemical plant, which comprises: (a) filling at least one transportable hydrogen fluoride storage container with hydrogen fluoride, (b) transporting the hydrogen fluoride storage container to the hydrogen fluoride supply unit, (c) connecting the hydrogen fluoride storage container to the hydrogen fluoride supply line, and (d) supplying hydrogen fluoride from the hydrogen fluoride storage container to the hydrogen fluoride supply line.

Abstract: Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride and contains varying amounts of HF as impurity. The present invention provides a method for chamber cleaning using F2 which contains more than 0.1% by weight and equal to or less than 10% by weight ofHF. Surprisingly, such an F2 is very well suited for the purpose of chamber cleaning. In a preferred embodiment, the F2 which contains more than 0.1% by weight and less than 2.5% by weight of HF is electrolytically produced, cleaned, delivered and used on site, without any pressurizing treatment. Omitting cleaning steps and process and using process conditions leaving a relatively high HF content in the F2 allows at the same time to omit pressurizing steps. The advantage is that less cleaning steps.

Abstract: Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride and contains varying amounts of entrained electrolyte salt in solid form as impurity. The invention concerns a process for the purification of such impure elemental fluorine by contact with liquid hydrogen fluoride, e.g., in a jet gas scrubber or by bubbling the raw fluorine through liquid hydrogen fluoride. After this purification step, any entrained hydrogen fluoride is removed by adsorption, condensing it out or both. After passing through a filter with very small pores, the purified fluorine is especially suited for the semiconductor industry as etching gas or as chamber cleaning gas in the manufacture of semiconductors, TFTs and solar cells, or for the manufacture of micro-electromechanical systems (“MEMS”).

Abstract: A hydrogen fluoride supply unit which comprises a plurality of transportable hydrogen fluoride storage containers connected to a hydrogen fluoride supply line and a chemical plant comprising the hydrogen fluoride supply unit. Such chemical plant may be for the manufacture of fluorine, wherein the hydrogen fluoride supply line is connected to an electrolysis cell for producing fluorine by HF electrolysis of a molten salt electrolyte. A process for the manufacture of a chemical comprising using such chemical plant. Also a method for supply of hydrogen fluoride to a chemical plant, which comprises: (a) filling at least one transportable hydrogen fluoride storage container with hydrogen fluoride, (b) transporting the hydrogen fluoride storage container to the hydrogen fluoride supply unit, (c) connecting the hydrogen fluoride storage container to the hydrogen fluoride supply line, and (d) supplying hydrogen fluoride from the hydrogen fluoride storage container to the hydrogen fluoride supply line.

Abstract: A fluorine gas manufacturing plant wherein F2 is manufactured by the electrolysis of KF/HF compositions. The plant comprises skid modules for: HF storage, the electrolytic cells, storage and purification of the manufactured F2 raw gas, for fluorine gas delivery including a single buffer tank or multiple storage units, scrubbers to provide purified waste gas, for providing cooling water circuits, analysis, electrical rectifiers, an electrical sub-station with transformers and emergency supply, and for utilities including a control room with laboratory and a rest room for the personnel. The advantage of the skids is that they can be separately manufactured in workshops, tested, transported to the facility and assembled there. A great advantage is the safety aspect, a reliable F2 production for 24 hours and 7 days a week of high purity F2.

Abstract: Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride and contains varying amounts of entrained electrolyte salt in solid form as impurity. The invention concerns a process for the purification of such impure elemental fluorine by contact with liquid hydrogen fluoride, e.g., in a jet gas scrubber or by bubbling the raw fluorine through liquid hydrogen fluoride. After this purification step, any entrained hydrogen fluoride is removed by adsorption, condensing it out or both. After passing through a filter with very small pores, the purified fluorine is especially suited for the semiconductor industry as etching gas or as chamber cleaning gas in the manufacture of semiconductors, TFTs and solar cells, or for the manufacture of micro-electromechanical systems (“MEMS”).

Abstract: Elemental fluorine is used as etching agent for the manufacture of electronic devices, especially semiconductor devices, micro-electromechanical devices, thin film transistors, flat panel displays and solar panels, and as chamber cleaning agent mainly for plasma-enhanced chemical vapor deposition (PECVD) apparatus. For this purpose, fluorine often is produced on-site. The invention provides a process for the manufacture of electronic devices wherein fluorine is produced on site and is purified from HF by a low temperature treatment. A pressure of between 1.5 and 20 Bars absolute is especially advantageous.