Patents by Inventor Oren Boiman

Oren Boiman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Double inspection of reticle or wafer
    Patent number: 7355690
    Abstract: During mask or reticle inspection, each region is scanned at least twice, using an overlap between each pair of consecutive frames. System contamination and camera blemishes have approximately constant frame coordinates, while mask defects have constant reticle coordinates, but inconstant scan frame coordinates. True defects are detected at different coordinates in consecutive frames with a known displacement therebetween.
    Type: Grant
    Filed: February 17, 2004
    Date of Patent: April 8, 2008
    Assignee: Applied Materials, Israel, Ltd.
    Inventors: Emanuel Elyasaf, Oren Boiman
  • Double inspection of reticle or wafer
    Publication number: 20050018899
    Abstract: During mask or reticle inspection, each region is scanned at least twice, using an overlap between each pair of consecutive frames. System contamination and camera blemishes have approximately constant frame coordinates, while mask defects have constant reticle coordinates, but inconstant scan frame coordinates. True defects are detected at different coordinates in consecutive frames with a known displacement therebetween.
    Type: Application
    Filed: February 17, 2004
    Publication date: January 27, 2005
    Inventors: Emanuel Elyasaf, Oren Boiman