Abstract: A thin film display element (100) has at least one emissive area (103) in the display region (101) and a layer structure (104) comprising: a first patterned conductor layer (110) comprising a first display electrode (111) in the display region; a second patterned conductor layer (120) comprising a second display electrode (121) in the display region; and an emissive layer (130) between the first and the second conductor layers configured to emit light in the at least one emissive area. The patterned conductor layers further comprise a first touch electrode (141) and a second touch electrode (142) in the display region, the first and the second touch electrodes forming a touch sensor (140) for capacitive touch or proximity sensing.

Abstract: A thin film display element (100) has at least one emissive area (103) in the display region (101) and a layer structure (104) comprising: a first patterned conductor layer (110) comprising a first display electrode (111) in the display region; a second patterned conductor layer (120) comprising a second display electrode (121) in the display region; and an emissive layer (130) between the first and the second conductor layers configured to emit light in the at least one emissive area. The patterned conductor layers further comprise a first touch electrode (141) and a second touch electrode (142) in the display region, the first and the second touch electrodes forming a touch sensor (140) for capacitive touch or proximity sensing.

Abstract: A nozzle head, apparatus and method for providing a coating on a surface of a substrate by subjecting the surface of the substrate to successive surface reactions of at least two precursors according to principles of atomic layer deposition. The nozzle head comprises an output face provided with at least two different precursor zones, the at least two different precursor zones being arranged to provide different coating layers on the surface of the substrate.

Abstract: A nozzle head, apparatus and method for providing a coating on a surface of a substrate by subjecting the surface of the substrate to successive surface reactions of at least two precursors according to principles of atomic layer deposition. The nozzle head comprises an output face provided with at least two different precursor zones, the at least two different precursor zones being arranged to provide different coating layers on the surface of the substrate.

Abstract: Described herein is an apparatus and nozzle head for coating a surface of a substrate. The apparatus comprising a process chamber having inside a gas atmosphere, a nozzle head arranged inside the process chamber, precursor supply and discharge means. The nozzle head including one or more first precursor nozzles for subjecting the surface of the substrate to the first precursor, one or more second precursor nozzles for subjecting the surface of the substrate to the second precursor and one or more purge gas channels between the first and second precursor zones. In certain aspects, the purge gas channel is at least partly open to the gas atmosphere comprising purge gas for subjecting the surface of the substrate to purge gas.

Abstract: Described herein is an apparatus and nozzle head for coating a surface of a substrate. The apparatus comprising a process chamber having inside a gas atmosphere, a nozzle head arranged inside the process chamber, precursor supply and discharge means. The nozzle head including one or more first precursor nozzles for subjecting the surface of the substrate to the first precursor, one or more second precursor nozzles for subjecting the surface of the substrate to the second precursor and one or more purge gas channels between the first and second precursor zones. In certain aspects, the purge gas channel is at least partly open to the gas atmosphere comprising purge gas for subjecting the surface of the substrate to purge gas.

Abstract: A coating process and apparatus; the apparatus including a unit for forming a mixture that includes at least one precursor of a surface reaction, a unit for atomizing the mixture into droplets, a unit for transporting the droplets of mixture towards a surface of a substrate to be coated with the surface reaction. The unit for forming a mixture are adjusted to mix to the mixture a liquid carrier substance, which is not a precursor of the surface reaction, and the boiling point of which in the defined process space is lower than the boiling point of the precursor of the surface reaction. The proposed arrangement improves both speed and quality of the coating process.

Abstract: A method and apparatus implement network planning in a radio system in a desired area. To determine transmitter coverage, a vector map describing the surroundings of the transmitter and containing a description of buildings and surfaces reflecting radio waves in the area is used. The transmitter signal strength is measured at points of a desired area. A subset is selected among the points, path attenuation is determined between all subset points using a ray tracing method, and the calculated values are stored in a memory. When performing network planning, a transmitter and a receiver are located at the points in the areas; a given number of the most significant signal paths among the possible signal propagation paths between the transmitter and the receiver is searched for using the values stored in the memory, and the transmitter signal strength is determined at the receipt location point using the ray tracing method.