Patents by Inventor Onno Bram Loopstra

Onno Bram Loopstra has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7619207
    Abstract: The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.
    Type: Grant
    Filed: November 8, 2006
    Date of Patent: November 17, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Onno Bram Loopstra
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080105026
    Abstract: The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.
    Type: Application
    Filed: November 8, 2006
    Publication date: May 8, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Emiel Jozef Melanie Eussen, Engelbertus Antonius Fransiscus Van Der Pasch, Onno Bram Loopstra