Patents by Inventor Ondrej Machek
Ondrej Machek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11901155Abstract: The disclosure relates to a method of aligning a charged particle beam apparatus, comprising the steps of providing a charged particle beam apparatus in a first alignment state; using an alignment algorithm, by a processing unit, for effecting an alignment transition from said first alignment state towards a second alignment state of said charged particle beam apparatus; and providing data related to said alignment transition to a modification algorithm for modifying said alignment algorithm in order to effect a modified alignment transition.Type: GrantFiled: August 3, 2021Date of Patent: February 13, 2024Assignee: FEI CompanyInventors: Mykola Kaplenko, Remco Schoenmakers, Oleksii Kaplenko, Ondrej Machek
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Publication number: 20230108313Abstract: Disclosed herein are scientific instrument support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a support apparatus is provided for a scientific instrument. The support apparatus s configured to generate, using a machine-learning model, one or more identified features in an image of a set of images acquired via a scientific instrument. The support apparatus is also configured to determine whether the set of images satisfies one or more selection criteria and assign the set of images, including the one or more identified features, to a training dataset in response to a determination that the set of images satisfies the one or more selection criteria. The support apparatus is also configured to retrain the machine-learning model using the training dataset. A method performed via a computing device for providing scientific instrument support is also provided.Type: ApplicationFiled: September 30, 2022Publication date: April 6, 2023Inventors: Bradley J. Larson, Ondrej Machek, Katherine M. LaChasse
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Publication number: 20230099947Abstract: Disclosed herein are charged particle microscopy (CPM) support systems, as well as related methods, computing devices, and computer-readable media. For example, in some embodiments, a CPM support apparatus may include: first logic to cause a CPM to generate a single image of a first portion of a specimen; second logic to generate a first mask based on one or more regions-of-interest provided by user annotation of the single image; and third logic to train a machine-learning model using the single image and the one or more regions-of-interest. The first logic may cause the CPM to generate multiple images of corresponding multiple additional portions of the specimen, and the second logic may, after the machine-learning model is trained using the single image and the one or more regions-of-interest, generate multiple masks based on the corresponding images of the additional portions of the specimen using the machine-learning model without retraining.Type: ApplicationFiled: September 30, 2021Publication date: March 30, 2023Applicant: FEI CompanyInventors: Ondrej MACHEK, Pavel POTOCEK, Tereza KONECNÁ
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Publication number: 20230003675Abstract: Method and system are disclosed for determining sample composition from spectral data acquired by a charged particle microscopy system. Chemical elements in a sample are identified by processing the spectral data with a trained neural network (NN). If the identified chemical elements not matching with a known elemental composition of the sample, the trained NN is retrained with the spectral data and the known elemental composition of the sample. The retrained NN can then be used to identify chemical elements within other samples.Type: ApplicationFiled: July 1, 2021Publication date: January 5, 2023Applicant: FEI CompanyInventors: Oleksii KAPLENKO, Jan KLUSCÁEK, Tomás TÛMA, Mykola KAPLENKO, Ondrej MACHEK
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Publication number: 20220208508Abstract: Apparatuses and processes for generating data for three-dimensional reconstruction are disclosed herein. An example method at least includes exposing a subsequent surface of a sample, acquiring an image of the subsequent surface, comparing the image of the subsequent surface to an image of a reference surface, based on the comparison exceeding a threshold, acquiring a compositional or crystalline map of the subsequent surface, and based on the comparison not exceeding the threshold, exposing a next surface.Type: ApplicationFiled: December 22, 2021Publication date: June 30, 2022Applicant: FEI CompanyInventors: Oleksii KAPLENKO, Tomás VYSTAVEL, Petr WANDROL, Ondrej MACHEK
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Patent number: 11355305Abstract: Methods and systems for creating TEM lamella using image restoration algorithms for low keV FIB images are disclosed. An example method includes irradiating a sample with an ion beam at low keV settings, generating a low keV ion beam image of the sample based on emissions resultant from irradiation by the ion beam, and then applying an image restoration model to the low keV ion beam image of the sample to generate a restored image. The sample is then localized within the restored image, and a low keV milling of the sample is performed with the ion beam based on the localized sample within the restored image.Type: GrantFiled: October 8, 2019Date of Patent: June 7, 2022Assignee: FEI CompanyInventors: Remco Johannes Petrus Geurts, Pavel Potocek, Maurice Peemen, Ondrej Machek
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Publication number: 20220065804Abstract: The invention relates to a method of, and apparatus for, examining a sample using a charged particle beam apparatus. The method as defined herein comprises the step of detecting, using a first detector, emissions of a first type from the sample in response to the charged particle beam illuminating the sample. The method further comprises the step of acquiring spectral information on emissions of a second type from the sample in response to the charged particle beam illuminating the sample. As defined herein, said step of acquiring spectral information comprises the steps of providing a spectral information prediction algorithm and using said algorithm for predicting said spectral information based on detected emissions of the first type as an input parameter of said algorithm. With this it is possible to gather EDS data using only a BSE detector.Type: ApplicationFiled: August 31, 2021Publication date: March 3, 2022Applicant: FEI CompanyInventors: Oleksii Kaplenko, Ondrej Machek, Tomás Vystavel, Jan Klusácek, Kristýna Bukvisová, Mykola Kaplenko
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Publication number: 20220037111Abstract: The disclosure relates to a method of aligning a charged particle beam apparatus, comprising the steps of providing a charged particle beam apparatus in a first alignment state; using an alignment algorithm, by a processing unit, for effecting an alignment transition from said first alignment state towards a second alignment state of said charged particle beam apparatus; and providing data related to said alignment transition to a modification algorithm for modifying said alignment algorithm in order to effect a modified alignment transition.Type: ApplicationFiled: August 3, 2021Publication date: February 3, 2022Applicant: FEI CompanyInventors: Mykola KAPLENKO, Remco SCHOENMAKERS, Oleksii KAPLENKO, Ondrej MACHEK
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Publication number: 20210104375Abstract: Methods and systems for creating TEM lamella using image restoration algorithms for low keV FIB images are disclosed. An example method includes irradiating a sample with an ion beam at low keV settings, generating a low keV ion beam image of the sample based on emissions resultant from irradiation by the ion beam, and then applying an image restoration model to the low keV ion beam image of the sample to generate a restored image. The sample is then localized within the restored image, and a low keV milling of the sample is performed with the ion beam based on the localized sample within the restored image.Type: ApplicationFiled: October 8, 2019Publication date: April 8, 2021Applicant: FEI CompanyInventors: Remco Johannes Petrus Geurts, Pavel Potocek, Maurice Peemen, Ondrej Machek
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Publication number: 20210049749Abstract: Techniques for training an artificial neural network (ANN) using simulated specimen images are described. Simulated specimen images are generated based on data models. The data models describe characteristics of a crystalline material and characteristics of one or more defect types. The data models do not include any image data. Simulated specimen images are input as training data into a training algorithm to generate an artificial neural network (ANN) for identifying defects in crystalline materials. After the ANN is trained, the ANN analyzes captured specimen images to identify defects shown therein.Type: ApplicationFiled: October 16, 2020Publication date: February 18, 2021Applicant: FEI CompanyInventors: Ondrej Machek, Tomá{hacek over (s)} Vystavel, Libor Strako{hacek over (s)}, Pavel Potocek
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Publication number: 20200034956Abstract: Techniques for training an artificial neural network (ANN) using simulated specimen images are described. Simulated specimen images are generated based on data models. The data models describe characteristics of a crystalline material and characteristics of one or more defect types. The data models do not include any image data. Simulated specimen images are input as training data into a training algorithm to generate an artificial neural network (ANN) for identifying defects in crystalline materials. After the ANN is trained, the ANN analyzes captured specimen images to identify defects shown therein.Type: ApplicationFiled: July 25, 2018Publication date: January 30, 2020Applicant: FEI CompanyInventors: Ondrej Machek, Tomás Vystavêl, Libor Strakos, Pavel Potocek