Abstract: A measurement system may include two or more sets of optical sub-systems to simultaneously generate measurement data on two or more samples, a coarse translation stage providing motion along a plane, two or more fine translation stages disposed on the coarse translation stage arranged in a common pattern as the two or more sets of optical sub-systems, where each of the fine translation stages provides motion along the plane and is arranged to position one of the two or more samples under one of the two or more sets of optical sub-systems. The system may further include a controller to independently direct each of the fine translation stages and the associated one of the optical sub-systems to generate measurement data for the respective samples, and generate one or more measurements for the samples based on the associated measurement data.

Abstract: A method may include receiving time-varying interference signals from two or more photodetectors associated with a first exposure structure and a second exposure structure in one or more cells as an overlay target is scanned in accordance with a metrology recipe, where the first exposure structure and the second exposure structure form a side-by-side grating, where the side-by-side grating includes one or more diffraction gratings, where at least one diffraction grating is a non-overlapping side-by-side grating, where the first exposure structure is arranged adjacent to the second exposure structure, where the side-by-side grating is periodic along the scan direction.

Abstract: A metrology system includes a controller communicatively coupled to one or more metrology tools, the controller including one or more processors configured to execute program instructions causing the one or more processors to receive one or more metrology measurements of one or more metrology targets of a metrology sample, a metrology target of the one or more metrology targets including one or more target designs with one or more cells, the one or more target designs being generated on one or more layers of the metrology sample; determine one or more errors based on the one or more metrology measurements; and determine one or more correctables to adjust one or more sources of error corresponding to the one or more errors, the one or more correctables being configured to reduce an amount of noise in the one or more metrology measurements generated by the one or more sources of errors.

Abstract: A ptychography system is presented for imaging an object located in an object plane. The ptychography system comprises an optical system, and a detection device. The optical system comprises a single shot ptychography arrangement configured and operable to create light response patterns from the object in the object plane on a pixel matrix of the detection device during the same exposure session of the detection device, wherein the optical system further comprises at least one light coding device configured and operable to apply at least one predetermined coding function to at least one of illuminating light and the light response of the object being collected, and said detection device is configured and operable with a predetermined duration of the exposure session during which the pixel matrix detects the collected light, such that image data indicative of the detected light during a single exposure session is in the form of a coded light response of the object being illuminated.

Abstract: A metrology system includes a controller communicatively coupled to one or more metrology tools, the controller including one or more processors configured to execute program instructions causing the one or more processors to receive one or more metrology measurements of one or more metrology targets of a metrology sample, a metrology target of the one or more metrology targets including one or more target designs with one or more cells, the one or more target designs being generated on one or more layers of the metrology sample; determine one or more errors based on the one or more metrology measurements; and determine one or more correctables to adjust one or more sources of error corresponding to the one or more errors, the one or more correctables being configured to reduce an amount of noise in the one or more metrology measurements generated by the one or more sources of errors.

Abstract: A ptychography system is presented for imaging an object located in an object plane. The ptychography system comprises an optical system, and a detection device. The optical system comprises a single shot ptychography arrangement configured and operable to create light response patterns from the object in the object plane on a pixel matrix of the detection device during the same exposure session of the detection device, wherein the optical system further comprises at least one light coding device configured and operable to apply at least one predetermined coding function to at least one of illuminating light and the light response of the object being collected, and said detection device is configured and operable with a predetermined duration of the exposure session during which the pixel matrix detects the collected light, such that image data indicative of the detected light during a single exposure session is in the form of a coded light response of the object being illuminated.

Abstract: A method of diagnosing pancreatic cancer in a subject is provided. The method comprising determining a level and/or activity of at least one saliva secreted marker in a saliva sample of the subject wherein an alteration in said marker with respect to an unaffected saliva sample is indicative of the pancreatic cancer.

Abstract: A micro-opto-electro-mechanical system having a proof mass; at least one illumination source for providing illumination; an illumination detector; peripheral electronics; and an illumination mitigating mechanism for mitigating the effect of illumination emitted from the at least one illumination source on the peripheral electronics. According to various embodiments, the illumination mitigating mechanism includes handles disposed on the proof mass, an illumination collimating device, a substrate with a recess, a narrow beam light source, an illumination absorbing layer or optical limiters.