Patents by Inventor Osamu Imagawa

Osamu Imagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5695884
    Abstract: A thermoplastic polyurethane composition of the present invention includes a thermoplastic polyurethane obtained by reacting at least the following components A, B, and C: (A) a polyester polyol having a number average age molecular weight of 500 to 5000, containing an acid component including aromatic dicarboxylic acid and aliphatic dicarboxylic acid, the molar ratio of the aromatic dicarboxylic acid to the aliphatic dicarboxylic acid being 5:95 to 90:10; (B) a low molecular weight diol having a molecular weight of less than 500; and (C) an organic diisocyanate, wherein the thermoplastic polyurethane has a metal sulfonate group of 10 to 1000 equivalents/10.sup.6 g of the polyurethane and a urethane group of 1200 to 3000 equivalents/10.sup.6 g of the polyurethane.
    Type: Grant
    Filed: June 1, 1995
    Date of Patent: December 9, 1997
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Futoshi Ishimaru, Satoshi Nakamura, Chikara Sugitawa, Osamu Imagawa
  • Patent number: 5187441
    Abstract: The portable information apparatus has a battery, a boosting circuit for boosting a voltage of the battery, a battery voltage detector for detecting a voltage level of the battery, an oscillating circuit for generating CPU clock and a counting circuit for counting the interval from the start of the oscillation of the CPU clock to the time when it becomes stable. The apparatus negates the output of the battery voltage detector during the interval counted by the counting circuit so that it can prevent the monitoring of the battery voltage lowering in the time of usual performance from influencing of the battery potential drop due to the transient current at the start of the performance of the boosting circuit and the oscillating circuit.
    Type: Grant
    Filed: December 11, 1990
    Date of Patent: February 16, 1993
    Assignee: Seiko Instruments Inc.
    Inventors: Koichi Shibata, Toshitaka Fukushima, Hiroyuki Watanabe, Shinichiro Miyahara, Osamu Imagawa
  • Patent number: 5187720
    Abstract: The synchronous serial communication circuit transmits and receives data, which is added flag patterns for recognizing the coil winding direction at the first and last of data block, by the electromagnetic induction system using a pair of coils. So, the circuit provides modulation and demodulation circuits acting at the clock of twice of the transfer speed and a flag check circuit for recognizing the inversion of the coil winding direction by judging a state of the flag patterns included in the received data. The transmitted data is converted into the biphase signal by the modulation circuit and is transmitted by driving the coil using the biphase signal. The signal received by the coil is converted into the received data by the demodulation circuit. When the winding directions of coils does not agree, the flag check circuit recognizes the inversion of the coil winding direction and the received data is inverted by the demodulation circuit.
    Type: Grant
    Filed: December 17, 1990
    Date of Patent: February 16, 1993
    Assignee: Seiko Instruments Inc.
    Inventors: Koichi Shibata, Toshitaka Fukushima, Hiroyuki Watanabe, Shinichiro Miyahara, Osamu Imagawa
  • Patent number: 4866006
    Abstract: A process for production of a hydrogenated amorphous silicon film of a silicon compound containing at least one element selected from the group consisting of hydrogen and halogens and having a photosensitivity of not less than 0.1 erg/cm.sup.2 at 780 nm, which comprisessupplying a gas selected from the group consisting of SiH.sub.4, SiF.sub.4 and Si.sub.2 H.sub.6 into a discharge space, andsubjecting the gas to glow discharge within the discharge space having a gradient discharge intensity.The present invention provides an a-SiH film which has a remarkable high sensitivity in a long wavelength region with maintaining a high photosensitivity in a visible light region, and has a remarkable less defect density, and the process for production of such film in a high deposition rate.
    Type: Grant
    Filed: September 28, 1988
    Date of Patent: September 12, 1989
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Osamu Imagawa, Masazumi Iwanishi, Seiichiro Yokohama
  • Patent number: 4839701
    Abstract: A process for production of a hydrogenated amorphous silicon film of a silicon compound containing at least one element selected from the group consisting of hydrogen and halogens and having a photosensitivity of not less than 0.1 erg/cm.sup.2 at 780 nm, which comprisessupplying a gas selected from the group consisting of SiH.sub.4, SiF.sub.4 and Si.sub.2 H.sub.6 into a discharge space, andsubjecting the gas to glow discharge within the discharge space having a gradient discharge intensity.The present invention provides an a-SiH film which has a remarkable high sensitivity in a long wavelength region with maintaining a high photosensitivity in a visible light region, and has a remarkable less defect density, and the process for production of such film in a high deposition rate.
    Type: Grant
    Filed: October 14, 1988
    Date of Patent: June 13, 1989
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Osamu Imagawa, Masazumi Iwanishi, Seiichiro Yokoyama