Patents by Inventor Orion Wolfe
Orion Wolfe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10571900Abstract: A system and method autonomously determines the impact of respective tool parameters on tool performance in a semiconductor manufacturing system. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.Type: GrantFiled: August 2, 2017Date of Patent: February 25, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Aaron Archer Waterman, Orion Wolfe
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Patent number: 10228678Abstract: Systems and techniques to facilitate tool failure analysis associated with fabrication processes are presented. A monitoring component determines a candidate tool failure associated with one or more fabrication tools based on sensor data generated by a set of sensors associated with the one or more fabrication tools. A signature component generates a signature dataset for the candidate tool failure based on data associated with the one or more fabrication tools. A comparison component compares the candidate tool failure to at least one previously determined tool failure based on the signature dataset and at least one other signature dataset associated with the at least one previously determined tool failure.Type: GrantFiled: July 22, 2015Date of Patent: March 12, 2019Assignee: TOKYO ELECTRON LIMITEDInventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Orion Wolfe
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Publication number: 20170329318Abstract: A system and method autonomously determines the impact of respective tool parameters on tool performance in a semiconductor manufacturing system. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.Type: ApplicationFiled: August 2, 2017Publication date: November 16, 2017Inventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Aaron Archer Waterman, Orion Wolfe
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Patent number: 9746849Abstract: A system and method autonomously determines the impact of respective tool parameters on tool performance in a semiconductor manufacturing system. A parameter impact identification system receives tool parameter and performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.Type: GrantFiled: November 9, 2012Date of Patent: August 29, 2017Assignee: TOKYO ELECTRON LIMITEDInventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Aaron Archer Waterman, Orion Wolfe
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Publication number: 20170023927Abstract: Systems and techniques to facilitate tool failure analysis associated with fabrication processes are presented. A monitoring component determines a candidate tool failure associated with one or more fabrication tools based on sensor data generated by a set of sensors associated with the one or more fabrication tools. A signature component generates a signature dataset for the candidate tool failure based on data associated with the one or more fabrication tools. A comparison component compares the candidate tool failure to at least one previously determined tool failure based on the signature dataset and at least one other signature dataset associated with the at least one previously determined tool failure.Type: ApplicationFiled: July 22, 2015Publication date: January 26, 2017Inventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Orion Wolfe
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Publication number: 20140304196Abstract: The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.Type: ApplicationFiled: April 7, 2014Publication date: October 9, 2014Inventors: Sanjeev Kaushal, Kenji Sugishima, Sukesh Janubhai Patel, Robert Filman, Wolfgang Polak, Orion Wolfe, Jessie Burger
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Publication number: 20140135970Abstract: A system and method for autonomously determining the impact of respective tool parameters on tool performance in a semiconductor manufacturing system is provided. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.Type: ApplicationFiled: November 9, 2012Publication date: May 15, 2014Applicant: TOKYO ELECTRON LIMITEDInventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Aaron Archer Waterman, Orion Wolfe
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Patent number: 8723869Abstract: The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.Type: GrantFiled: March 21, 2011Date of Patent: May 13, 2014Assignee: Tokyo Electron LimitedInventors: Sanjeev Kaushal, Kenji Sugishima, Sukesh Janubhai Patel, Robert Filman, Wolfgang Polak, Orion Wolfe, Jessie Burger
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Publication number: 20120242667Abstract: The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.Type: ApplicationFiled: March 21, 2011Publication date: September 27, 2012Applicant: TOKYO ELECTRON LIMITEDInventors: Sanjeev Kaushal, Kenji Sugishima, Sukesh Janubhai Patel, Robert Filman, Wolfgang Polak, Orion Wolfe, Jessie Burger