Patents by Inventor Orest Polishchuk

Orest Polishchuk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11031237
    Abstract: The present invention relates to new aromatic-amino functional siloxanes, which are compounds comprising one or two tail groups X2, and a linking group L of structure (2) linking each said tail group to said head group, wherein the head group X has structure (1), containing an optional organic moiety Y, wherein the attachment point of said tail group X2 through said linking group L to the head group X1, may be, at positions a, b, c, d, or e. Another aspect of this invention are compositions containing these novel aromatic amino functional siloxane. A further aspect of this invention are compositions comprised of the above novel aromatic-amino functional siloxanes, and also the composition resulting from the aging of these compositions at room temperature for about 1 day to about 4 weeks.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: June 8, 2021
    Assignee: Merck Patent GMbH
    Inventors: Sachin Bobade, Orest Polishchuk, Munirathna Padmanaban, Durairaj Baskaran
  • Publication number: 20200273701
    Abstract: The present invention relates to new aromatic-amino functional siloxanes, which are compounds comprising one or two tail groups X2, and a linking group L of structure (2) linking each said tail group to said head group, wherein the head group X has structure (1), containing an optional organic moiety Y, wherein the attachment point of said tail group X2 through said linking group L to the head group X1, may be, at positions a, b, c, d, or e. Another aspect of this invention are compositions containing these novel aromatic amino functional siloxane. A further aspect of this invention are compositions comprised of the above novel aromatic-amino functional siloxanes, and also the composition resulting from the aging of these compositions at room temperature for about 1 day to about 4 weeks.
    Type: Application
    Filed: October 23, 2018
    Publication date: August 27, 2020
    Inventors: Sachin BOBADE, Orest POLISHCHUK, Munirathna PADMANABAN, Durairaj BASKARAN
  • Patent number: 10259907
    Abstract: The present invention relates to a novel block copolymer of structure 1, wherein, A- is a block polymer chain, B is a block polymer chain, wherein, A- and B- are chemically different, covalently connected polymer chains, which are phase separable and the moiety X(Y(Z)b)a is a junction group, which comprises a surface active pendant moiety Y(Z)b wherein: a is an integer from 1 to 4 denoting the number of surface active pendant moieties Y(Z)b on X, b is an integer from 1 to 5 denoting the number of Z moieties on the linking moiety Y, X is a linking group between the A polymer block, the B polymer block and the moiety Y, Y is a linking group or a direct valence bond between X and Z; and Z is a moiety independently selected from, a fluorine containing moiety, a Si1-Si8 siloxane containing moiety or a hydrocarbon moiety with at least 18 carbons, and further wherein the junction group X(Y(Z)b)a has a surface energy less than that that of the block A and less than that of the block B.
    Type: Grant
    Filed: February 20, 2015
    Date of Patent: April 16, 2019
    Assignees: AZ Electronic Materials (Luxembourg) S.à r.l., IBM Corporation
    Inventors: Ankit Vora, Eri Hirahara, Joy Cheng, Durairaj Baskaran, Orest Polishchuk, Melia Tjio, Margareta Paunescu, Daniel Sanders, Guanyang Lin
  • Publication number: 20160244557
    Abstract: The present invention relates to a novel block copolymer of structure 1, wherein, A- is a block polymer chain, B is a block polymer chain, wherein, A- and B- are chemically different, covalently connected polymer chains, which are phase separable and the moiety X(Y(Z)b)a is a junction group, which comprises a surface active pendant moiety Y(Z)b wherein: a is an integer from 1 to 4 denoting the number of surface active pendant moieties Y(Z)b on X, b is an integer from 1 to 5 denoting the number of Z moieties on the linking moiety Y, X is a linking group between the A polymer block, the B polymer block and the moiety Y, Y is a linking group or a direct valence bond between X and Z; and Z is a moiety independently selected from, a fluorine containing moiety, a Si1-Si8 siloxane containing moiety or a hydrocarbon moiety with at least 18 carbons, and further wherein the junction group X(Y(Z)b)a has a surface energy less than that that of the block A and less than that of the block B.
    Type: Application
    Filed: February 20, 2015
    Publication date: August 25, 2016
    Applicants: International Business Machines Corporation
    Inventors: Ankit VORA, Eri HIRAHARA, Joy CHENG, Durairaj BASKARAN, Orest POLISHCHUK, Melia TJIO, Margareta PAUNESCU, Daniel SANDERS, Guanyang LIN
  • Patent number: 8835581
    Abstract: The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
    Type: Grant
    Filed: June 8, 2012
    Date of Patent: September 16, 2014
    Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Hengpeng Wu, Orest Polishchuk, Yi Cao, SungEun Hong, Jian Yin, Guanyang Lin, Margareta Paunescu, Mark Neisser
  • Publication number: 20130330668
    Abstract: The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
    Type: Application
    Filed: June 8, 2012
    Publication date: December 12, 2013
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Hengpeng WU, Orest POLISHCHUK, Yi CAO, SungEun HONG, Jian YIN, Guanyang LIN, Margareta PAUNESCU, Mark NEISSER
  • Patent number: 8372516
    Abstract: The invention is directed to compositions on a surface which comprise a) at least a (meth)acrylate prepolymer, b) an adhesion promoting monomer of formula (I) wherein Q, R1, R2, R4, R5, m and n are defined herein. Further the compositions may be used to improve the adhesion to surfaces, especially metallic surfaces and may include additional optional components such as adhesion promoting photoinitiators.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: February 12, 2013
    Assignee: BASF SE
    Inventors: Liliana Craciun, Ying Dong, Orest Polishchuk, Christopher Koenigsmann, Belinda W. Ho
  • Patent number: 8105689
    Abstract: The present invention relates to polymerizable N-substituted acrylamide phosphorus-containing monomers, organic polymers formed from the same. Incorporation of said monomers into adhesives, pigment dispersants, coatings or films for polar surfaces or particles gives improved adhesive, anti-corrosive, and flame retardant properties.
    Type: Grant
    Filed: June 29, 2006
    Date of Patent: January 31, 2012
    Assignee: BASF SE
    Inventors: Liliana Craciun, Orest Polishchuk, George William Schriver, Gabriele Baisch, Reinhold Öhrlein
  • Publication number: 20100112362
    Abstract: The invention is directed to compositions on a surface which comprise a) at least a (meth)acrylate prepolymer, b) an adhesion promoting monomer of formula (I) wherein Q, R1, R2, R4, R5, m and n are defined herein. Further the compositions may be used to improve the adhesion to surfaces, especially metallic surfaces and may include additional optional components such as adhesion promoting photoinitiators.
    Type: Application
    Filed: October 21, 2009
    Publication date: May 6, 2010
    Applicant: CIBA CORPORATION
    Inventors: Liliana Craciun, Ying Dong, Orest Polishchuk, Christopher Koenigsmann, Belinda W. Ho
  • Publication number: 20080200582
    Abstract: The invention relates to novel sulfur-containing (meth)acrylic monomers and compositions thereof characterized by a high refractive index, for optical and industrial applications. The invention also relates to a method for preparing high refractive index polymeric materials and more specifically to a method for formation of ultraviolet cast optical lenses and compositions thereof comprising the sulfur-containing (meth)acrylic monomers.
    Type: Application
    Filed: February 14, 2008
    Publication date: August 21, 2008
    Inventors: Liliana Craciun, Orest Polishchuk, George William Schriver, Rudiger Hainz
  • Publication number: 20070028805
    Abstract: The present invention relates to polymerizable N-substituted acrylamide phosphorus-containing monomers, organic polymers formed from the same. Incorporation of said monomers into adhesives, pigment dispersants, coatings or films for polar surfaces or particles gives improved adhesive, anti-corrosive, and flame retardant properties.
    Type: Application
    Filed: June 29, 2006
    Publication date: February 8, 2007
    Inventors: Liliana Craciun, Orest Polishchuk, George Schriver, Gabriele Baisch, Reinhold Ohrlein