Abstract: An implant port locator tool for locating an injection port of an implant within a patient includes a housing having a base. A second side of the base has a recess. A cage has an outer perimeter connected to the second side of the base. The cage has a recess and a central opening in the recess. The recess in the base and the recess in the cage mate to form a receptacle. A pin has a first end and a second end. The first end of the pin is disposed within the receptacle. The second end of the pin is disposed exterior to the recess via the central opening in the cage. A magnet is connected to the first end of the pin. The magnet and the first end of the pin are captured in the receptacle.

Abstract: Methods, systems and computer-readable media for controlling a radiotherapy apparatus are disclosed. A method for controlling a radiotherapy apparatus comprises obtaining a first treatment plan comprising positioning information of a beam shaping apparatus of the radiotherapy apparatus; receiving, during delivery of a radiation therapeutic beam to a target on a patient, information including a positional shift of the target; and generating a revised treatment plan based on the first treatment plan, the generating of the revised treatment plan comprising determining an updated configuration of the beam shaping apparatus from the positioning information of the first treatment plan based on the positional shift of the target.

Abstract: A boat with an inner cabin suspended on a rotating shaft inside an outer shell. The outer shell completely encloses the inner cabin. The inner cabin freely rotates on the shaft inside the outer shell to maintain an upright orientation in any sea condition. Optionally, a motor is provided between the inner cabin and outer shell to dampen rotation of the inner cabin.

Abstract: A method and system are provided using an offset dial gage for alignment and adjustment of a polishing pad that has been attached to a turntable of a chemical mechanical polishing (CMP) device. In a described embodiment, an offset dial gage has a surface that contacts a side of a turntable, while a sensor tip contacts the edge of a polishing pad positioned on the turntable. This provides an assessment of radial displacement of the polishing pad edge at this measurement point relative to the side of the turntable. Based on one or more such measurements, the polishing pad may be found acceptably positioned, may be trimmed, or may be replaced. The method and system reduce or eliminate the occurrence of a defect pattern found to be related to side unloading of semiconductor wafers from a CMP turntable.

Abstract: A method and system are provided using an offset dial gage for alignment and adjustment of a polishing pad that has been attached to a turntable of a chemical mechanical polishing (CMP) device. In a described embodiment, an offset dial gage has a surface that contacts a side of a turntable, while a sensor tip contacts the edge of a polishing pad positioned on the turntable. This provides an assessment of radial displacement of the polishing pad edge at this measurement point relative to the side of the turntable. Based on one or more such measurements, the polishing pad may be found acceptably positioned, may be trimmed, or may be replaced. The method and system reduce or eliminate the occurrence of a defect pattern found to be related to side unloading of semiconductor wafers from a CMP turntable.

Abstract: Disclosed herein is a process for diminishing contamination of an integrated circuit wafer caused by residual slurry components disposed on a back side of a carrier for engaging an integrated circuit wafer. Also disclosed is a CMP machine configured to wash a back side of a carrier.

Abstract: A carrier head for supporting a wafer during a chemical mechanical polishing process is provided. In one exemplary implementation, the carrier head may comprise a wear ring, and a slidably movable pressure plate disposed within the wear ring. The pressure plate may be arranged to provide slidable movement relative to the wear ring. This degree of freedom can accommodate height dimensional changes that may occur in the wear ring.

Abstract: A chemical mechanical polishing (CMP) pad is provided. The CMP pad includes a groove pattern disposed on a polishing surface of the pad. The groove pattern is formed of an alternating sequence of spaced apart grooves. The alternating sequence of grooves comprises a groove of a first size and a groove of a second size, wherein the first and second groove sizes are different relative to one another.

Abstract: A multimedia search system that uses new meta tags specifically designed to identify, locate, and retrieve multimedia data, including streaming multimedia data, which is downloaded from a remote site and/or uses the meta tag data to link to remote web sites. The system provides search results which may be in the form of multimedia files which are displayed on the search results screen without requiring linking to a remote web site. The user can step from one multimedia search result to another by clicking on control buttons on the search results display screen. The system also provides a number of other search capabilities to deliver search results having multiple data types, including text, icon, audio, video, and/or multimedia. The system displays a selection of views which allow the searcher to choose the format of the search results. The format may be multimedia, multimedia and text, icons, icons and text, icons and multimedia, text, or combinations of the foregoing.

Abstract: The present invention provides an improved conditioning wheel for conditioning polishing pads used to polish semiconductor wafers. In one embodiment, the conditioning wheel includes a planar body having a metal surface located thereon. The metal surface has abrasive particles embedded therein and a retainer coating deposited over the metal surface and the abrasive particles. The retainer coating inhibits the abrasive particles from dislodging during a conditioning process.

Abstract: The present invention provides an improved conditioning wheel for conditioning polishing pads used to polish semiconductor wafers. In one embodiment, the conditioning wheel includes a planar body having a metal surface located thereon. The metal surface has abrasive particles embedded therein and a retainer coating deposited over the metal surface and the abrasive particles. The retainer coating inhibits the abrasive particles from dislodging during a conditioning process.

Abstract: The present invention provides an improved conditioning wheel for conditioning polishing pads used to polish semiconductor wafers. The conditioning wheel includes a planar body and a homogeneous abrasive layer located on the planar body wherein the homogenous abrasive layer includes abrasive protrusions comprised of a same material as the homogenous abrasive layer.

Abstract: The present invention provides a terminal block extension for use with a terminal block having electrical contacts and that is electrically coupled to a wiring system. In one embodiment, the terminal block comprises an insulating body having first and second coupling ends and a first conductor disposed within the insulating body having first and second conducting ends. The first coupling end is configured to mechanically couple to the terminal block. The second coupling end is configured to mechanically couple to another terminal block extension. The first conducting end is configured to couple to one of the electrical contacts. The second conducting end is configured to receive a first wire of the wiring system and cooperatively engage a first coupling end of another terminal block extension.

Abstract: A non-destructive method for measuring the thickness loss of a polishing pad due to pad conditioning includes the use of rigid planar members placed on the surfaces of both the conditioned and non-conditioned sections of the polishing pad. Measurements are made using measurement instruments which overhang the depressed conditioned section and measure the height difference between the upper surfaces of the planar members. The measurement instruments may be repositioned and measurements repeated to obtain an average thickness loss.

Abstract: The present invention provides a wafer carrier for use with a semiconductor wafer polishing apparatus. In one embodiment, the wafer carrier comprises a carrying head having opposing first and second surfaces, a primary channel system formed in the second surface, and a secondary channel system formed in the second surface. The first surface is coupleable to the semiconductor polishing apparatus and the second surface is adapted to receive a semiconductor wafer to be polished. The primary channel system comprises first and second intersecting channels. The secondary channel system intersects the primary channel system so that the secondary channel system and the primary channel system cooperate to occupy a substantial portion of a surface area of the second surface. Therefore, the primary channel system and the secondary channel system decrease an amount of force required to remove the semiconductor wafer from the second surface.

Abstract: A method and apparatus for limiting or eliminating the edge effect in a chemical mechanical polishing apparatus comprising a substrate holder and a retaining ring spaced from and around the holder, a rotatable platen and a polishing pad on the platen, by essentially flattening the pad in the area in which it normally tends to deform. The invention is carried out by applying a fluid under pressure, preferably the polishing slurry, to the pad in the region of the gap between the retaining ring and the holder to substantially flatten the pad in the area around the edge of the substrate.

Abstract: The present invention provides a method for polishing a semiconductor substrate having a first layer of material formed on a second layer of different material. In one embodiment, the method includes placing the semiconductor substrate against a polishing surface and polishing the semiconductor substrate, producing a first vibration by polishing and removing the first layer, producing a second vibration by polishing at least a portion of the second layer, and detecting a change from the first vibration to the second vibration with a vibration sensor. The vibration that is sensed in the present invention is physical or mechanical vibration, and it is not a vibration associated with a change in temperature. The vibration sensor may be of varying types. For example, the vibration sensor may be an acoustic sensor or an ultrasonic sensor.

Abstract: The apparatus has a substantially planar base having a surface which defines a wafer cassette receiving station and a wafer receiving station. A transportable wafer cassette is removably coupled to the base in the wafer cassette receiving station. The transportable wafer cassette is provided for holding a plurality of wafers in an axially aligned manner, each of the wafers having identification indicia disposed on a surface thereof. A wafer receiving cassette is coupled to the base adjacent to the transportable wafer cassette in the wafer receiving station. A first reciprocally moveable wafer transfer member is attached to the base, and is operative for transferring the wafers held in the transportable wafer cassette to the wafer receiving cassette.