Patents by Inventor Orion Wolfe

Orion Wolfe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10571900
    Abstract: A system and method autonomously determines the impact of respective tool parameters on tool performance in a semiconductor manufacturing system. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.
    Type: Grant
    Filed: August 2, 2017
    Date of Patent: February 25, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Aaron Archer Waterman, Orion Wolfe
  • Patent number: 10228678
    Abstract: Systems and techniques to facilitate tool failure analysis associated with fabrication processes are presented. A monitoring component determines a candidate tool failure associated with one or more fabrication tools based on sensor data generated by a set of sensors associated with the one or more fabrication tools. A signature component generates a signature dataset for the candidate tool failure based on data associated with the one or more fabrication tools. A comparison component compares the candidate tool failure to at least one previously determined tool failure based on the signature dataset and at least one other signature dataset associated with the at least one previously determined tool failure.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: March 12, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Orion Wolfe
  • Publication number: 20170329318
    Abstract: A system and method autonomously determines the impact of respective tool parameters on tool performance in a semiconductor manufacturing system. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.
    Type: Application
    Filed: August 2, 2017
    Publication date: November 16, 2017
    Inventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Aaron Archer Waterman, Orion Wolfe
  • Patent number: 9746849
    Abstract: A system and method autonomously determines the impact of respective tool parameters on tool performance in a semiconductor manufacturing system. A parameter impact identification system receives tool parameter and performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.
    Type: Grant
    Filed: November 9, 2012
    Date of Patent: August 29, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Aaron Archer Waterman, Orion Wolfe
  • Publication number: 20170023927
    Abstract: Systems and techniques to facilitate tool failure analysis associated with fabrication processes are presented. A monitoring component determines a candidate tool failure associated with one or more fabrication tools based on sensor data generated by a set of sensors associated with the one or more fabrication tools. A signature component generates a signature dataset for the candidate tool failure based on data associated with the one or more fabrication tools. A comparison component compares the candidate tool failure to at least one previously determined tool failure based on the signature dataset and at least one other signature dataset associated with the at least one previously determined tool failure.
    Type: Application
    Filed: July 22, 2015
    Publication date: January 26, 2017
    Inventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Orion Wolfe
  • Publication number: 20140304196
    Abstract: The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.
    Type: Application
    Filed: April 7, 2014
    Publication date: October 9, 2014
    Inventors: Sanjeev Kaushal, Kenji Sugishima, Sukesh Janubhai Patel, Robert Filman, Wolfgang Polak, Orion Wolfe, Jessie Burger
  • Publication number: 20140135970
    Abstract: A system and method for autonomously determining the impact of respective tool parameters on tool performance in a semiconductor manufacturing system is provided. A parameter impact identification system receives tool parameter and tool performance data for one or more process runs of the semiconductor fabrication system and generates a separate function for each tool parameter characterizing the behavior of a tool performance indicator in terms of a single one of the tool parameters. Each function is then scored according to how well the function predicts the actual behavior of the tool performance indicator, or based on a determined sensitivity of the tool performance indicator to changes in the single tool parameter. The tool parameters are then ranked based on these scores, and a reduced set of critical tool parameters is derived based on the ranking. The tool performance indicator can then be modeled based on this reduced set of tool parameters.
    Type: Application
    Filed: November 9, 2012
    Publication date: May 15, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Sanjeev Kaushal, Sukesh Janubhai Patel, Wolfgang Polak, Aaron Archer Waterman, Orion Wolfe
  • Patent number: 8723869
    Abstract: The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.
    Type: Grant
    Filed: March 21, 2011
    Date of Patent: May 13, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Sanjeev Kaushal, Kenji Sugishima, Sukesh Janubhai Patel, Robert Filman, Wolfgang Polak, Orion Wolfe, Jessie Burger
  • Publication number: 20120242667
    Abstract: The subject disclosure relates to automatically learning relationships among a plurality of manufacturing tool parameters as applied to arbitrary semiconductor manufacturing tools and a graphical user interface that is supported, at least in part, by an autonomous learning system. The graphical user interface can create one or more matrixes based on received data and can further generate additional matrices by transforming the one or more matrixes. A series of windows can be output, wherein the series of windows, provide performance analysis that comprises a matching between a focus chamber and a reference chamber. In an aspect, the focus chamber and the reference chamber can be different chambers. In another aspect, the focus chamber and the reference chamber can be the same chamber, which provides analysis of the deterioration in performance of the same chamber over time.
    Type: Application
    Filed: March 21, 2011
    Publication date: September 27, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Sanjeev Kaushal, Kenji Sugishima, Sukesh Janubhai Patel, Robert Filman, Wolfgang Polak, Orion Wolfe, Jessie Burger