Patents by Inventor Ook Hyun Kim

Ook Hyun Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7638096
    Abstract: Methods and devices for detecting photoresist coating failures are disclosed. A disclosed method to detect a photoresist coating failure on a semiconductor wafer comprises: loading a photoresist coated wafer on a notch position check block; rotating the coated wafer; detecting the position of a notch in the wafer; blowing air toward the surface of the wafer with at least one air nozzle located over the rotating wafer; detecting an amount of the air blown from the at least one air nozzle; and generating a coating failure signal if a variation in the amount of air blown from the at least one air nozzle is indicative of a photoresist coating failure.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: December 29, 2009
    Assignee: Dongbu Electronics Co., Ltd.
    Inventor: Ook Hyun Kim
  • Publication number: 20040266012
    Abstract: Methods and devices for detecting photoresist coating failures are disclosed. A disclosed method to detect a photoresist coating failure on a semiconductor wafer comprises: loading a photoresist coated wafer on a notch position check block; rotating the coated wafer; detecting the position of a notch in the wafer; blowing air toward the surface of the wafer with at least one air nozzle located over the rotating wafer; detecting an amount of the air blown from the at least one air nozzle; and generating a coating failure signal if a variation in the amount of air blown from the at least one air nozzle is indicative of a photoresist coating failure.
    Type: Application
    Filed: June 24, 2004
    Publication date: December 30, 2004
    Inventor: Ook Hyun Kim