Patents by Inventor Omar El Gawhary

Omar El Gawhary has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9175951
    Abstract: A method of determining a structure parameter of a target. Illuminating a first region of the target with a first beam and measuring a diffraction pattern. Shifting the position between the target and the projection system to offset a second region to be illuminated from the first region. Illuminating the second region and measuring a diffraction pattern. Retrieving phase information from the measured first and second diffraction patterns. Modeling the target using an estimated structure parameter to calculate a modeled diffraction pattern and modeled phase information. Determining the structure parameter of the target by comparing the measured diffraction patterns and the retrieved phase to the calculated modeled diffraction intensity pattern and the modeled phase information.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: November 3, 2015
    Assignees: ASML Netherlands B.V., Technische Universiteit Delft
    Inventors: Omar El Gawhary, Stefan Jacobus Hendrikus Petra
  • Publication number: 20120243004
    Abstract: A method of determining a structure parameter of a target. Illuminating a first region of the target with a first beam and measuring a diffraction pattern. Shifting the position between the target and the projection system to offset a second region to be illuminated from the first region. Illuminating the second region and measuring a diffraction pattern. Retrieving phase information from the measured first and second diffraction patterns. Modeling the target using an estimated structure parameter to calculate a modeled diffraction pattern and modeled phase information. Determining the structure parameter of the target by comparing the measured diffraction patterns and the retrieved phase to the calculated modeled diffraction intensity pattern and the modeled phase information.
    Type: Application
    Filed: March 7, 2012
    Publication date: September 27, 2012
    Applicants: Technische Universiteit Delft, ASML Netherlands B.V.
    Inventors: Omar El Gawhary, Stefan Jacobus Hendrikus Petra