Patents by Inventor Onyou PARK

Onyou PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240124623
    Abstract: Disclosed are a curable composition, a cured layer manufactured using the curable composition, a color filter including the cured layer, and a display device including the color filter. The curable composition includes (A) quantum dots; and (B) a curable monomer having a viscosity of less than 6.2 cps and a vapor pressure of 1×10?6 torr to 3×10?3 torr.
    Type: Application
    Filed: January 18, 2022
    Publication date: April 18, 2024
    Inventors: Jonggi KIM, Kyunghee KANG, Yonghee KANG, Dongjun KIM, Lee June KIM, Onyou PARK, Bumjin LEE, Injae LEE
  • Publication number: 20230383179
    Abstract: Disclosed are a solvent-free curable composition including quantum dots; and a curable monomer represented by Chemical Formula 1, a cured layer manufactured using the composition, a color filter including the cured layer, and a display device including the color filter. In Chemical Formula 1, each substituent is as defined in the specification.
    Type: Application
    Filed: January 17, 2022
    Publication date: November 30, 2023
    Inventors: Onyou PARK, Kyunghee KANG, Yonghee KANG, Jonggi KIM, Bumjin LEE, Minjee PARK, Injae LEE, Seongmi JEON, Minkyeol CHUNG
  • Publication number: 20230357631
    Abstract: Disclosed are a curable composition, a cured layer manufactured using the curable composition, and a color filter including the cured layer. The curable composition includes a quantum dot and a polymerizable compound, wherein the polymerizable compound includes a first polymerizable compound serving as a hydrogen bond donor and a second polymerizable compound serving as a hydrogen bond acceptor, and the first polymerizable compound and second polymerizable compound each independently include a (meth)acrylate group at at least one terminal end.
    Type: Application
    Filed: August 20, 2021
    Publication date: November 9, 2023
    Inventors: Jonggi KIM, Yonghee KANG, Onyou PARK, Bumjin LEE
  • Patent number: 10915020
    Abstract: A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. (In Chemical Formula 1, each substituent is the same as defined in the specification.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: February 9, 2021
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jiyoung Jeong, Bumjin Lee, Yonghee Kang, Misun Kim, Jonggi Kim, Onyou Park, Hojeong Paek, Byeonggeun Son, Youn Je Ryu, Jinsuop Youn, Jihyeon Yim, Young Woong Jang, Minkyeol Chung, Hyunjoo Han, Kyunghee Hyung
  • Publication number: 20190278177
    Abstract: A photosensitive resin composition including (A) a quantum dot; (B) a binder resin including a structural unit represented by Chemical Formula 1; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent, photosensitive resin layer manufactured using the same, and a color filter including the photosensitive resin layer. (In Chemical Formula 1, each substituent is the same as defined in the specification.
    Type: Application
    Filed: November 28, 2017
    Publication date: September 12, 2019
    Inventors: Jiyoung JEONG, Bumjin LEE, Yonghee KANG, Misun KIM, Jonggi KIM, Onyou PARK, Hojeong PAEK, Byeonggeun SON, Youn Je RYU, Jinsuop YOUN, Jihyeon YIM, Young Woong JANG, Minkyeol CHUNG, Hyunjoo HAN, Kyunghee HYUNG
  • Patent number: 10197820
    Abstract: Provided are quantum dots passivated by oligomers or polymers which are formed by a reaction of a first monomer having at least three thiol groups (—SH) at the terminal end with a second monomer having at least two functional groups at the terminal end that can react with the thiol groups, and a spacer group between the at least two functional groups.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: February 5, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Jinsuop Youn, Obum Kwon, Jun Woo Lee, Euihyun Kong, Jonggi Kim, Sang Cheon Park, Onyou Park, Heeje Woo, Sungseo Cho, Hyunjoo Han
  • Publication number: 20180059442
    Abstract: Provided are quantum dots passivated by oligomers or polymers which are formed by a reaction of a first monomer having at least three thiol groups (—SH) at the terminal end with a second monomer having at least two functional groups at the terminal end that can react with the thiol groups, and a spacer group between the at least two functional groups.
    Type: Application
    Filed: December 4, 2015
    Publication date: March 1, 2018
    Inventors: Jinsuop YOUN, Obum KWON, Jun Woo LEE, Euihyun KONG, Jonggi KIM, Sang Cheon PARK, Onyou PARK, Heeje WOO, Sungseo CHO, Hyunjoo HAN